Apparatus, systems, and methods for processing workpieces are provided. An arc lamp can include a tube. The arc lamp can include one or more inlets configured to receive water to be circulated through the arc lamp during operation as a water wall, the water wall configured to cool the arc lamp. The arc lamp can include a plurality of electrodes configured to generate a plasma in a forming gas introduced into the arc lamp via the one or more inlets. The forming gas can be or can include a mixture of a hydrogen gas and an inert gas, the hydrogen gas in the mixture having a concentration less than 4% by volume. The hydrogen gas can be introduced into the arc lamp prior to generating the plasma. The arc lamp may be used for processing workpieces.

At least one of the electrodes of a discharge lamp, including at an interior of a main body of the electrode: a heat-transmitting substance of the melting point lower than that of a material which makes up the main body; and a regulating body that is made up of a material of the melting point higher than that of the heat-transmitting substance, that includes a blade which extends in the axial direction and in a radial direction perpendicular to the axial direction, and that regulates convection of the heat-transmitting substance. Surface roughness Rz of at least one of a region which is on an inner wall face of the main body and with which the regulating body makes contact and a region which is on a surface of the regulating body and with which the inner wall face makes contact is not greater than 1.52 μm.

In one embodiment, a device for generating broad spectrum ultraviolet radiation is provided. The device includes an adjustable spark gap of metallic solids, the spark gap including: a first electrode coupled to a first heatsink, and a second electrode coupled to a second heatsink, the second electrode spaced apart and opposite from the first electrode. The device includes a variable capacitor configured to discharge a voltage through the spark gap to generate broad spectrum ultraviolet radiation. The device includes a voltage source. The device includes a controller configured to control the variable capacitor. The first electrode is formed from a first metallic solid and the second electrode is formed from a second metallic solid, and the ultraviolet radiation generated is in the 140 nm to 400 nm range.

A short-arc discharge lamp includes a pair of electrodes disposed facing each other inside a light-emitting tube, a scale-like structure being formed on an outer surface of at least one electrode of the pair of electrodes, and a coating film covering the outer surface on which the scale-like structure is formed. The scale-like structure includes a plurality of flaky protrusions protruding from the outer surface in a direction inclined with respect to a normal direction of the outer surface, each flaky protrusion having a front surface whose angle formed with the outer surface is an obtuse angle and a back surface whose angle formed with the outer surface is an acute angle. The coating film contains at least one of metal oxides, metal carbides, metal borides, metal silicides, and metal nitrides. A part of the coating film enters a space sandwiched between the back surface and the outer surface.

Systems and methods for reducing contamination of one or more arc lamps are provided. One example implementation is directed to a millisecond anneal system. The millisecond anneal system includes a processing chamber for thermally treating a substrate using a millisecond anneal process. The system further includes one or more arc lamps. Each of the one or more arc lamps is coupled to a water loop for circulating water through the arc lamp during operation of the arc lamp. The system includes a reagent injection source configured to introduce a reagent, such as nitrogen gas, into water circulating through the arc lamp during operation of the arc lamp.

Systems and methods for reducing contamination of one or more arc lamps are provided. One example implementation is directed to a millisecond anneal system. The millisecond anneal system includes a processing chamber for thermally treating a substrate using a millisecond anneal process. The system further includes one or more arc lamps. Each of the one or more arc lamps is coupled to a water loop for circulating water through the arc lamp during operation of the arc lamp. The system includes a reagent injection source configured to introduce a reagent, such as nitrogen gas, into water circulating through the arc lamp during operation of the arc lamp.

A gaseous-phase ionizing radiation generator for the voltage controlled production, flux, and use of one or more forms of ionizing electromagnetic and/or particulate radiation including: embodiments to collect and convert the particulate radiation that is generated by the radiation generator into electricity; embodiments that generate electricity from the ionized gas within the radiation generator by means of an auxiliary electrode structure composed of interdigitated individual electrodes of alternating work function; and a method or procedure for the fabrication and the activation of at least one working electrode composed in part of a metal hydride host material that is not formally considered to be radioactive.

A high-temperature component of a refractory metal or a refractory metal alloy has an emissivity-increasing coating. The coating is formed of tantalum nitride and/or zirconium nitride; and tungsten with a tungsten content between 0 and 98 wt. %.

A gaseous-phase ionizing; radiation generator for the voltage controlled production, flux, and use of one or more forms of ionizing electrornagnetic and/or particulate radiation including: embodiments to collect and convert the particulate radiation that is generated by the radiation generator into electricity; embodiments that generate electricity from the ionized gas within the radiation generator by means of an auxiliary electrode structure composed of interdigitated individual electrodes of alternating work function; and a method or procedure for the fabrication and the activation of at least one working electrode composed in part of a metal hydride host material that is not formally considered to be radioactive.

Apparatus, systems, and methods for processing workpieces are provided. An arc lamp can include a tube. The arc lamp can include one or more inlets configured to receive water to be circulated through the arc lamp during operation as a water wall, the water wall configured to cool the arc lamp. The arc lamp can include a plurality of electrodes configured to generate a plasma in a forming gas introduced into the arc lamp via the one or more inlets. The forming gas can be or can include a mixture of a hydrogen gas and an inert gas, the hydrogen gas in the mixture having a concentration less than 4% by volume. The hydrogen gas can be introduced into the arc lamp prior to generating the plasma. The arc lamp may be used for processing workpieces.