An arc coating system includes a coating chamber having a peripheral chamber wall, a top wall, and a bottom wall. The peripheral chamber wall, the top wall, and the bottom wall define a coating cavity and a chamber center. A plasma source is positioned at the chamber center wherein the plasma source comprises a central cathode rod and a plurality of cathode rods surrounding the central cathode rod. The coating system also includes a sample holder that holds a plurality of substrates to be coated. Characteristically, the sample holder rotatable about the chamber center at a first distance from the chamber center.

A coating system includes a coating chamber having a peripheral chamber wall, a top wall, and a bottom wall. The peripheral chamber wall defines a chamber center. A plasma source is positioned at the chamber center. The coating system also includes a sample holder that holds a plurality of substrates to be coated which is rotatable about the chamber center at a first distance from the chamber center. A first isolation shield is positioned about the chamber center at a second distance from the chamber center, the first isolation shield being negatively charged.

A macroparticle filter device for cathodic arc evaporation, to be placed between at least one arc evaporation source and at least one substrate exhibiting at least a surface to be coated with material evaporated from a cathode of the arc evaporation source in a vacuum coating chamber. The macroparticle filter device includes one or more filter components that can prevent macroparticles emitted by the cathode during cathodic arc evaporation to arrive the substrate surface to be coated. The at least one component is provided as one or more flexible sheets that block the lineal way of the macroparticles from the cathode to the substrate surface to be coated. Further a method for utilizing the macroparticle filter device is presented.

An ion source with an insertable target holder for holding a solid dopant material is disclosed. The insertable target holder includes a pocket or cavity into which the solid dopant material is disposed. When the solid dopant material melts, it remains contained within the pocket, thus not damaging or degrading the arc chamber. Additionally, the target holder can be moved from one or more positions where the pocket is at least partially in the arc chamber to one or more positions where the pocket is entirely outside the arc chamber. In certain embodiments, a sleeve may be used to cover at least a portion of the open top of the pocket.

A method for depositing a coating of a source material onto a panel is disclosed. The method includes providing a cathodic arc, the cathodic arc including a target surface, the target surface disposed along a target deposition axis and able to emit the source material as a generally cloud of source material vapor and a generally conical stream of liquid particles of the source material. The method further includes positioning the panel relative to the target surface based on a deposition angle, the deposition angle being between the target surface and an outer limit of the generally conical stream of liquid particles o the source material. The method may further include emitting the source material from the target surface as the generally conical cloud of source material vapor and coating the edge with the cloud of source material vapor to provide an edge coating.

A coating method includes vaporizing a portion of a cathode to form a metallic plasma, and directing the metallic plasma toward the workpiece. A first magnetic field generator, disposed in a first electrically conductive portion of a first stinger cup, is operated to steer the electrical arc about at least one evaporative surface of the cathode. a second portion of the electrically conductive stinger cup is selectively contacted with the cathode, and the first portion of the first stinger cup is spaced from the second portion from by a thermally insulating layer therebetween. The thermally insulating layer is disposed directly between the first magnetic field generator and the cathode when the first stinger cup is in contact with the cathode.

In order to improve the etching depth and/or the etching homogeneity at a substrate, a plasma source with one or more single electrodes or one or more magnets is proposed. The magnet generates a magnetic field in the vicinity of the electrodes, which may be rear-side or front-side.

A deposition apparatus, which forms a film on a substrate, includes a rotation unit configured to rotate a target about a rotating axis; a striker configured to generate an arc discharge; a driving unit configured to drive the striker so as to make a close state which the striker closes to a side surface around the rotating axis of the target to generate the arc discharge; and a control unit configured to control rotation of the target by the rotation unit so as to change a facing position on the side surface of the target facing the striker in the close state.

A filter (104a, 104b, 108) for a cathode arc source comprises: a filter duct having at least one bend (104a, 104b), and a first magnetic field source for steering plasma through the filter duct for removal of macroparticles from the plasma; wherein the apparatus comprises a second magnetic field source (108) which is rotatably mounted surrounding a portion of the filter duct. Cathode arc sources (102) and cathode arc deposition apparatuses (106) comprise the filters described herein, and methods of filtering macroparticles from a beam of plasma emitted from a cathode arc source use the filters.

An end-block for use in a deposition apparatus, for connecting a cylindrical consumable target with magnetic bar, to an outside of the deposition apparatus, comprising at least drive means to provide a relative movement between consumable target and magnetic bar, the drive means comprising a driven shaft. The drive means comprising a consumable target motor and a consumable target drive shaft and/or a magnetic bar motor and a magnet bar drive shaft. The end-block housing including the end-block being substantially axially symmetric and coaxial with the driven shaft. Due to the axle symmetry, the end-block is universally mountable.