A liquid treatment apparatus includes a liquid storing vessel, a first electrode, a second electrode at least partly arranged inside the vessel, a tubular first insulator surrounding a first-electrode lateral surface with a first space interposed therebetween, and including a first opening in an end surface in contact with the liquid, a tubular second insulator surrounding the first-electrode lateral surface inside the first insulator, a gas supply device supplying gas into the first space and ejecting the gas into the liquid through the first opening, and a power supply applying a voltage between the first and second electrodes and producing plasma. The second insulator is arranged with a second space interposed between the first and second insulators. Portions of the first and second insulators, those portions being positioned inside the vessel, are covered with the gas when the gas is supplied into the first space by the gas supply device.

A liquid treatment apparatus includes a liquid storing vessel, a first electrode, a second electrode at least partly arranged inside the vessel, a tubular first insulator surrounding a first-electrode lateral surface with a first space interposed therebetween, and including a first opening in an end surface in contact with the liquid, a tubular second insulator surrounding the first-electrode lateral surface inside the first insulator, a gas supply device supplying gas into the first space and ejecting the gas into the liquid through the first opening, and a power supply applying a voltage between the first and second electrodes and producing plasma. The second insulator is arranged with a second space interposed between the first and second insulators. Portions of the first and second insulators, those portions being positioned inside the vessel, are covered with the gas when the gas is supplied into the first space by the gas supply device.

An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.

An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.

Infectious diseases can be transmitted to humans, or between humans and animals, by airborne viruses and bacteria, known as infectious aerosols. Current protective measures that individuals can take to avoid inhaling such aerosols are either marginally effective (personal face masks) or impractical (self-contained breathing apparatuses). Building ventilation systems employing high-efficiency filters to prevent distribution of such aerosols suffer from high energy costs and high filter replacement costs. The development of conventional, intramuscularly administered vaccines takes months or years to produce enough doses to protect a population from a rapidly spreading infectious disease. Airborne viruses and bacteria have been shown to be completely inactivated when exposed to non-thermal plasmas. Results indicate the potential for sub-lethal exposures of airborne pathogens could render them unable to spark an infection in a host, but still retain the necessary surface proteins to cause an immune response in the host.

A conductive rod body is embedded in an insulative torch adapter into which a plasma torch is fitted so that a leading end protrudes from its outer circumferential surface. Further, a metal plate member electrically connected to a cable line to which a voltage for plasma ignition is applied is attached to a lower holder, and a conductive leaf spring member having a V-shaped cross section is attached to an upper holder. When the torch adapter is placed on the lower holder so that the protruding part of the rod body faces upward and the upper holder is closed to tighten a draw latch, the rod body and the metal plate member are electrically connected via the leaf spring member, and a high voltage for ignition can be applied to the plasma torch.

A conductive rod body is embedded in an insulative torch adapter into which a plasma torch is fitted so that a leading end protrudes from its outer circumferential surface. Further, a metal plate member electrically connected to a cable line to which a voltage for plasma ignition is applied is attached to a lower holder, and a conductive leaf spring member having a V-shaped cross section is attached to an upper holder. When the torch adapter is placed on the lower holder so that the protruding part of the rod body faces upward and the upper holder is closed to tighten a draw latch, the rod body and the metal plate member are electrically connected via the leaf spring member, and a high voltage for ignition can be applied to the plasma torch.

There is provided a method of manufacturing nanoparticles comprising the steps of feeding a core precursor into a plasma torch in a plasma reactor, thereby producing a vapor of silicon or alloy thereof; and allowing the vapor to migrate to a quenching zone of the plasma reactor, thereby cooling the vapor and allowing condensation of the vapor into a nanoparticle core made of the silicon or alloy thereof, wherein the quenching gas comprises a passivating gas precursor that reacts with the surface of the core in the quenching zone produce a passivation layer covering the core, thereby producing said nanoparticles. The present invention also relates to nanoparticles comprising a core covered with a passivation layer, the core being made of silicon or an alloy thereof, as well as their use, in particular in the manufacture of anodes.

There is provided a method of manufacturing nanoparticles comprising the steps of feeding a core precursor into a plasma torch in a plasma reactor, thereby producing a vapor of silicon or alloy thereof; and allowing the vapor to migrate to a quenching zone of the plasma reactor, thereby cooling the vapor and allowing condensation of the vapor into a nanoparticle core made of the silicon or alloy thereof, wherein the quenching gas comprises a passivating gas precursor that reacts with the surface of the core in the quenching zone produce a passivation layer covering the core, thereby producing said nanoparticles. The present invention also relates to nanoparticles comprising a core covered with a passivation layer, the core being made of silicon or an alloy thereof, as well as their use, in particular in the manufacture of anodes.

An apparatus for a material synthesis technology by microwave plasma torch with atmospheric pressure and high temperature. The apparatus includes a plasma torch system and a material growth system. In the plasma torch system, the cutting-edge breakdown happens through inputting the high-power microwave. Then the stable plasma torch with atmosphere pressure and high temperature is achieved in precursor at the open-end of the cylindrical metal tube. The precursors are decomposed by the plasma torch with high temperature and the active particles for material growth are achieved. In the material growth system, the motion and ingredients proportion of negative and positive icons or particles in the active particle beam are controlled by the adjustable static electric field in the space between the plasma torch and material growth space. The material-controlled growth is implemented by the heating system and the adjustable static electrical field.