Disclosed are a quantum dot material, a quantum dot light emitting device, a display apparatus and a manufacturing method. The quantum dot material includes: a quantum dot, an anionic ligand, and a linking group linking the quantum dot and the anionic ligand, wherein the anionic ligand is configured to bind to a ring molecule by electrostatic force.

The present disclosure provides a photoresist composition, a pixel definition layer, a display substrate and a method for preparing the same, and a display device. The photoresist composition includes: 5 to 25 wt % of polymethacrylate; 1 to 15 wt % of a lyophobic compound; 1 to 5 wt % of a temperature sensitive polymer; 0.5 to 2 wt % of a photoinitiator; and 0.1 to 1 wt % of a monomer.

A transparent organic light emitting display apparatus and a method of manufacturing the same are discussed. The transparent organic light emitting display apparatus can comprise an emission area, a transmission area disposed adjacent to the emission area and configured to pass external light therethrough, and an undercut area formed in the transmission area, wherein the undercut area is filled by an encapsulation layer.

A method for manufacturing the display substrate is provided, including providing a substrate, providing a green light emitting element on the substrate forming a green color resist film layer on a light exit side of the green light emitting element; forming a pattern including a green color film layer by adjusting a irradiation time of the exposure light irradiated to the green color resist film layer using a digital gray scale adjustment method.

A production method to fabricate precision micro-mask for the production of ultra-high resolution Active-Matrix Organic Light Emitting Diode (AMOLED) display is disclosed. The production process of the micro-mask includes the following processes: S1, select the substrate and cleaning. S2, fabricate the main body of micro-mask on the substrate. The main body of micro-mask includes sequentially preparation of debonding layer, the first metal layer and the second metal layer; or sequentially preparation of organic polymer layer, the first metal layer and the second metal layer. S3, welding the mask frame to the second metal layer after alignment, fabricate perforation through holes in the main body of the micro-mask based on the requirement of the display subpixel design; or fabricate perforation through holes in the micro-mask based on the requirement of the display subpixel design, then welding the mask frame to the second metal of the main body of the micro-mask. The precision micro-mask is completed after debonding from the substrate. With the precision micro-mask prepared, the high efficiency, ultra-high resolution (>1000 ppi) AMOLED display with Red-Green-Blue, or other color combinations, side-by-side architecture can be produced.

Disclosed are a quantum dot material, a method for patterning a quantum dot film and a quantum dot light emitting device. when preparing a patterned quantum dot film, firstly, a quantum dot film is made by using the quantum dot material with the photolysis group, and a corresponding region of the quantum dot film is irradiated with ultraviolet light under the shielding of a mask template, so that the photolysis group in the corresponding region is photolyzed into the polarity change group, thereby changing the solubility of the quantum dot material in the corresponding region; and subsequently, the quantum dot film is cleaned by using a solvent which can dissolve the quantum dot material with the photolysis group, the quantum dot material in non-irradiated regions is dissolved and removed, and the quantum dot material in the corresponding region is retained to form a pattern of the quantum dot film.

The present disclosure provides a mask plate, a display panel and a display device. The mask plate comprises: a transparent substrate; an opaque film layer, the opaque film layer being disposed on the transparent substrate. The opaque film layer includes a plurality of first regions and a plurality of second regions, a first sub-region in the first region and the second region are transmissive, and the remaining portion in the first region is semi-transmissive. The mask plate is used to form via holes in the planarization layer of the display panel by exposure, so that the angles between the metal electrode layers disposed in the via holes and the source/drain layers of the display panel are small and diversified, decreasing the visibility of the metal electrode layers.

The present application relates to a compound of Chemical Formula 1 and an organic light emitting device including the same.

A display substrate, comprising a plurality of light emitting units of different colors, each of which comprises: an electron transport layer, a hole transport layer, a quantum-dot light emitting layer located between the electron transport layer and the hole transport layer; and a hydrophilicity and hydrophobicity variable layer, located between the electron transport layer and the quantum-dot light emitting layer and configured to undergo an exposure treatment to change hydrophilicity and hydrophobicity of sides of the hydrophilicity and hydrophobicity variable layer that are in contact with the electron transport layer and the quantum-dot light emitting layer.

The present invention discloses a patterned perovskite film, a preparation method thereof, and a display device. The method includes mixing a perovskite precursor and a photo-initiated polymer monomer, and realizing polymerization of a part of a predetermined area under shielding of a photomask, that is, the formed perovskite crystals are encapsulated by the formed polymer with formation of the patterned perovskite film.