Patent classifications
H01J37/228
Apparatus for transmission electron microscopy cathodoluminescence
Apparatuses for collection of upstream and downstream transmission electron microscopy (TEM) cathodoluminescence (CL) emitted from a sample exposed to an electron beam are described. A first fiber optic cable carries first CL light emitted from a first TEM sample surface, into a spectrograph. A second fiber optic cable carries second CL light emitted from a second TEM sample surface into the spectrograph. The first and second fiber optic cables are positioned such that the spectrograph produces a first light spectrum for the first fiber optic cable and a separate light spectrum for the second fiber optic cable. The described embodiments allow collection of TEM CL data in a manner that allows analyzing upstream and downstream TEM CL signals separately and simultaneously with an imaging spectrograph.
Sample holding device for studying light-driven reactions and sample analysis method using the same
A sample holding device for studying light-driven reactions and a sample analysis method using the same are disclosed. The sample holding device comprises a main body, a supporting structure and a light source assembly. The main body has a channel which has a first end and a second end opposite to the first end, and a focusing lens which is located on the second end. The supporting structure is located on one end of the main body for sample supporting. The light source assembly is detachably disposed on the other end opposite to the end which is disposed with the supporting structure. The light source assembly emits a light beam into the first end of the channel. The light beam then irradiates the sample which locates on the supporting structure after passing through the focusing lens.
ELECTRON BEAM DEVICE
An electron beam device obtains contrast reflecting an electronic state of a sample with high sensitivity. The device includes an electron optical system which emits an electron beam to a sample and detects electrons emitted from the sample; a light pulse emission system that emits a light pulse to the sample; a synchronization processing unit that samples the emitted electrons; an image signal processing unit which forms an image by a detection signal output based upon the emitted electrons detected by the electron optical system; and a device control unit for setting a control condition of the electron optical system. The device control unit sets a sampling frequency for detection sampling of the emitted electrons to be greater than a value obtained by dividing the number of emissions of the light pulse per unit pixel time by the unit pixel time.
X-RAY BEAM ALIGNMENT DEVICE AND METHOD
The present invention provides a bright, focused visible light source that is part of a visible light alignment assembly that is coupled to an X-ray generator. The visible light source projects a bright, focused visible light beam from the X-ray generator through a collimator and object or part to be radiographed and to a detector or film, just as a subsequent X-ray beam eventually is. This allows the operator to quickly and easily visually assess the eventual position and coverage or spread of the X-ray beam and align the X-ray generator, collimator, object or part to be radiographed, and/or detector or film, with a minimum of test radiographs.
Charged particle beam device with interferometer for height measurement
A method of operating a charged particle beam device is disclosed, including focusing a charged particle beam onto a sample with an objective lens assembly; passing a reflected light beam through a bore of the objective lens assembly to an interferometer; and interferometrically determining a z-position of the sample with the interferometer. A charged particle beam device is disclosed, including a charged particle beam generator which has a charged particle source. A charged particle path for the charged particle beam extends through a bore of an objective lens assembly toward a sample stage. An interferometer is arranged to receive a reflected light beam which passes through the bore of the objective lens assembly.
Method for inspecting a sample using an assembly comprising a scanning electron microscope and a light microscope
The invention relates to a method for inspecting a sample with an assembly comprising a scanning electron microscope (SEM) and a light microscope (LM). The assembly comprises a sample holder for holding the sample. The sample holder is arranged for inspecting the sample with both the SEM and the LM, preferably at the same time. The method comprising the steps of: capturing a LM image of the sample in its position for imaging with the SEM; determining a position and dimensions of a region of interest in or on the sample using the LM image; determining values to which the SEM parameters need to be set to image the sample at a desired resolution; and capturing a SEM image of the region of interest, preferably using the first electron beam exposure of said region of interest.
METHOD AND DEVICE FOR TIME-RESOLVED PUMP-PROBE ELECTRON MICROSCOPY
A method of time-resolved pump-probe electron microscopy, comprises the steps of irradiating a sample (1) with a photonic pump pulse (2) being directed on a pump pulse path (3) from a photonic source to the sample (1), irradiating the sample (1) with an electron probe pulse (4) being directed on an electron pulse path (5) from an electron pulse source (10) to the sample (1), wherein the photonic pump pulse (2) and the electron probe pulse (4) arrive at the sample (1) with a predetermined temporal relationship relative to each other, and detecting a sample response to the electron probe pulse (4) irradiation with a detector device (20), wherein the photonic source comprises a photonic lattice structure (30) being arranged adjacent to the electron pulse path (5), and the photonic pump pulse (2) is created by an interaction of the electron probe pulse (4) with the photonic lattice structure (30). Furthermore, an electron microscopy apparatus, configured for time-resolved pump-probe electron microscopy, and a sample supply device (200) for an electron microscopy apparatus (100) are described.
OPTICAL VACUUM CRYO-STAGE FOR CORRELATIVE LIGHT AND ELECTRON MICROSCOPY
An optical vacuum cooling cryostage for correlative light and electron microscopy comprises a vacuum chamber, an anti-contamination system adapter interface, an electron microscope specimen holder adapter interface, an upper optical window, a lower optical window, a vacuum pumping system adapter interface and a vacuum valve, wherein the anti-contamination system adapter interface is arranged in one end of the vacuum chamber, the electron microscope specimen holder adapter interface is arranged in the other end of the vacuum chamber, the upper optical window is arranged on the upper wall of the vacuum chamber, the lower optical window is arranged on the lower wall of the vacuum chamber and opposite to the upper optical window.
COST EFFECTIVE PROBING IN HIGH VOLUME MANUFACTURE OF MICRO LEDS
A wafer having μLEDs is inspected using cathodoluminescence microscopes. A fast scan is enabled by splitting the CL beam into several beams and sensing the beams with point detectors. Optical filters are inserted in the optical path upstream of the detectors, such that each detector senses a different frequency band. The signals are ratioed and the ratios are compared to expected reference. Regions of extreme value are identified and, if desired, a high resolution scan is performed on the regions or a sample of the regions. Viability score is calculated for each identified region.
System and method for alignment of cathodoluminescence optics
Systems and methods for automated alignment of cathodoluminescence (CL) optics in an electron microscope relative to a sample under inspection are described. Accurate placement of the sample and the electron beam landing position on the sample with respect to the focal point of a collection mirror that reflects CL light emitted by the sample is critical to optimizing the amount of light collected and to preserving information about the angle at which light is emitted from the sample. Systems and methods are described for alignment of the CL mirror in the XY plane, which is orthogonal to the axis of the electron beam, and for alignment of the sample with respect to the focal point of the CL mirror along the Z axis, which is coincident with the electron beam.