A device for providing electrons and its method of making. The device includes an optical fiber with a tip and a metallic arrangement arranged at the tip. The metallic arrangement is arranged to be excited by an energy source to emit electrons or electron beams.

A cathode assembly for emitting charged particles, used in for example an electron gun as source for generating an electron beam is provided. The cathode assembly has a cathode including an emitting member and a carrier. The emitting member is mounted in the carrier, and the carrier is electrically connected to a holder. The cathode is heated by irradiation from an external source, whereby the emitting member emits charged particles from an emitting surface at an emitting temperature. The connection between the carrier and the holder provides a thermal barrier for reducing the amount of thermal energy transferred from the cathode to the holder.

There is provided a control method for an electron microscope including a thermionic-emission gun of self-bias type using a fixed bias resistor, an accelerating voltage power supply supplying an accelerating voltage to the thermionic-emission gun, and an optical system for irradiating a specimen with an electron beam. The control method includes: obtaining a value of a load current which is a current passing through an accelerating voltage power supply; determining a filament height of the thermionic-emission gun based on the value of the load current; and setting a condition of the optical system based on the filament height.

There is provided a control method for an electron microscope including a thermionic-emission gun of self-bias type using a fixed bias resistor, an accelerating voltage power supply supplying an accelerating voltage to the thermionic-emission gun, and an optical system for irradiating a specimen with an electron beam. The control method includes: obtaining a value of a load current which is a current passing through an accelerating voltage power supply; determining a filament height of the thermionic-emission gun based on the value of the load current; and setting a condition of the optical system based on the filament height.

An object of the invention is to stably supply an electron beam from an electron gun, that is, to prevent variation in intensity of the electron beam. The invention provides a charged particle beam device that includes an electron gun having an electron source, an extraction electrode to which a voltage used for extracting electrons from the electron source is applied, and an acceleration electrode to which a voltage used for accelerating the electrons extracted from the electron source is applied, a first heating unit that heats the extraction electrode, and a second heating unit that heats the acceleration electrode.

An object of the invention is to stably supply an electron beam from an electron gun, that is, to prevent variation in intensity of the electron beam. The invention provides a charged particle beam device that includes an electron gun having an electron source, an extraction electrode to which a voltage used for extracting electrons from the electron source is applied, and an acceleration electrode to which a voltage used for accelerating the electrons extracted from the electron source is applied, a first heating unit that heats the extraction electrode, and a second heating unit that heats the acceleration electrode.

In order to provide a charged particle beam apparatus capable of stably detecting secondary particles and electromagnetic waves even for a non-conductive sample under high vacuum environment and enabling excellent observation and analysis, the charged particle beam apparatus includes a charged particle gun (12), scanning deflectors (17 and 18) configured to scan a charged particle beam (20) emitted from the charged particle gun (12) onto a sample (21), detectors (40 and 41) configured to detect a scanning control voltage input from an outside into the scanning deflectors, an arithmetic unit (42) configured to calculate, based on the detected scanning control voltage, irradiation pixel coordinates for the charged particle beam; and an irradiation controller (45) configured to control irradiation of the sample with the charged particle beam according to the irradiation pixel coordinates.

Presented systems and methods facilitate efficient and effective monitoring of particle beams. In some embodiments, a radiation gun system comprises: a particle beam gun that generates a particle beam, and a gun control component that controls the gun particle beam generation characteristics, including particle beam fidelity characteristics. The particle beam characteristics can be compatible with FLASH radiation therapy. Resolution control of the particle beam generation can enable dose delivery at an intra-pulse level and micro-bunch level. The micro-bunch can include individual bunches per each 3 GHz RF cycle within the 5 to 15 sec pulse-width. The FLASH radiation therapy dose delivery can have a bunch level resolution of approximately 4.410{circumflex over ()}6cGy/bunch.

Presented systems and methods facilitate efficient and effective monitoring of particle beams. In some embodiments, a radiation gun system comprises: a particle beam gun that generates a particle beam, and a gun control component that controls the gun particle beam generation characteristics, including particle beam fidelity characteristics. The particle beam characteristics can be compatible with FLASH radiation therapy. Resolution control of the particle beam generation can enable dose delivery at an intra-pulse level and micro-bunch level. The micro-bunch can include individual bunches per each 3 GHz RF cycle within the 5 to 15 sec pulse-width. The FLASH radiation therapy dose delivery can have a bunch level resolution of approximately 4.410{circumflex over ()}6cGy/bunch.

Presented systems and methods facilitate efficient and effective monitoring of particle beams. In some embodiments, a radiation gun system comprises: a particle beam gun that generates a particle beam, and a gun control component that controls the gun particle beam generation characteristics, including particle beam fidelity characteristics. The particle beam characteristics can be compatible with FLASH radiation therapy. Resolution control of the particle beam generation can enable dose delivery at an intra-pulse level and micro-bunch level. The micro-bunch can include individual bunches per each 3 GHz RF cycle within the 5 to 15 sec pulse-width. The FLASH radiation therapy dose delivery can have a bunch level resolution of approximately 4.410{circumflex over ()}6cGy/bunch.