Patent classifications
H05K3/146
Wiring on Curved Surfaces
A process for creating wiring on a curved surface, such as the surface of a contact lens, includes the following. Creating a groove or trench in the curved surface. Forming a seed layer on the surface and on the groove. Removing the seed layer from the surface while leaving some or all of it in the groove. Depositing conductive material in the groove. Preferably, the deposited conductive material is thicker than the seed layer.
Circuit board comprising an insulating diamond material
A circuit board is described. The circuit board comprises an electrically insulating diamond material having a surface. The electrically insulating diamond material has at least one recess extending into only a portion of a thickness of the electrically insulating diamond material from the surface of the electrically insulating diamond material. The circuit board also comprises an electrically conductive material located at least partially within the recess.
Warpage control with intermediate material
A mounting device for mounting electronic components, wherein the mounting device comprises an electrically conductive structure having a first value of thermal expansion in at least one pre-defined spatial direction, an electrically insulating structure having a second value of thermal expansion in the at least one pre-defined spatial direction being different from the first value and being arranged on the electrically conductive structure, and a thermal expansion adjustment structure having a third value of thermal expansion in the at least one pre-defined spatial direction, wherein the third value is selected and the thermal expansion adjustment structure is located so that thermally induced warpage of the mounting device resulting from a difference between the first value and the second value is at least partially compensated by the thermal expansion adjustment structure.
GRAPHENE WIRING STRUCTURE AND METHOD FOR MANUFACTURING GRAPHENE WIRING STRUCTURE
A graphene wiring structure of an embodiment has a substrate, a metal part on the substrate, multilayered graphene connected to the metal part, a first insulative film on the substrate, and a second insulative film on the substrate. The metal part is present between the first insulative film and the second insulative film. Edges of the multilayered graphene are connected to the metal part. A side face of the first insulative film vertical to the substrate opposes a side face of the second insulative film vertical to the substrate. A first outer face of the multilayered graphene is in physical contact with a first side face of the first insulative film vertical to the substrate. A second outer face of the multilayered graphene is in physical contact with a second side face of the second insulative film vertical to the substrate.
Patterned conductive structure and method for forming the same
A method for forming a patterned conductive structure is provided. The method includes forming a soluble layer on a surface of a substrate, wherein the soluble layer has an opening exposing a rough portion of the surface. A first conductive layer is formed on the soluble layer, wherein the first conductive layer extends onto the rough portion in the opening. The soluble layer and the first conductive layer on the soluble layer are removed, wherein a portion of the first conductive layer corresponding to the rough portion is remained on the substrate. A patterned conductive structure formed by the method is also provided.
METHOD OF PATTERNING GRAPHENE HOLES AND METHOD OF FABRICATING GRAPHENE TRANSPARENT ELECTRODE BY USING PULSE LASER
A method of patterning holes includes placing a substrate on a stage of a laser system, the substrate having a graphene layer on a surface thereof, generating a pulse laser from the laser system, and forming a plurality of hole patterns spaced apart from each other on the graphene layer by irradiating the pulse laser while the graphene layer is in motion.
FILM THICKNESS REGULATOR AND MANUFACTURING METHOD THEREOF, FILM THICKNESS REGULATING METHOD AND EVAPORATION APPARATUS
A film thickness regulator and its manufacturing method, a regulating method, an evaporation apparatus are disclosed. The film thickness regulator comprises a frame and at least two deformable thin films disposed therein, the film surfaces of which are parallel to each other; each deformable thin film is provided with conductive structures and via holes for molecules of an evaporation coating material to pass through; when voltages are applied to the conductive structures of any two deformable thin films, due to the attraction or repulsion between the conductive structures, the two deformable thin films are moved, and the relative positions of the via holes of any two deformable thin films change, thus solving the problem that the uniformity of the thickness of the evaporation coating film is poor in the related art, and achieving the effect of improving the uniformity of the thickness of the evaporation coating film.
Hydrophobic low-dielectric-constant film and preparation method therefor
The present disclosure provides a hydrophobic low-dielectric-constant film and a preparation method therefor. The low-dielectric-constant film is formed from one or more fluorine-containing compounds A by means of a plasma enhanced chemical vapor deposition method, and the one or more fluorine-containing compounds comprise a compound having the general formula C.sub.xSi.sub.yO.sub.mH.sub.nF.sub.2x+2yn+2 or C.sub.xSi.sub.yO.sub.mH.sub.nF.sub.2x+2yn, x being an integer from 1 to 20, y being an integer from 0 to 8, m being an integer from 0 to 6, and n being 0, 3, 6, 7, 9, 10, 12, 13, 15, 16, 17 and 19. Thus, a nano-film having a low dielectric constant and good hydrophobicity is formed on the surface of a substrate.
CHEMICAL VAPOR DEPOSITION METHOD OF DEPOSITING IRIDIUM OXIDE ON NEURAL PROBE, PROVIDED ON FLEXIBLE PRINTED CIRCUIT BOARD, USING OZONE GAS
Disclosed is a chemical vapor deposition method of depositing iridium oxide on a neural probe, provided on a flexible printed circuit board, using ozone gas, the chemical vapor deposition method including: step S100 of introducing an iridium precursor into a reaction chamber (furnace) in which a printed circuit board having a neural probe provided thereon is placed, and purging the inside of the reaction chamber with an inert gas for a predetermined time; and step S200 of introducing ozone (O.sub.3) gas and an inert gas into the reaction chamber, and reacting the iridium precursor with the ozone gas at a predetermined reaction temperature, thereby depositing iridium oxide (IrO.sub.2) on the surface of the neural probe.
Systems for printing viscous materials using laser assisted deposition
In systems for printing a viscous material, the printing and post processing of the viscous material are performed sequentially one after another. In an initial step, a viscous material is printed on a sample mounted on a receiver substrate using a donor module and a laser scanner, and then the donor module is replaced with a post processing system for performing a post processing operation (and vice versa). Multiple post processing operations can be performed, and multiple different materials can be printed on the same layer. The systems can increase the speed, resolution and diversity of materials printed on the same sample, and opens the possibilities for new designs.