A desolvation unit performs desolvation by heating after a sample solution is turned to sample mist by a nebulizer. A sample gas that contains the desolvated sample mist and a carrier gas is introduced through a sample introduction tube to a plasma torch. An addition unit for adding, to the sample introduction tube, a water-containing gas is provided. The addition unit includes a container that contains ultrapure water, a gas tube for introducing the carrier gas into the ultrapure water to cause bubbling, and a gas tube for adding the water-containing gas, to the sample introduction tube. The plasma torch generates an inductively coupled plasma under the condition that supplied power is set to a range of 550 W to 700 W. Generation of interfering molecule ions due to an element having a high ionization potential is inhibited when an element in a sample ionized by the plasma is analyzed.

Described is an apparatus for guiding an electromagnetic microwave, having: antenna surrounding walls, which define an interior space so as to surround therein at least an end region of an antenna of a microwave source, in particular laterally annularly as well as frontally; waveguide boundary walls, at least two of which are arranged in parallel to each other, wherein the waveguide boundary walls form a, in particular cuboid-shaped, waveguide having a substantially rectangular cross-section, wherein a cross-sectional plane is defined by a first direction that extends along a longitudinal direction of the antenna and a second direction that extends perpendicularly to the first direction, wherein it holds: 25>a/b>3, wherein a: is a width of the waveguide along the second direction, b: is a height of the waveguide along the first direction, wherein the apparatus is designed to let proceed a microwave from the interior space of the antenna surrounding walls into the waveguide.

A particle acceleration system includes an ion source that generates an ion, an accelerator that accelerates the ion, And a transporting unit that transports the ion from the ion source to the accelerator, in which an attachment angle and an attachment position of the ion source with respect to the transporting unit are able to be adjusted.

A particle acceleration system includes an ion source that generates an ion, an accelerator that accelerates the ion, And a transporting unit that transports the ion from the ion source to the accelerator, in which an attachment angle and an attachment position of the ion source with respect to the transporting unit are able to be adjusted.

The present invention provides a plasma torch which comprises: a first pipe having a first flow channel through which a liquid can flow, a first exit through which the liquid is sprayed being provided on an one end side; a second pipe body that surrounds the first pipe body, and has a second flow channel through which a gas can flow, a second exit through which the gas is sprayed being provided on the one end side; and an electrode extending into the second flow channel. The second exit is provided further to the one end side than the first exit, some of the inner peripheral surface of the second pipe decreases in diameter towards the second exit, and the diameter of the inner peripheral surface closer to the second exit than the first exit is equal to or larger than the opening diameter of the first exit.

The present invention provides a plasma torch which comprises: a first pipe having a first flow channel through which a liquid can flow, a first exit through which the liquid is sprayed being provided on an one end side; a second pipe body that surrounds the first pipe body, and has a second flow channel through which a gas can flow, a second exit through which the gas is sprayed being provided on the one end side; and an electrode extending into the second flow channel. The second exit is provided further to the one end side than the first exit, some of the inner peripheral surface of the second pipe decreases in diameter towards the second exit, and the diameter of the inner peripheral surface closer to the second exit than the first exit is equal to or larger than the opening diameter of the first exit.

The invention is for a material synthesis technology by microwave plasma torch with atmospheric pressure and high temperature. It includes a plasma torch system with atmosphere pressure & high temperature and a material growth system. In the plasma torch system the cutting-edge breakdown happens by inputting the high power microwave. Then the stable plasma torch with atmosphere pressure & high temperature generates under the avalanche effect of the cutting-edge breakdown by the solid precursor at the open-end of the cylindrical metal tube or the precursor carrier gas through the cylindrical metal tube. The result is that the precursors are decomposed and generates the active particles for material growth. In the material growth system the motion and ingredients proportion of negative and positive ions or particles in the active particle beam are controlled by the adjustable static electric field generated by the metal ring and the igniting & control electrode connecting to the external adjustable DC source. And the material growth space is heated by the heating system for the material growth. Then the material controlled growth is implemented by the heating system and the adjustable static electrical field.

The invention is for a material synthesis technology by microwave plasma torch with atmospheric pressure and high temperature. It includes a plasma torch system with atmosphere pressure & high temperature and a material growth system. In the plasma torch system the cutting-edge breakdown happens by inputting the high power microwave. Then the stable plasma torch with atmosphere pressure & high temperature generates under the avalanche effect of the cutting-edge breakdown by the solid precursor at the open-end of the cylindrical metal tube or the precursor carrier gas through the cylindrical metal tube. The result is that the precursors are decomposed and generates the active particles for material growth. In the material growth system the motion and ingredients proportion of negative and positive ions or particles in the active particle beam are controlled by the adjustable static electric field generated by the metal ring and the igniting & control electrode connecting to the external adjustable DC source. And the material growth space is heated by the heating system for the material growth. Then the material controlled growth is implemented by the heating system and the adjustable static electrical field.

Disclosed is an HF plasma generator for generating an inductively coupled plasma in spectrometry, comprising a voltage supply device with a DC voltage source, an oscillator circuit connected to the power supply device for generating HF power, and a load circuit coupled to the oscillator circuit for generating the plasma, said load circuit having at least one induction coil and one capacitor connected in parallel. The HF plasma generator comprises at least one controllable voltage source arranged in a branch of the oscillator circuit. The controllable voltage source is designed to set a voltage applied to the load circuit and/or at least one potential difference between the induction coil and a spectrometer, in particular a cone of the spectrometer. Further disclosed is a spectrometer having an HF plasma generator.

Apparatuses and methods for producing covetic materials by exciting a hydrocarbon gas with pulse microwaves to form hydrocarbon radicals in a hot first region of a microwave reactor. Graphene nanoplatelets are formed by the nucleation, growth and assembly of the hydrocarbon radicals, and contact a metal melt introduced downstream of the hot region to produce a mixture of molten metal and graphene nanoplatelets which assemble in-flight to form covetic materials. Graphene planes are infused in the metal matrix to achieve carbon loadings of at least 60%.