The broadband light source includes a gas containment structure and a pump laser for generating a pump beam including illumination of a wavelength near that of a weak absorption line of a neutral gas contained in the gas containment structure. The broadband light source also includes anamorphic optics for focusing the pump beam into an elliptical beam waist positioned in or near the center of the gas containment structure. The broadband light source also includes collection optics for collecting broadband radiation emitted by the plasma in a direction aligned with a longer axis of the elliptical beam waist.

The broadband light source includes a gas containment structure and a pump laser for generating a pump beam including illumination of a wavelength near that of a weak absorption line of a neutral gas contained in the gas containment structure. The broadband light source also includes anamorphic optics for focusing the pump beam into an elliptical beam waist positioned in or near the center of the gas containment structure. The broadband light source also includes collection optics for collecting broadband radiation emitted by the plasma in a direction aligned with a longer axis of the elliptical beam waist.

There is provide a discharge lamp lighting apparatus that comprises a discharge lamp and a power supply device configured to drive a regular lighting mode and the low electric power lighting mode in a switchable manner. The power supply device configured to control a power supply to the discharge lamp such that, in the low electric power lighting mode, after a secondary protrusion forming process in which an alternating current having a frequency equal to or greater than the basic frequency in the regular lighting mode is supplied, the low electric power lighting mode transitioning to a secondary protrusion maintaining process in which a high frequency alternating current having a frequency higher than the basic frequency in the regular lighting mode, and a low frequency alternating current having a frequency lower than the frequency of the high frequency alternating current is alternately supplied.

Energy-saving lamps contain a gas filling of mercury vapor and argon in a gas discharge bulb. Amalgam balls are used for filling the gas discharge bulb with mercury. Novel coated balls whose operating life in the case of automatic metered introduction is increased by coating of the balls with an alloy powder and conglutination of the amalgam balls during storage and processing is prevented are proposed.

Energy-saving lamps contain a gas filling of mercury vapor and argon in a gas discharge bulb. Amalgam balls are used for filling the gas discharge bulb with mercury. Novel coated balls whose operating life in the case of automatic metered introduction is increased by coating of the balls with an alloy powder and conglutination of the amalgam balls during storage and processing is prevented are proposed.

Coating systems suitable for use in generating fluorescent visible light, and lamps provided with such coating systems. The coating systems includes a phosphor-containing coating that contains at least a first phosphor that is predominantly excited by ultraviolet radiation of a first wavelength to emit visible light and absorbs but is less efficiently excited by ultraviolet radiation of a second wavelength. The coating system further includes a second phosphor that absorbs the ultraviolet radiation of the second wavelength and little if any of the ultraviolet radiation of the first wavelength.

Coating systems suitable for use in generating fluorescent visible light, and lamps provided with such coating systems. The coating systems includes a phosphor-containing coating that contains at least a first phosphor that is predominantly excited by ultraviolet radiation of a first wavelength to emit visible light and absorbs but is less efficiently excited by ultraviolet radiation of a second wavelength. The coating system further includes a second phosphor that absorbs the ultraviolet radiation of the second wavelength and little if any of the ultraviolet radiation of the first wavelength.

A method for lighting a high-pressure discharge lamp that is configured to change a power to be supplied to the high-pressure discharge lamp in accordance with a luminance parameter of an image content is disclosed. In the method, halogen is encapsulated in an internal space of an arc tube part of the high-pressure discharge lamp with an excessive volume with respect to a capacity of the internal space such that a halogen cycle is established when part of mercury deposits without vaporizing, and the internal space is configured to be kept at a higher temperature than a blackening temperature that is lower than a deposition temperature of the mercury and causes remarkable blackening on an inner wall of the arc tube part.

A system, method, and computer program product for optimizing the cooling of a UV bulb during a UV irradiation process is described. A power level in which to operate the UV bulb is received. In addition, a particular type of UV bulb being used in the UV irradiation process is received. Thereafter, at least one optimal UV cooling parameter that corresponds to the power level and the type of UV bulb is retrieved from a UV source parameters database. At least one control signal is then sent to a cooling device that is based on the retrieved optimal UV cooling parameter, and the control signal instructs the cooling device to cool the particular type of UV bulb according to the retrieved optimal UV cooling parameter during the UV irradiation process.

The present disclosure relates to photo-emitting plasma for gas activation in processing chambers, and related apparatus and methods. In one or more embodiments, a processing chamber applicable for semiconductor manufacturing includes one or more sidewalls, a window at least partially defining an internal volume, and a substrate support disposed in the internal volume. The processing chamber includes one or more heat sources operable to heat the internal volume, and a plate disposed in the internal volume and between the window and the substrate support. The plate at least partially separates the internal volume into a first volume between the plate and the substrate support, and a second volume between the plate and the window. The processing chamber includes an energy source operable to supply a plasma between the plate and the window.