H05H1/30

Heat transfer system for an inductively coupled plasma device

An inductively coupled plasma generating device is configured to include a plasma torch, a high frequency induction coil and a high frequency power source. In addition, a heat transfer member, in which a first terminal is connected to the high frequency induction coil and a second terminal is connected to a cooling block, is disposed in the inductively coupled plasma generating device. The second terminal of the heat transfer member is located above the first terminal, thereby causing condensed operating fluid to fall and move toward the first terminal due to the action of gravity. Accordingly, it is possible to achieve excellent cooling capacity by improving circulation and mobility of the operating fluid.

Apparatus for treating a gas in a conduit

Apparatus for treating a gas in a conduit of a substrate processing system are provided. In some embodiments, an apparatus for treating a gas in a conduit of a substrate processing system includes: a dielectric tube configured to be coupled to a conduit of a substrate processing system to allow a flow of gases through the dielectric tube, wherein the dielectric tube has a conical sidewall; and a radio frequency (RF) coil wound about an outer surface of the conical sidewall of the dielectric tube. In some embodiments, the RF coil is hollow and includes coolant fittings to couple the hollow RF coil to a coolant supply.

Apparatus for treating a gas in a conduit

Apparatus for treating a gas in a conduit of a substrate processing system are provided. In some embodiments, an apparatus for treating a gas in a conduit of a substrate processing system includes: a dielectric tube configured to be coupled to a conduit of a substrate processing system to allow a flow of gases through the dielectric tube, wherein the dielectric tube has a conical sidewall; and a radio frequency (RF) coil wound about an outer surface of the conical sidewall of the dielectric tube. In some embodiments, the RF coil is hollow and includes coolant fittings to couple the hollow RF coil to a coolant supply.

Method and device for thermal destruction of organic compounds by an induction plasma

A method and device for chemical destruction of at least one feed comprising at least one organic compound are provided. The device comprises at least one inductive plasma torch, means for introducing at least one plasma-forming gas into the torch, optionally when the plasma gas(es) comprise(s) no or little oxygen, means for bringing oxygen gas into the plasma or into the vicinity of the plasma, means for introducing the feed into the torch, a reaction enclosure capable of allowing thermal destruction of the gases flowing from the torch, a device allowing mixing of the gases flowing out of the reaction enclosure to be carried out, means for introducing air and/or oxygen gas into the mixing device, a device allowing recombination by cooling of at least one portion of the gases from the mixing device, the torch, the reaction enclosure, the mixing device and the recombination device being in fluidic communication.

Method and device for thermal destruction of organic compounds by an induction plasma

A method and device for chemical destruction of at least one feed comprising at least one organic compound are provided. The device comprises at least one inductive plasma torch, means for introducing at least one plasma-forming gas into the torch, optionally when the plasma gas(es) comprise(s) no or little oxygen, means for bringing oxygen gas into the plasma or into the vicinity of the plasma, means for introducing the feed into the torch, a reaction enclosure capable of allowing thermal destruction of the gases flowing from the torch, a device allowing mixing of the gases flowing out of the reaction enclosure to be carried out, means for introducing air and/or oxygen gas into the mixing device, a device allowing recombination by cooling of at least one portion of the gases from the mixing device, the torch, the reaction enclosure, the mixing device and the recombination device being in fluidic communication.

APPARATUS FOR TREATING MATERIALS WITH PLASMA

Apparatus for treating materials with plasma, comprising a microwave generator (15), a waveguide (20) and a tubular torch (30), comprising three coaxial tubes (33, 35, 37) and a central section (30.2) connected to the waveguide (20) by means of a body (50) having a cavity (52) through which the tubes pass. A plasma containment chamber is defined in the outer tube (35) at the cavity (52) of the body (50).

APPARATUS FOR TREATING MATERIALS WITH PLASMA

Apparatus for treating materials with plasma, comprising a microwave generator (15), a waveguide (20) and a tubular torch (30), comprising three coaxial tubes (33, 35, 37) and a central section (30.2) connected to the waveguide (20) by means of a body (50) having a cavity (52) through which the tubes pass. A plasma containment chamber is defined in the outer tube (35) at the cavity (52) of the body (50).

High temperature electrolysis glow discharge device
09761413 · 2017-09-12 · ·

The present invention provides a glow discharge assembly that includes an electrically conductive cylindrical screen, a flange assembly, an electrode, an insulator and a non-conductive granular material. The electrically conductive cylindrical screen has an open end and a closed end. The flange assembly is attached to and electrically connected to the open end of the electrically conductive cylindrical screen. The flange assembly has a hole with a first diameter aligned with a longitudinal axis of the electrically conductive cylindrical screen. The electrode is aligned with the longitudinal axis of the electrically conductive cylindrical screen and extends through the hole of the flange assembly into the electrically conductive cylindrical screen. The insulator seals the hole of the flange assembly around the electrode and maintains a substantially equidistant gap between the electrically conductive cylindrical screen and the electrode. The non-conductive granular material is disposed within the substantially equidistant gap.

INDUCTIVELY COUPLED PLASMA TORCH WITH REVERSE VORTEX FLOW AND METHOD OF OPERATION
20210404968 · 2021-12-30 · ·

We describe in this application the analysis of samples using elemental or mass spectrometry and the analysis of samples, such as biological samples by suspension mass cytometry or imaging mass cytometry and an inductively coupled plasma torch with reverse vortex flow for elemental analysis and a method of operating an ICP torch configured to interface with a spectrometer.

INDUCTIVELY COUPLED PLASMA TORCH WITH REVERSE VORTEX FLOW AND METHOD OF OPERATION
20210404968 · 2021-12-30 · ·

We describe in this application the analysis of samples using elemental or mass spectrometry and the analysis of samples, such as biological samples by suspension mass cytometry or imaging mass cytometry and an inductively coupled plasma torch with reverse vortex flow for elemental analysis and a method of operating an ICP torch configured to interface with a spectrometer.