Patent classifications
H05H1/32
INDUCTION DEVICES AND METHODS OF USING THEM
Certain embodiments described herein are directed to induction devices that can be used to sustain a plasma. In certain configurations, the induction device may comprise one or more radial fins electrically coupled to a base. The induction device may take numerous forms including, for example, coils and plate electrodes.
METHOD OF CLEANING PORTION TO BE WELDED, WELDING SYSTEM, AND METHOD OF MANUFACTURING RING
In a method for cleaning a portion to be welded in which a first portion (Pa) to be welded and a second portion (Pb) to be welded, which are to be joined by butt welding, are cleaned, the first and second portions (Pa, Ph) to be welded are cleaned before the butt welding by injecting, with the first and second portions (Pa, Pb) to be welded abutting on each other, plasma produced from a gas containing oxygen into a groove between the first portion (Pa) to be welded and the second portion Pb) to be welded.
ELECTROMECHANICAL LINEARLY ACTUATED ELECTRODE
Approaches herein provide a plasma arc torch including a tip surrounding an electrode, the electrode having a proximal end and a distal end, and a shield surrounding the tip, the shield including an exit orifice proximate the distal end of the electrode. The torch may further include a linear actuating device coupled to the electrode for actuating the electrode such that the distal end of the electrode moves axially relative to the tip and the exit orifice of the shield. In some approaches, the linear actuating device is operable to actuate the electrode along a central longitudinal axis extending through the tip. In some approaches, the linear actuating device may include one of: a micro linear drive motor, a micro linear stepper motor, a voice coil, a solenoid coil, and a magnetostrictive actuator. In some approaches, the electrode is actuated during a welding or cutting cycle of the torch.
METHODS OF USING A PLASMA-GENERATED STREAM OF NO-CONTAINING GAS FOR TREATMENT OF A SPECTRUM OF MEDICAL CONDITIONS
Methods for administering nitric oxide (NO) generated by a plasma source via stream of gas also containing a number of other chemical and physical components that create synergistic effect in treatment of a variety of medical conditions. A stream of gas is generated by a plasma source/sources, in which nitric oxide is a part of its content and in desired concentration and at the appropriate speed, so that therapeutically significant amount of NO is delivered per unit of treated tissue area and per unit of time. The stream also contains other physical and chemical compounds such as H.sub.2O.sub.2, OH, O.sub.2, O.sub.2.sup.? (i.e., oxygen superoxide), heating and UV radiation. The stream of gas generated by plasma source(s) must be precisely directed to the site of action to achieve the best therapeutic result.
Induction devices and methods of using them
Certain embodiments described herein are directed to induction devices that can be used to sustain a plasma. In certain configurations, the induction device may comprise one or more radial fins electrically coupled to a base. The induction device may take numerous forms including, for example, coils and plate electrodes.
Induction devices and methods of using them
Certain embodiments described herein are directed to induction devices that can be used to sustain a plasma. In certain configurations, the induction device may comprise one or more radial fins electrically coupled to a base. The induction device may take numerous forms including, for example, coils and plate electrodes.
Inductively coupled plasma arc device
An inductively coupled plasma device includes a rotary furnace tube and an inductively coupled plasma source. The rotary furnace tube has a first end, a second end and a longitudinal axis. In a first embodiment, the inductively coupled plasma source is disposed proximate to the first end of the rotary furnace tube and is aligned with the longitudinal axis of the rotary furnace such that the inductively coupled plasma source discharges a plasma into the rotary furnace tube. In a second embodiment, the inductively coupled plasma source is a ground electrode disposed within and aligned with the longitudinal axis of the rotary furnace tube, and a second electromagnetic radiation source disposed around or within the rotary furnace tube that generates a wave energy. The inductively coupled plasma source discharges a plasma within the rotary furnace tube.
Inductively coupled plasma arc device
An inductively coupled plasma device includes a rotary furnace tube and an inductively coupled plasma source. The rotary furnace tube has a first end, a second end and a longitudinal axis. In a first embodiment, the inductively coupled plasma source is disposed proximate to the first end of the rotary furnace tube and is aligned with the longitudinal axis of the rotary furnace such that the inductively coupled plasma source discharges a plasma into the rotary furnace tube. In a second embodiment, the inductively coupled plasma source is a ground electrode disposed within and aligned with the longitudinal axis of the rotary furnace tube, and a second electromagnetic radiation source disposed around or within the rotary furnace tube that generates a wave energy. The inductively coupled plasma source discharges a plasma within the rotary furnace tube.
PLASMA WELDING METHOD
One object of the present invention is to provide a plasma welding method capable of performing plasma welding while restraining initial investment in a welding device, and the present invention provide a plasma welding method includes a pilot arc generation step in which a pilot arc is generated between the electrode and the insert chip by supplying a first pilot gas which is easily converted into a plasma state between the electrode and the insert chip while supplying a shield gas between the insert chip and the shield cap; and a first welding step in which, after the pilot arc generation step, a main arc is generated between the electrode and the workpiece by electrically disconnecting the plus terminal and the insert chip by the first selector switch while supplying the first pilot gas and the shield gas.
INDUCTION DEVICES AND METHODS OF USING THEM
Certain embodiments described herein are directed to induction devices that can be used to sustain a plasma. In certain configurations, the induction device may comprise one or more radial fins electrically coupled to a base. The induction device may take numerous forms including, for example, coils and plate electrodes.