A semiconductor device and a method for manufacturing a semiconductor device are provided. The semiconductor device includes a substrate, and a plurality of storage structures stacked on the substrate. Each of the plurality of storage structures includes: a first dielectric layer; at least one channel layer arranged in the first dielectric layer and extending in a first direction, the first dielectric layer being provided with a plurality of first grooves isolating the at least one channel layer; and a capacitor structure covering a sidewall and a bottom surface of each of the plurality of first grooves.

A semiconductor structure and a method for forming a semiconductor structure are provided. The semiconductor structure includes: a substrate, multiple active pillars located in the substrate, and multiple word lines. The multiple active pillars are arranged in an array in a first direction and a second direction. The first direction and the second direction are both directions parallel to a top surface of the substrate, and the first direction and the second direction intersect. The multiple word lines are spaced apart in the first direction. Each of the word lines extends in the second direction and continuously surrounds and covers a portion of a side wall of each of the multiple active pillars arranged in the second direction. Any two adjacent word lines are at least partially staggered in a direction perpendicular to the top surface of the substrate.

A semiconductor device and method for manufacturing the same are provided. The semiconductor device includes a substrate, a bonding structure, a bit line, and a word line. The bonding structure is disposed on the substrate. The bit line is disposed on the bonding structure. The channel layer is disposed on the bit line. The word line surrounds the channel layer. The bonding structure includes a dielectric material.

A transistor comprises semiconductor material that is generally L-shaped or generally mirror L-shaped in at least one straight-line vertical cross-section thereby having an elevationally-extending stem and a base extending horizontally from a lateral side of the stem above a bottom of the stem. The semiconductor material of the stem comprises an upper source/drain region and a channel region there-below. The transistor comprises at least one of (a) and (b), where (a): the semiconductor material of the stem comprises a lower source/drain region below the channel region, and (b): the semiconductor material of the base comprises a lower source/drain region. A gate is operatively laterally adjacent the channel region of the stem. Other embodiments are disclosed, including arrays of memory cells individually comprising a capacitor and an elevationally-extending transistor. Methods are disclosed.

A method of fabricating a memory device includes forming an oxide layer on a semiconductor substrate, and forming an isolation structure in the semiconductor substrate and the oxide layer to define an active area. The method also includes forming a word line and a bit line in the semiconductor substrate, wherein the bit line is above the word line. The method further includes removing the oxide layer to form a recess between the isolation structure and the bit line, and forming a storage node contact in the recess. In addition, from a top view, the storage node contact of the memory device overlaps a corresponding portion of the active area.

Embodiments of the present disclosure provide a semiconductor structure and a manufacturing method thereof. According to embodiments of the present disclosure, a height of the work function layer, especially a height of the second portion of the work function layer, is significantly increased, and a height of the first gate material layer is significantly reduced, so that the height ratio of the second portion of the work function layer to the first gate material layer to the second gate material layer is maintained at 3 to 8:1 to 1.5:1; therefore, it can be ensured that the work function of the WL groove filling material layer of the recessed gate structure with a small WL width will be significantly increased, thereby greatly weakening the row hammer effect at the bottom of the WL groove and obviously reducing the GIDL effect at the upper part of the WL groove.

A device structure includes a first interconnect line along a longitudinal direction and a second interconnect line parallel to the first interconnect line, where the first interconnect structure is within a first metallization level and the second interconnect line is within a second metallization level. A first transistor and a laterally separated second transistor are on a same plane above the second interconnect line, where a gate of the first transistor is coupled to the first interconnect line and a gate of the second transistor is coupled to the second interconnect line. A first capacitor is coupled to a first terminal of the first transistor and a second capacitor is coupled to a first terminal of the second transistor. A third interconnect line couples a second terminal of the first transistor with a second terminal of the second transistor.

Embodiments relate to a semiconductor structure, a memory structure and fabrication methods thereof. The semiconductor structure includes: a substrate, where a spacer is provided on the substrate, and a bit line structure is provided in the spacer and is at least partially exposed to the spacer; active area structures, where each of the active area structures includes an active pillar and a stress layer, the active pillar is positioned on the bit line structure, and the stress layer covers an exposed surface of the active pillar; each of the active area structure includes a first connection terminal, a second connection terminal, and a channel region positioned between the first connection terminal and the second connection terminal, and the first connection terminal is electrically connected to the bit line structure; and a word line structure covering a periphery of the channel region.

Memory devices and methods of forming memory devices are described. The memory devices comprise a silicon nitride hard mask layer on a ruthenium layer. Forming the silicon nitride hard mask layer on the ruthenium comprises pre-treating the ruthenium layer with a plasma to form an interface layer on the ruthenium layer; and forming a silicon nitride layer on the interface layer by plasma-enhanced chemical vapor deposition (PECVD). Pre-treating the ruthenium layer, in some embodiments, results in the interface layer having a reduced roughness and the memory device having a reduced resistivity compared to a memory device that does not include the interface layer.

Disclosed herein are memory cells and memory arrays, as well as related methods and devices. For example, in some embodiments, a memory device may include: a support having a surface; and a three-dimensional array of memory cells on the surface of the support, wherein individual memory cells include a transistor and a capacitor, and a channel of the transistor in an individual memory cell is oriented parallel to the surface.