Patent classifications
H05H1/50
System, method and apparatus for an inductively coupled plasma arc whirl filter press
A plasma treatment system includes a plasma arc torch, a tee attached to a hollow electrode nozzle of the plasma arc torch, and a screw feed unit or a ram feed unit having an inlet and an outlet attached to the tee. The plasma arc torch includes a cylindrical vessel having a first end and a second end, a first tangential inlet/outlet connected to or proximate to the first end, a second tangential inlet/outlet connected to or proximate to the second end, an electrode housing connected to the first end of the cylindrical vessel such that a first electrode is (a) aligned with a longitudinal axis of the cylindrical vessel, and (b) extends into the cylindrical vessel, and a hollow electrode nozzle connected to the second end of the cylindrical vessel such that a centerline of the hollow electrode nozzle is aligned with the longitudinal axis of the cylindrical vessel.
PLASMA SPRAY SYSTEMS AND METHODS
Plasma spray systems comprise multiple zones wherein the energy required for different processes within the systems can be controlled independently. In some embodiments, a plasma spray system comprises a first zone wherein ionic species are generated from the target material using a first energy input, and the ionic species either combine to form a plurality of particles in the first zone, or form coatings on a plurality of input particles input into the first zone. The plasma spray system can further comprise a second zone, comprising a chamber coupled to a microwave energy source, which ionizes the plurality of particles to form a plurality of ionized particles and form a plasma jet. The plasma spray system can further comprise a third zone, comprising an electric field to accelerate the plurality of ionized particles and form a plasma spray.
Liquid treatment apparatus including first electrode, second electrode, and first and second insulators surrounding lateral surface of first electrode
A liquid treatment apparatus includes a liquid storing vessel, a first electrode, a second electrode at least partly arranged inside the vessel, a tubular first insulator surrounding a first-electrode lateral surface with a first space interposed therebetween, and including a first opening in an end surface in contact with the liquid, a tubular second insulator surrounding the first-electrode lateral surface inside the first insulator, a gas supply device supplying gas into the first space and ejecting the gas into the liquid through the first opening, and a power supply applying a voltage between the first and second electrodes and producing plasma. The second insulator is arranged with a second space interposed between the first and second insulators. Portions of the first and second insulators, those portions being positioned inside the vessel, are covered with the gas when the gas is supplied into the first space by the gas supply device.
Liquid treatment apparatus including first electrode, second electrode, and first and second insulators surrounding lateral surface of first electrode
A liquid treatment apparatus includes a liquid storing vessel, a first electrode, a second electrode at least partly arranged inside the vessel, a tubular first insulator surrounding a first-electrode lateral surface with a first space interposed therebetween, and including a first opening in an end surface in contact with the liquid, a tubular second insulator surrounding the first-electrode lateral surface inside the first insulator, a gas supply device supplying gas into the first space and ejecting the gas into the liquid through the first opening, and a power supply applying a voltage between the first and second electrodes and producing plasma. The second insulator is arranged with a second space interposed between the first and second insulators. Portions of the first and second insulators, those portions being positioned inside the vessel, are covered with the gas when the gas is supplied into the first space by the gas supply device.
Apparatus and Method for Generating Nitric Oxide in Controlled and Accurate Amounts
A nitric oxide generator generates nitric oxide from a mixture of nitrogen and oxygen such as air treated by a pulsating electrical discharge. The desired concentration of nitric oxide is obtained by controlling at least one of a frequency of the pulsating electrical discharge and duration of each electrical discharge pulse.
Apparatus and method for generating nitric oxide in controlled and accurate amounts
A nitric oxide generator generates nitric oxide from a mixture of nitrogen and oxygen such as air treated by a pulsating electrical discharge. The desired concentration of nitric oxide is obtained by controlling at least one of a frequency of the pulsating electrical discharge and duration of each electrical discharge pulse.
Apparatus and method for generating nitric oxide in controlled and accurate amounts
A nitric oxide generator generates nitric oxide from a mixture of nitrogen and oxygen such as air treated by a pulsating electrical discharge. The desired concentration of nitric oxide is obtained by controlling at least one of a frequency of the pulsating electrical discharge and duration of each electrical discharge pulse.
Cathode arc source, filters thereof and method of filtering macroparticles
A filter (104a, 104b, 108) for a cathode arc source comprises: a filter duct having at least one bend (104a, 104b), and a first magnetic field source for steering plasma through the filter duct for removal of macroparticles from the plasma; wherein the apparatus comprises a second magnetic field source (108) which is rotatably mounted surrounding a portion of the filter duct. Cathode arc sources (102) and cathode arc deposition apparatuses (106) comprise the filters described herein, and methods of filtering macroparticles from a beam of plasma emitted from a cathode arc source use the filters.
Cathode arc source, filters thereof and method of filtering macroparticles
A filter (104a, 104b, 108) for a cathode arc source comprises: a filter duct having at least one bend (104a, 104b), and a first magnetic field source for steering plasma through the filter duct for removal of macroparticles from the plasma; wherein the apparatus comprises a second magnetic field source (108) which is rotatably mounted surrounding a portion of the filter duct. Cathode arc sources (102) and cathode arc deposition apparatuses (106) comprise the filters described herein, and methods of filtering macroparticles from a beam of plasma emitted from a cathode arc source use the filters.
SOURCES FOR PLASMA ASSISTED ELECTRIC PROPULSION
An apparatus generates energetic particles and generates a plasma of a vaporized solid material and gaseous precursors for the application of coatings to surfaces of a substrate by way of condensation of plasma and for electric propulsion applications.