The present disclosure describes processes and apparatuses for manufacturing advanced nanosize powder materials that address at least some of the known issues of scalability, continuity, and quality inherent in prior art processes and apparatuses. Also described are nanosized powders with advantageous chemical and/or physical properties that can be used in various applications. The apparatus for producing nanoparticles, comprising a feeding mechanism for feeding a precursor material in fluid form toward a reaction zone along a feed path; a plasma device configured for generating a plasma jet in the reaction zone impinging upon the precursor material at a convergence point between streamlines of the plasma jet and the feed path to produce a reactant gaseous mixture, the plasma jet streamlines being at an angle with respect to the feed path, and a cooling zone receiving the reactant gaseous mixture to cause nucleation and produce the nanoparticles.

Method for treating in an enclosure an inner surface of a container made from polymer material, in order to deposit a barrier coating there on, comprises: inserting the container into the enclosure; introducing a precursor gas into the container intended, once transformed into the plasma state, to be deposited at least partially on the inner surface of the container in order to constitute the coating; wherein the method further comprises: transforming the precursor gas into the plasma state by a combination of excitations comprising a main excitation by means of electromagnetic waves comprising microwaves, and a secondary excitation by means of an electrical discharge of alternating voltage having a frequency between 1 kHz and 15 MHz.

In order to ensure quality even when a sheet-like base material is thin while improving efficiency of production, a plasma treatment apparatus disclosed herein includes a plasma treatment chamber X for treating a sheet-like base material Z with plasma, a high-frequency antenna 3 for generating plasma in the plasma treatment chamber X, and a feeding mechanism 10 for feeding the sheet-like base material Z into the plasma treatment chamber X in a vertical direction.

An example system and corresponding method can include a combustion chamber of jet engine, a radio-frequency power source, and a resonator. The combustion chamber can include a liner defining a combustion zone, and include a fuel inlet configured to introduce fuel into the combustion zone. The resonator can have a resonant wavelength and include: a first conductor, a second conductor, a dielectric, and an electrode coupled to the first conductor. The resonator can be configured such that, when the resonator is excited by the radio-frequency power source with a signal having a wavelength proximate to an odd-integer multiple of one-quarter () of the resonant wavelength, the resonator provides a plasma corona in the combustion zone. The controller can be configured to cause the radio-frequency power source to excite the resonator with the signal so as to provide the plasma corona.

When a plasma processing apparatus changes processing parameters of a plasma processing that include at least a temperature of a stage and a temperature of each zone obtained by dividing a placing surface of the stage into multiple patterns, and measures the temperature of each zone and a supply current to a hater in a state where the temperature is stabilized, an acquisition unit acquires the measurement data. The generator generates a prediction model using the measurement data, assuming that heat with heat quantity proportional to a temperature difference between adjacent zones moves therebetween, heat with heat quantity proportional to a temperature difference between the stage and each zone moves therebetween, heat with heat quantity calculated from the supply current to the heater of each zone is input to the zone, and quantity of heat input and quantity of heat output in each zone are consistent.

A method for a laser-induced excitation of a radio frequency plasma at a low air pressure using a hardware device. The hardware device includes a pulsed laser source, a convex lens, a target material, an ion source system, and a radio frequency power supply system. When an air pressure value of the gas in the ion source system is lower than 1 Pa, and it's difficult to generate the radio frequency plasma, bombarding the target material in the ion source system by a pulsed laser beam; after the ion source system reaches a relatively high vacuum degree, providing gas to generate a plasma for the ion source system, providing the radio frequency electromagnetic field for the internal environment of the ion source system; outputting the high-intensity laser pulse; focusing the laser pulse to form a light spot with a high-power density.

A plasma generation apparatus includes a plasma generation unit. The plasma generation unit has a spherical or elliptical cavity. The plasma generation unit receives radio-frequency (RF) power in such a manner that bounce resonance of electrons is performed to generate plasma in the cavity. The cavity has a plasma extraction hole to communicate with an external space.

An integrated gas-enhanced electrosurgical generator. The generator comprises a high frequency power module, a low frequency power module and a gas module. The high frequency power module adapted to generate an electrical energy having a band of frequencies centered around a first frequency, wherein the electrical energy has a first power as the first frequency and a second power lower than the first power at a second frequency lower than the first frequency. The low frequency power module having an input connected to an output of the high frequency module. The low frequency module comprises a resonant transformer comprising a ferrite core, a primary coil and a secondary coil, the secondary coil having a larger number of turns than the primary coil, wherein the resonant transformer has a resonant frequency equal to the second frequency. The gas module is adapted to control a flow of an inert gas.

A treatment apparatus which uses thermal or non-thermal plasma to treat urinary tract infections (UTIs) by destroying bacteria. The apparatus comprises an elongate probe that includes a coaxial cable for conveying radiofrequency (RF) electromagnetic (EM) energy and/or microwave EM energy, a probe tip connected at the distal end of the coaxial cable for receiving the RF and/or microwave EM energy, and a gas conduit for conveying gas to the probe tip. The probe tip comprises a first electrode connected to the inner conductor of the coaxial cable, and a second electrode connected to the outer conductor of the coaxial cable, and wherein the first electrode and second electrode are arranged to produce an electric field from the received RF and/or microwave EM energy across a flow path of gas received from the gas conduit to produce a thermal or a non-thermal plasma.

An ionization chamber is disclosed that can free ions in water creating polarized atoms of hydrogen and oxygen derived from water in the process. The water can be comprised of non potable waste water. Once the hydrogen and oxygen ions are released, and polarized in the process, the electrons can be aligned such that the end product is the release of hydrogen and the bonding of the oxygen with the free electrons of the other element(s) such as Titanium or Tungsten for example, without high heat or pressure as is normally required. The chamber is comprised of a series of metallic rods, a series of solid nickel mesh plates, a vacuum pump, a dual pulsed D.C. Power supply (from 200-800 VDC pulsed and a low power, 24 VDC pulsed at 400-600 Hz.), a water bath chamber, a ceramic or teflon encapsulated feeder assembly, and an R.F. Pulse generator.