Provided is a plasma generation apparatus including: a housing in which a window is defined at one side in a first direction; a stick type plasma source provided in the housing to generate plasma toward the window; and a driving unit coupled to the plasma source to allow one end of the plasma source to perform a reciprocating movement in a second direction that is a longitudinal direction of the window.

Provided is a plasma generation apparatus including: a housing in which a window is defined at one side in a first direction; a stick type plasma source provided in the housing to generate plasma toward the window; and a driving unit coupled to the plasma source to allow one end of the plasma source to perform a reciprocating movement in a second direction that is a longitudinal direction of the window.

A apparatus for vacuum sputter deposition is described. The apparatus includes, a vacuum chamber; three or more sputter cathodes within the vacuum chamber for sputtering material on a substrate; a gas distribution system for providing a processing gas including H.sub.2 to the vacuum chamber; a vacuum system for providing a vacuum inside the vacuum chamber; and a safety arrangement for reducing the risk of an oxy-hydrogen explosion, wherein the safety arrangement comprises a dilution gas feeding unit connected to the vacuum system for dilution of the H.sub.2-content of the processing gas.