A display panel and a preparation method thereof, the display panel includes a substrate layer, a passivation layer, a plurality of color resisting units, a plurality of anodes, a pixel definition layer, a light emitting layer and a cathode. The present disclosure through makes at least one of the color resisting units partially cover a projection of the light emitting layer on the color resisting units to overcome the problem that part of the light emitted from the light emitting layer passing through the color resistance unit for adjusting a color gamut, and the brightness of part of the unadjusted light will not lost, thus, at last, the display panel has lack of display brightness due to adjusting the color gamut of the display and using the color resistance unit.

In some embodiments, the present disclosure relates to a display device that includes an isolation structure disposed over a reflector electrode, a transparent electrode disposed over the isolation structure, an optical emitter structure disposed over the transparent electrode, and a via structure. The via structure extends from the transparent electrode at a top surface of the isolation structure to a top surface of the reflector electrode. The via structure includes a center horizontal segment that contacts the top surface of the reflector electrode, a sidewall vertical segment that contacts an inner sidewall of the isolation structure, and an upper horizontal segment that is connected to the center horizontal segment by the sidewall vertical segment. The upper horizontal segment is thicker than the center horizontal segment.

A mask includes a first light-transmitting portion. The first light-transmitting portion includes a target region and at least one compensation region connected to the target region. A planar pattern of the target region includes a plurality of corners, and a planar pattern of each compensation region extends from one of the plurality of corners. An area of the planar pattern of each compensation region is less than an area of the planar pattern of the target region.

A display device includes a plurality of pixel electrodes spaced apart from each other, in which each pixel electrode includes a central part and a peripheral part surrounding the central part, a pixel defining layer disposed on the plurality of pixel electrodes and including an overlap part overlapping the peripheral part when viewed in a plan view, and a lateral side to define a pixel opening exposing the central part, in which a portion of the overlap part has an undercut, a light emitting material disposed on the central part exposed through the pixel opening, and a common electrode including a first part disposed on the light emitting material on the central part and a second part disposed on the pixel defining layer, in which the first part is disconnected from the second part along the undercut portion.

A display apparatus including a pixel. The pixel includes a capacitor connected to a first voltage line, a light emitting element connected to a second voltage line, a first transistor including a first gate electrode connected to the capacitor, a second transistor connected to a data line and including a second gate electrode connected to the first scan line, a third transistor including a third gate electrode connected to a second scan line, and a fourth transistor including a fourth gate electrode connected to a third scan line, wherein at least one of the third transistor or the fourth transistor includes a plurality of active areas spaced apart from each other with a common conductive area therebetween, wherein at least one of the third gate electrode or the fourth gate electrode overlaps each of the common conductive area and the plurality of active areas in a plan view.

A method for patterning a quantum dot layer comprises: forming, on a substrate (1), a front film layer and a sacrificial layer (5) which are stacked in sequence, wherein one of the sacrificial layer and the front film layer is hydrophilic, and the other of the sacrificial layer and the front film layer is hydrophobic; forming a photoresist (6) having a through hole on the sacrificial layer, wherein the through hole corresponds to a target region, and etching the sacrificial layer in the target region under the shielding of the photoresist; laying a quantum dot material, and curing the quantum dots material of the target region; and removing the remaining sacrificial layer and the photoresist, and forming a patterned quantum dot layer in the target region.

The present disclosure provides a display substrate, a manufacturing method thereof, and a display device. The method includes: forming a pixel definition layer transitional pattern on a base substrate, the pixel definition layer transitional pattern being provided at a lateral surface with an undercut; forming a common layer, which is broken at the undercut, on the base substrate; removing the undercut to obtain a pattern of a pixel definition layer; and forming a cathode on the base substrate.

The present disclosure provides an organic light-emitting display panel, a method for preparing the same and a display device. The method includes: providing a substrate, where the substrate includes a non-display area and a display area surrounding the non-display area; forming a barrier layer and a pixel circuit on the substrate, where an orthographic projection of the pixel circuit on the substrate and an orthographic projection of the non-display area on the substrate do not overlap; patterning the barrier layer in the non-display area to form at least one via hole penetrating the barrier layer; patterning the substrate by using the barrier layer as a mask in the non-display area to form a groove; forming a light emitting layer on the pixel circuit; and forming a thin film encapsulation layer covering the light emitting layer and the side wall of the draw-in structure on the light emitting layer.

A shadow mask used for OLED evaporation and a manufacturing method therefor, and an OLED panel manufacturing method. The shadow mask used for OLED evaporation includes: a semiconductor substrate including a front surface and a back surface opposite thereto, a recess penetrating the front surface and the back surface being provided in the semiconductor substrate; and a grid film layer provided on the front surface of the semiconductor substrate. A number of openings arranged in an array are provided in the grid film layer. Each of the openings has an upper portion and a lower portion. A width of the upper portion is greater than a width of the lower portion. The recess exposes the number of openings in the grid film layer and the grid film layer between adjacent openings.

A technique, comprising: forming in situ on a support substrate: a first metal layer; a light-absorbing layer after the first metal layer; a conductor pattern after the light-absorbing layer; and a semiconductor layer after the conductor pattern; patterning the semiconductor layer using a resist mask to form a semiconductor pattern defining one or more semiconductor channels of one or more semiconductor devices; and patterning the light-absorbing layer using the resist mask and the conductor pattern, so as to selectively retain the light-absorbing layer in regions that are occupied by at least one of the resist mask and the conductor pattern.