A method for fabricating a semiconductor device includes: forming a first conductive structure over a substrate; forming a multi-layer spacer including a non-conformal sacrificial spacer on both sidewalls of the first conductive structure; forming a second conductive structure adjacent to the first conductive structure with the multi-layer spacer therebetween; forming an air gap by removing the non-conformal sacrificial spacer; forming a capping layer covering the second conductive structure and the air gap; forming an opening that exposes a top surface of the second conductive structure by etching the capping layer; and forming a conductive pad coupled to the second conductive structure in the opening.

The present invention relates to the field of semiconductor manufacturing technologies, in particular to a semiconductor device and a method of forming the same. The method of forming the semiconductor device includes the following steps: forming a substrate with a trench, a gate dielectric layer covering an inner wall of the trench, a barrier layer covering a portion of a surface of the gate dielectric layer, and a first gate layer filled on an surface of the barrier layer being disposed in the trench; removing a portion of the barrier layer to form an groove located between the first gate layer and the gate dielectric layer; forming a channel dielectric layer at least covering an inner wall of the groove and a top surface of the first gate layer; and forming a second gate layer at least partially filling an interior of the groove.

Provided is a semiconductor device, including an insulating layer, a transistor located on the insulating layer, and a conductive structure, in which the transistor includes: a source, a channel and a drain arranged in parallel, as well as a gate dielectric layer and a gate structure, in which the gate dielectric layer is located between the gate structure and the channel; the conductive structure covers one sidewall of the channel and is used for grounding; the gate structure is disposed around the other three sidewalls of the channel; and the gate structure and the conductive structure are isolated from each other.

A sub-word-line driver and semiconductor memory devices including the same are provided. The sub-word-line driver may include a word line pull-up transistor, a word line pull-down transistor, and a keeping transistor configured to maintain a word line at a specified voltage level. The sub-word-line driver may include a peripheral active region on a substrate, a first peripheral gate electrode that corresponds to a gate node of the word line pull-down transistor on the peripheral active region, a second peripheral gate electrode that corresponds to a gate node of the keeping transistor on the peripheral active region, and a first lower contact coupled to a first region of the peripheral active region. A first (VBB) voltage from the first region may be supplied to a source node of the keeping transistor.

A semiconductor memory device includes: memory units arranged in a first direction; first semiconductor layers arranged in the first direction and electrically connected to the memory units; first gate electrodes arranged in the first direction and opposed to the first semiconductor layers; a first wiring extending in the first direction and connected to the first semiconductor layers; second wirings arranged in the first direction, and connected to the first gate electrodes; second semiconductor layers arranged in the first direction and disposed at first end portions of the second wirings; second gate electrodes arranged in the first direction and opposed to the second semiconductor layers; third semiconductor layers arranged in the first direction and disposed at second end portions of the second wirings; and third gate electrodes arranged in the first direction and opposed to the third semiconductor layers.

Provided is a semiconductor memory device comprising a device isolation pattern in a substrate and defining first and second active sections spaced apart from each other, wherein a center of the first active section is adjacent to an end of the second active section, a bit line that crosses over the center of the first active section, a bit-line contact between the bit line and the first active section, and a first storage node pad on the end of the second active section. The first storage node pad includes a first pad sidewall and a second pad sidewall. The first pad sidewall is adjacent to the bit-line contact. The second pad sidewall is opposite to the first pad sidewall. When viewed in plan, the second pad sidewall is convex in a direction away from the bit-line contact.

A semiconductor device includes: a substrate; a memory cell region over the substrate; a peripheral region over the substrate, the peripheral region being adjacent to the memory cell region; and a plurality of first and second word-lines extending across the memory cell region and the peripheral region; wherein the plurality of first word-lines and the plurality of second word-lines are arranged alternately with each other; and wherein the length of the first word-line in the peripheral region is longer than the length of the second word-line in the peripheral region.

A semiconductor memory device includes a substrate, memory layers, a first wiring disposed at a position closer to the substrate than memory layers or a position farther from the substrate than memory layers, a transistor layer disposed between memory layers and the first wiring, and a second wiring connected to the memory layers and the transistor layer. Each of memory layers includes a memory unit, a first semiconductor layer connected between the memory unit and the second wiring, a first electrode opposed to the first semiconductor layer, a third wiring connected to the first electrode, a second semiconductor layer electrically connected to one end portion of the third wiring, and a second electrode opposed to the second semiconductor layer. The transistor layer includes a third semiconductor layer connected between the first wiring and the second wiring, and a third electrode opposed to the third semiconductor layer.

Embodiments of the present application provide a method of fabricating a memory, the method comprises: providing a substrate, wherein grooves are disposed in the substrate; forming a gate insulation layer on a surface of each groove; forming a metal layer on the gate insulation layer, the metal layer being at least fully filled in the groove; surface-processing the metal layer, to enhance flatness of a surface of the metal layer; and etching to remove the metal layer by a certain thickness to form a gate electrode whose top is lower than a surface of the substrate. Embodiments of the present application facilitate to solve the problem of unevenness at the top surface of the gate electrode.

The present disclosure relates to the field of semiconductor technologies, and provides a semiconductor structure and a method for manufacturing the same. The semiconductor structure includes a semiconductor base, bit lines and word lines, wherein a plurality of active regions is provided in the semiconductor base; the bit lines are disposed in the semiconductor base, extend in a first direction and are connected to the active regions; and the word lines are disposed on the semiconductor base above the bit lines, extend in a second direction, and intersect with the active regions.