The present invention provides a display panel, a manufacturing method of the display panel, and an intelligent terminal. The display panel has a photosensitive region for placing a photosensor of a camera. The display panel includes: an array substrate; and anodes disposed on the array substrate. The photosensitive region is arranged on one side of the array substrate away from the anodes, and the anode which is arranged corresponding to the photosensitive region has a patterned structure.

The present invention provides an organic light-emitting diode (OLED) display panel including a substrate, a thin-film transistor, an insulating layer, an auxiliary electrode, an organic light-emitting layer, a shielding stage, and a common electrode. The common electrode is electrically connected to the auxiliary electrode. The shielding stage includes at least one organic material layer. An angle between the shielding stage and the substrate is a threshold value.

A display panel includes: a base substrate; a circuit layer on the base substrate; and a display element layer on the circuit layer, wherein the circuit layer includes an active layer on the base substrate and containing boron and fluorine; a control electrode on the active layer; and a control electrode insulation layer between the active layer and the control electrode, wherein the active layer includes: a core layer in which a concentration of the boron is greater than a concentration of the fluorine; and a surface layer on the core layer and in which a concentration of the fluorine is greater than a concentration of the boron.

An organic light-emitting diode (OLED) display panel and a method for manufacturing the same are provided. The OLED display panel at least includes a thin film transistor (TFT) array substrate, a passivation layer, a planarization layer, and planarization-compensating layer. The planarization layer has a first planarization part corresponding to a light-emitting area, and a second planarization part corresponding to a defining area and a part of the light-emitting area. Height of a surface of the planarization-compensating layer from the surface of the TFT array substrate and height of a surface of the second planarization part from the surface of the TFT array substrate are level.

Provided are a display substrate, a preparation method thereof, a method for bonding a display panel, and a display apparatus. The display substrate includes a display region and a bezel region, the display region includes multiple corner regions and the corner regions include a corner display region and a blank corner cutting region which are alternately disposed. The corner display region includes a composite wiring layer disposed on a base substrate, a drive structure layer disposed on the composite wiring layer and light-emitting elements disposed on the drive structure layer. The composite wiring layer includes a first wiring layer, a second wiring layer and a first insulating layer disposed between the first wiring layer and the second wiring layer. The drive structure layer includes a pixel drive circuit and multiple connection electrodes. The first wiring layer includes a gate line, and the second wiring layer includes a data line.

It is an object of the invention to provide a technique to manufacture a display device with high image quality and high reliability at low cost with high yield. The invention has spacers over a pixel electrode layer in a pixel region and over an insulating layer functioning as a partition which covers the periphery of the pixel electrode layer. When forming a light emitting material over a pixel electrode layer, a mask for selective formation is supported by the spacers, thereby preventing the mask from contacting the pixel electrode layer due to a twist and deflection thereof. Accordingly, such damage as a crack by the mask does not occur in the pixel electrode layer. Thus, the pixel electrode layer does not have a defect in shapes, thereby a display device which performs a high resolution display with high reliability can be manufactured.

A method of fabricating a display panel may include forming an oxide semiconductor pattern on a base layer including a first region and a second region, etching first, second, and third insulating layers to form a first groove that overlaps the second region, forming electrodes on the third insulating layer, forming a fourth insulating layer on the third insulating layer to cover the electrodes, thermally treating the fourth insulating layer, forming an organic layer to cover the fourth insulating layer, and forming an organic light emitting diode on the organic layer.

A method of manufacturing a display panel includes fabricating a display portion on a glass substrate; forming a barrier layer on the glass substrate outside the display portion; forming an encapsulation film on the barrier layer and the display portion; and obtaining a panel area by removing the barrier layer and the encapsulation film outside a predetermined limited area on the glass substrate. The predetermined limited area corresponds to the display portion.

The present invention provides a method of manufacturing high-resolution Micro-OLED, including following steps: S1: providing a base substrate and preparing a light-emitting pixel layer on the base substrate; S2: preparing a thin film packaging layer on the light-emitting pixel layer to encapsulating the light-emitting pixel layer; S3: preparing a black matrix layer and a light converting layer for converting one color into another color on the thin film packaging layer, and the light converting layer comprising color change layer; S4: encapsulating the black matrix layer and the light converting layer to obtain high-resolution Micro-OLED. Compared with the prior arts, the method of the present invention uses the localized surface plasmon resonance effect of the metal in the light conversion layer to make the intensity of the fluorescence peak the sub-pixel increases and make the blue peak disappeared, thereby effectively improving the overall color gamut.

An organic light-emitting diode device and a manufacturing method thereof are provided. The organic light-emitting diode device includes an array substrate, a light-emitting layer and a thin-film encapsulation layer stacked in order from bottom to top. The thin-film encapsulation layer includes a first inorganic layer, an organic layer and at least one dielectric structure layer in a stack. There is the dielectric structure layer is disposed in the thin-film encapsulation layer.