Patent classifications
H05B3/28
HEATER FOR ELECTRIC STOVETOP HEATER UNIT
A heater for a stovetop heater unit is disclosed. The heater may reduce false detections of an overheat condition, minimize an impact of radiative heat from a heating element of the heater on temperature measurements of the heater, and accurately measure a temperature of an object placed on the heater. Thus, the heater may reduce an amount of time required to heat an object placed on the heater.
SUBSTRATE HOLDING UNIT AND SUBSTRATE PROCESSING APPARATUS
A substrate support unit includes: a ceramic body having a surface for supporting a substrate, the ceramic body including aluminum nitride (AlN), a heat generating resistor disposed in the ceramic body, and including molybdenum (Mo), and a coating layer surrounding the heat generating resistor, and including molybdenum aluminum nitride (MoAlN).
Universal Membrane Configured To Be Divided To Form A Base Membrane And A Cover Membrane That Is Couplable To The Base Membrane To Form An Uncoupling Membrane For Installation Between A Subfloor And Floor Tiles
A universal membrane is configured to be installed between a subfloor and floor tiles to allow movement of the floor tiles relative to the subfloor. The universal membrane includes a base layer, a plurality of studs projecting from the base layer, and a plurality of sidewalls projecting from the base layer and disposed between adjacent ones of the plurality of studs. Each sidewall of the plurality of sidewalls forming a perimeter of a pocket. The base layer forms a bottom wall of the pocket.
Wafer placement table and method for manufacturing the same
A wafer placement table includes: a ceramic member having a wafer placement surface; a mesh electrode buried in the ceramic member; a conductive connection member in contact with the mesh electrode and exposed to outside from a surface of the ceramic member on the opposite side of the wafer placement surface; and an external current-carrying member joined to a surface of the connection member exposed to outside. The mesh electrode has a mesh opening in a region that faces the connection member, and the mesh opening is filled with a sintered conductor being a sintered body of a mixture containing a conductive powder and a ceramic raw material.
MULTILAYER THERMOPLASTIC STRUCTURE WITH CARBON NANOTUBE HEATERS
A multilayer heating structure for controlling ice accumulation on a surface of an aircraft includes a carbon nano-tube (CNT) heater. The heater includes: a CNT layer; a first encapsulation layer disposed on a first side of the CNT layer formed of a first encapsulation layer thermoplastic material; and a second encapsulation layer disposed on a second side of the CNT layer formed of a second encapsulation layer thermoplastic material.
Holding apparatus
A holding apparatus including a holding substrate having a first main face on one side in a thickness direction thereof, and a heat generation section which is disposed in the holding substrate and generates heat when energized. The heat generation section includes a plurality of first heating elements arrayed in a planar direction orthogonal to the thickness direction of the holding substrate, and a second heating element disposed on a side toward the first main face in the thickness direction with respect to the plurality of first heating elements. Any one of the plurality of first heating elements is electrically connected to the second heating element in series through a first via extending in the thickness direction within the holding substrate.
Heater component
The heater component (1) has a substrate part (2), and a thin coating heater (4) which is equipped outside this substrate part (2) and generates heat by power supply. The thin coating heater (4) is formed of a thermal sprayed coating. The thin coating heater (4) has a heater body (10) and a heater extension part (11). The heater body (10) is arranged on a first end face (2a) of the substrate part (2). The heater extension part (11) is extended from the heater body (10) to a second end face (2b) of the substrate part (2) through a side surface (2c) of the substrate part (2). A tip part (11s) of the heater extension part (11) is a heater power supplying part (12) for supplying electric power to the heater body (10).
SUPPORTING UNIT AND APPARATUS FOR TREATING SUBSTRATE
The inventive concept provides a support unit for supporting a substrate. The support unit for supporting the substrate includes a first plate; heating elements provided at the first plate for controlling a temperature of respective region of the substrate; a power supply module configured to generate at least two powers having a different frequency; a power line transmitting a power generated by the power supply module to the heating elements; and filters installed at the power line to selectively filter a power supplied to the heating elements.
ENHANCED MEMS SENSOR EMBEDDED HEATER
Aspects of the subject technology relate to an apparatus including a housing and a substrate. The apparatus further includes a sensor, an integrated circuit mounted on the substrate, and one or more heating elements configured to adjust a temperature of the sensor to facilitate measurement of temperature sensitivity and calibration of the sensor.
ENHANCED MEMS SENSOR EMBEDDED HEATER
Aspects of the subject technology relate to an apparatus including a housing and a substrate. The apparatus further includes a sensor, an integrated circuit mounted on the substrate, and one or more heating elements configured to adjust a temperature of the sensor to facilitate measurement of temperature sensitivity and calibration of the sensor.