Described herein are plasma generation devices and methods of use of the devices. The devices can be used for the cleaning of various surfaces and/or for inhibiting or preventing the accumulation of particulates, such as dust, or moisture on various surfaces. The devices can be used to remove dust and other particulate contaminants from solar panels and windows, or to avoid or minimize condensation on various surfaces. In an embodiment a plasma generation device is provided. The plasma generation device can comprise: a pair of electrodes positioned in association with a surface of a dielectric substrate. The pair of electrodes can comprise a first electrode and a second electrode. The first electrode and second electrode can be of different sizes, one of the electrodes being smaller than the other of the electrodes. The first electrode and second electrode can be separated by a distance and electrically connected to a voltage source.

The invention relates to the improvement of synthesis by chemical vapour deposition, particularly diamond synthesis. It is proposed to reduce the time required for the deposition of diamond layers by compressing the plasma near the deposition substrate in order to increase the chances of collision between active species.

A plasma power supply device includes an AC power supply configured to generate an AC voltage of a predetermined frequency for application to a pair of electrodes by way of a power supply harness which is replaceable partially or wholly to change a wiring length and which is flexible, and a control section configured to set the predetermined frequency of the AC power supply so that the frequency becomes lower as the power supply harness becomes longer.

A gas passing groove, a high-voltage electrode groove, and a ground electrode groove provided to an electrode unit base are each helical in plan view. An electrode unit lid is placed on a front surface of the electrode unit base so that a high-voltage conduction hole and a high-voltage conduction point coincide with each other in plan view. An electrode cooling plate is placed on a front surface of the electrode unit lid so that a high-voltage opening includes the high-voltage conduction hole as a whole in plan view. The electrode unit lid and the electrode cooling plate are placed on the front surface of the electrode unit base so that a ground conduction groove, a ground conduction hole, and a ground conduction point coincide with one another in plan view.

A power converter is capable to convert an electrical input power into a bipolar output power and to deliver the bipolar output power to at least two independent plasma processing chambers. The power converter includes: a power input port for connection to an electrical power delivering grid, at least two power output ports each for connection to one of the plasma processing chambers, and a controller configured to control delivering the bipolar output power to the power output ports, using at least one control parameter. The controller is configured to obtain a full set of desired values for the control parameter for the power output ports, calculate whether the power converter is capable of delivering every desired value to every output port, and if so, calculate a sequence of pulses of power delivery to the output ports to supply the power to plasma processes in the plasma processing chambers.

An IMS ionizer comprising a wire, a second conductor, and a dielectric, when the first conductor and second conductor are energized to an ionization voltage, discharge ionization occurs. The dielectric is a glass element formed in a tubular shape defining an inner wall. The wire is formed in coils in contact with said inner wall. The second conductor is positioned to define an outer wall of the tube. The tube has an inlet end for receiving the sample, and an outlet end through which the sample exits after ionization.

A plasma processing apparatus is provided. The apparatus includes a lower sheltering module. The apparatus further includes an upper sheltering module arranged adjacent to the lower sheltering module. The apparatus includes an upper plate and an upper PEZ ring positioned around the upper plate. The apparatus also includes a shadowing unit that includes a number of engaging parts in the form of arcs detachably positioned on the upper PEZ ring. In addition, the apparatus includes a plasma generation module for generating plasma in the peripheral region of the lower sheltering module and the upper sheltering module.

A movable structure includes a processing chamber configured to perform processing under a vacuum environment; a fixed portion disposed in the processing chamber; a movable portion that is movable with respect to the fixed portion; a transmission/reception module provided at the fixed portion and having a hermetically sealed structure; and a sensor module provided at the movable portion and having a hermetically sealed structure. The transmission/reception module and the sensor module perform transmission and reception of signals in a non-contact manner.

The present disclosure relates to a system and method for continuously supplying negative ions using multi-pulsed plasma sources. The system includes a plurality of plasma generators each to generate plasma by applying pulsed power to the electronegative gas from a gas source; a negative ion supply unit connected to the plasma generators to receive the plasmas transferred therefrom and to continuously supply ions; and a controller connected to the plurality of plasma generators and configured to control characteristics of the pulsed powers delivered to the respective plasma generators and to adjust phase shift associated with the pulsed power envelopes. By adjusting the phase shift, the controller enables a plasma in one of the plasma generators to be in an after-glow state when a plasma in another plasma generator is in an active-glow state.

A plasma power supply device includes an AC power supply configured to generate an AC voltage of a predetermined frequency for application to a pair of electrodes by way of a power supply harness which is replaceable partially or wholly to change a wiring length and which is flexible, and a control section configured to set the predetermined frequency of the AC power supply so that the frequency becomes lower as the power supply harness becomes longer.