A plasma power generator wherein a plasma is generated by subjecting oxygen (O2) to a strong electromagnetic field. The oxygen plasma enters a chamber and is combined with free electrons from an electron-donation element thereby producing heat.

An active gas generator that generates active gas by activating supplied material gas through discharge in a discharge space formed between a high-voltage side electrode component and a ground side electrode component of an active gas generation electrode group. A combined structure of covers completely separates the discharge space from an alternating-current voltage application space, and includes, independently from the alternating-current voltage application space, a material gas flow path for a material gas supply path, through which externally supplied material gas is guided to the discharge space. A housing contact space formed between a metal housing and each of the covers and an electrode component installation table is completely separated from the alternating-current voltage application space and the discharge space.

A handheld plasma tool for controlled application of low temperature atmospheric pressure plasma to material surfaces, e.g. to enhance bonding and or cleaning. The handheld plasma tool can include a hand grip, on/off trigger, display, indicator lights, indexing pin, marking device, cable connections for gas supply and electrical power, and a plasma head for generating at least one reactive gas species at a low temperature. The handheld plasma tool can employ a rotatable clamp for treating backside surfaces. The handheld plasma tool can include motorized wheels to scan over a large area at a controlled speed. Other optional nozzles can also be employed for specialized applications.

This invention relates to a method of increasing the size of particulates in a gas comprising particulates, e.g. a gas that is formed from the combustion of fuels. The method comprises mixing an ionised gas stream with the gas comprising particulates.

A method for creating a random anti-reflective surface structure on an optical fiber including a holder configured to hold the optical fiber comprising a groove and a fiber connector, an adhesive material to hold the optical fiber in the holder and fill any gap between the optical fiber and the holder, a glass to cover the adhesive material and the optical fiber, and a reactive ion etch device. The reactive ion etch device comprises a plasma and is configured to expose an end face of the optical fiber to the plasma. The plasma is configured to etch a random anti-reflective surface structure on the end face of the optical fiber.

An apparatus or device for performing cold atmospheric plasma procedures. The device or apparatus has a housing, a chamber within the housing, an entry port to the chamber, a plurality of exit ports from the chamber, and a plurality of electrodes mounted in the housing, each of the plurality of electrodes having a distal end adjacent one of the plurality of exit ports. The entry port, chamber, exit ports and plurality of electrodes are configured to provide for an inert gas flowing in the entry port and through the chamber to the exit port to become plasmatized by electrical energy applied to the plurality of electrodes to form a cold plasma flowing from the exit ports

There is provision of a substrate processing apparatus including a processing vessel, a radio frequency power supply configured to supply radio frequency (RF) current, and a member connected to the processing vessel electrically. The member is configured such that a surface area per unit volume of a first region of the member corresponding to a particular structure of the processing vessel differs from a surface area per unit volume of a second region of the member other than the first region, in order to adjust impedance of the member.

A gas purifying apparatus, including: at least one cylindrical ground electrode configured to receive gas flowing therethrough; a discharge electrode disposed centrally within each of the at least one cylindrical ground electrode; and a power supply electrically connected to the discharge electrode and the at least one cylindrical ground electrode so as to produce an electric field and a corona discharge from the discharge electrode to a corresponding cylindrical ground electrode to generate ions and free electrons into the gas to ionise substances in the gas for gas purification, wherein the discharge electrode and the corresponding cylindrical ground electrode form at least one plasma chamber when power from the power supply is applied, and wherein the discharge electrode includes: at least one annular plate having an outer edge extending towards the corresponding cylindrical ground electrode.

A method is provided for treating an implant in a medical care center prior to using the implant in a medical procedure. The method comprises applying a plasma-generating electromagnetic (EM) field using at least one electrode so as to generate plasma in a vicinity of the implant while displacing the electrode and the implant relative to one another. A portable plasma module and a docking station configured to connect to the portable plasma module, thereby forming a plasma generating system, are also provided. A plasma generating apparatus for treating an implant prior to using the implant in a medical procedure is also provided.

An active gas generator that generates active gas by activating supplied material gas through discharge in a discharge space formed between a high-voltage side electrode component and a ground side electrode component of an active gas generation electrode group. A combined structure of covers completely separates the discharge space from an alternating-current voltage application space, and includes, independently from the alternating-current voltage application space, a material gas flow path for a material gas supply path, through which externally supplied material gas is guided to the discharge space. A housing contact space formed between a metal housing and each of the covers and an electrode component installation table is completely separated from the alternating-current voltage application space and the discharge space.