A device serves for generating physical plasma by means of dielectric barrier discharges with respect to a surface of an object. The device comprises a common high voltage terminal, and a plurality of electrode bodies that are capacitively coupled to the common high voltage terminal, that comprise an exposed electrode surface and a distal end each, and that are, in a main extension direction, elongated in parallel to one another towards their distal ends. The device further comprises spacers made of dielectric a d arranged at the distal ends of the electrode bodies, the spacers projecting beyond the exposed electrode surfaces of the electrode bodies by 1.0 mm to 5.0 mm in the main extension direction. The device may be part of a hair loss therapy apparatus.

An air fed mycoplasma device includes an array of elongate microchannels formed in a plastic or ceramic having tolerance to ozone and other radicals formed when plasma is generated from air in the microchannels. The microchannels include inlets configured to accept an air feed, and outlets configured to direct plasma jets toward a surface (which may be flat or internal to a pipe, for example) or object. An array of electrodes within the plastic/ceramic housing is configured to ignite and maintain plasma in the microchannels and is isolated by the dielectric from the microchannels. A supply intake for is configured to providing a plasma medium into the microchannels.

The present invention relates to a method for generating atmospheric plasmas not in thermodynamic equilibrium with the control of ozone generation and, in particular, the generation of atmospheric plasmas not in thermodynamic equilibrium with a production of ozone contained below 0.5 ppmv, and preferably below the limit of 0.2 ppmv.

An in-chamber plasma source in a deposition reactor system includes an array of microcavity or microchannel plasma devices having a first electrode and a second electrode isolated from plasma in microcavities or microchannels. An inlet provides connection to deposition precursor. A region interacts deposition precursor with plasma. An outlet directs precursor dissociated with the plasma onto a substrate for deposition. A reactor system includes a substrate holder across from the outlet, a chamber enclosing the in-chamber plasma source and the substrate holder, an exhaust from the chamber, and conduit supplying precursors from sources or bubblers to the inlet. A reactor system can conduct plasma enhanced atomic layer deposition at high pressures and is capable of forming a complete layer in a single cycle.

A plasma treatment device (1) designed to treat a surface with a dielectrically impeded plasma, having a base body (3) that has at least one flat treatment side (5) facing the surface to be treated, and having an electrode arrangement (9) that has at least one electrode (7) and having a dielectric that completely covers the at least one electrode (7) in the direction of the surface to be treated, and having a line arrangement comprising at least one high-voltage supply line (13, 13a, 13b), wherein the electrode (7) is connected to the line arrangement and is able to be supplied, via the high-voltage supply line (13, 13a, 13b), with a high-voltage signal able to be applied to the high-voltage supply line (13, 13a, 13b), and having a nub arrangement (15) arranged on the treatment side (5) of the base body (3) and that has a multiplicity of nubs (17), makes it possible to easily combine an effective plasma treatment with an effective mechanical treatment of the surface to be treated in that the at least one electrode (7) of the electrode arrangement (9) extends into at least one nub (17) of the nub arrangement (15).

A plasma irradiation apparatus includes: a gas guide channel defining therein a flow path for flow of a discharge gas, with an outlet port formed at an end of the flow path; and a discharge section that generates plasma discharge in the gas guide channel. The plasma irradiation apparatus is mounted to a distal device which is movable relative to a target substance. The plasma irradiation apparatus further includes a valve arranged in the gas guide channel or a gas supply channel and configured as a valve capable of changing a flow rate of the discharge gas according to an opening degree of the valve or as a check valve.

Disclosed are systems, methods, and devices for generating radicals in an air stream at the intake of an internal combustion engine, as well as increasing the thrust of such air streams into the engine. A plasma generator including plasma actuators, dielectric barrier discharge electrodes, or both is positioned in the intake stream. Plasma actuators are disposed on the interior surface of the plasma generator, exposed to the intake stream. Dielectric barrier discharge electrodes protrude into the intake air stream. Plasma, preferably DBD plasma, glow plasma, or filamentary plasma, is generated in the air intake stream, creating radicals in the stream, mixing the radicals in the stream, and reducing drag while increasing thrust of air in the intake stream. A concentric cylinder can be further disposed in the plasma generator, with further plasma actuators, dielectric barrier discharge electrodes, or both, on the interior and exterior surfaces of the cylinder.

A water purifier for home use, irrigation systems used for crop cultivation or the pharmaceutical industry includes a water inlet for a water to be purified and a water outlet for a purified water. A water treatment chamber is fluidly connected to the water inlet and the water outlet. The water treatment chamber is confined by a chamber wall. The water purifier includes a high-voltage plasma unit for generating a cold plasma within the water treatment chamber. The plasma unit has a first electrode and a second electrode. The first electrode is arranged inside the water treatment chamber such that, during use of the water purifier, it is contacted by the water. The second electrode is disposed spaced apart from the first electrode and electrically insulated therefrom by a dielectric. The water purifier further relates to a water purification system.

In a plasma treatment arrangement for carrying out dielectrically impeded plasma discharge onto a surface to be treated having a flat electrode unit (4) which has a treatment side, and a control unit (11) which supplies at least one electrode (19) of the electrode unit (4) with a high-voltage AC potential for a power which is required for plasma generation between the at least one electrode (19) and a counterelectrode which forms a reference potential, wherein the at least one electrode (19) which receives the high-voltage AC potential is shielded with a flat dielectric (7), at least on the treatment side, and wherein the flat electrode unit is designed to reduce the size of its support area on the surface to be treated for the purpose of adaptation to the size of the surface to be treated, the adaptation of the support area of the flat electrode unit (4) becomes possible in an unproblematical manner on account of the control unit (11) having a device (14) for determining the size of the adapted support area and a control device for adjusting the power to be output to the at least one electrode (19) in accordance with the determined size of the support area.

A system for treating a substrate comprising a treatment module and a substrate plane. The substrate extending along a substrate plane to treat the substrate and wherein a fluid is deliverable via the module to a local region between the module and the substrate plane to treat the substrate with a predetermined treatment.