The present invention relates to a charged particle system comprising: a charged particle source; a first multi aperture plate; a second multi aperture plate disposed downstream of the first multi aperture plate, the second multi aperture plate; a controller configured to selectively apply at least first and second voltage differences between the first and second multi aperture plates; wherein the charged particle source and the first and second multi aperture plates are arranged such that each of a plurality of charged particle beamlets traverses an aperture pair, said aperture pair comprising one aperture of the first multi aperture plate and one aperture of the second multi aperture plate, wherein plural aperture pairs are arranged such that a center of the aperture of the first multi aperture plate is, when seen in a direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced relative to a center of the aperture of the second multi aperture plate. The invention further pertains to a particle-optical component configured to change a divergence of a set of charged particle beamlets and a charged particle inspection method comprising inspection of an object using different numbers of charged particle beamlets.

A method of inspecting a sample with a charged particle beam device is described. The method comprises arranging the sample on a stage, determining a first focusing strength of an objective lens adapted to focus a charged particle beam on a first surface region of the sample that is arranged at a first distance from the objective lens in a direction of an optical axis, calculating a difference between the first distance and a predetermined working distance based on the determined first focusing strength, adjusting a distance between the first surface region and the objective lens by the calculated difference, and inspecting the first surface region. According to a further aspect, a charged particle beam device configured to be operated according to the above method is described.

A method of inspecting a sample with a charged particle beam device is described. The method comprises arranging the sample on a stage, determining a first focusing strength of an objective lens adapted to focus a charged particle beam on a first surface region of the sample that is arranged at a first distance from the objective lens in a direction of an optical axis, calculating a difference between the first distance and a predetermined working distance based on the determined first focusing strength, adjusting a distance between the first surface region and the objective lens by the calculated difference, and inspecting the first surface region. According to a further aspect, a charged particle beam device configured to be operated according to the above method is described.

According to one aspect of the present invention, a charged particle beam irradiation apparatus includes: a plurality of electrodes arranged in a magnetic field space of an electromagnetic lens and also arranged so as to surround a space on an outer side of a passing region of a charged particle beam; and a potential control circuit configured to control potentials of the plurality of electrodes so as to generate plasma in the space surrounded by the plurality of electrodes and so as to control movement of positive ions or electrons and negative ions generated by the plasma, wherein positive ions, electrons and negative ions, or active species are emitted from the space of the plasma.

There is provided an objective lens capable of reducing the effects of magnetic fields on a sample. The objective lens includes a first lens and a second lens. The lenses are arranged so that the component of the magnetic field of the first lens lying along the optical axis and the component of the magnetic field of the second lens lying along the optical axis cancel out each other at a sample placement surface. The first and second lenses each include an inner polepiece and an outer polepiece. The inner polepieces have front end portions, respectively. The outer polepieces have front end portions, respectively, which jut out toward the optical axis. The distances of the front end portions of the outer polepieces, respectively, from the sample placement surface are less than the distances of the front end portions of the inner polepieces, respectively, from the sample placement surface.

A charged particle beam writing method includes forming an aperture image by making a charged particle beam pass through an aperture substrate, changing, in the state where a plurality of crossover positions of the charged particle beam and positions of all of one or more intermediate images of the aperture image are adjusted to matching positions with respect to the aperture image with the first magnification, magnification of the aperture image from the first magnification to the second magnification by using a plurality of lenses while maintaining the last crossover position of the charged particle beam and the position of the last intermediate image of the aperture image to be fixed, and forming, using an objective lens, the aperture image whose magnification has been changed to the second magnification on the surface of the target object, and writing the aperture image.

A charged particle beam irradiation apparatus according to an embodiment includes: a first scanning electromagnet device configured to deflect a charged particle beam to a second direction that is substantially perpendicular to a first direction along which the charged particle beam enters, the first scanning electromagnet device having an aperture on an outlet side larger than that on an inlet side; and a second scanning electromagnet device configured to deflect the charged particle beam to a third direction that is substantially perpendicular to the first direction and the second direction, the second scanning electromagnet device having an aperture on an outlet side larger than that on an inlet side, the first scanning electromagnet device and the second scanning electromagnet device being disposed to be parallel with the first direction.

In a charged particle beam device including an objective lens that focuses a charged particle beam; a first deflector that deflects the charged particle beam to emit the charged particle beam to a sample from a direction different from an ideal optical axis of the objective lens; and a second deflector that deflects a charged particle emitted from the sample, a charged particle focusing lens to focus the charged particle emitted from the sample is disposed between the sample and the second deflector and strengths of the objective lens and the charged particle focusing lens are controlled, according to deflection conditions of the first deflector.

There is provided an objective lens capable of reducing the effects of magnetic fields on a sample. The objective lens permits observation of the sample at high resolution. The objective lens (100) includes a first electromagnetic lens (10) and a second electromagnetic lens (20). The first and second lenses (10, 20) produce their respective magnetic fields including components lying along an optical axis (L), and are so arranged that the component of the magnetic field of the first lens (10) lying along the optical axis (L) and the component of the magnetic field of the second lens (20) lying along the optical axis (L) cancel out each other at a sample placement surface (2). The first lens (10) includes an inner polepiece (15) and an outer polepiece (16). Similarly, the second lens (20) includes an inner polepiece (25) and an outer polepiece (26). The inner polepieces (15, 25) have front end portions (15a, 25a), respectively. The outer polepieces (16, 26) have front end portions (16a, 26a), respectively, which jut out toward the optical axis (L). The distances (D2, D4) of the front end portions (16a, 26a) of the outer polepieces (16, 26), respectively, from the sample placement surface (2) are less than the distances (D1, D3) of the front end portions (15a, 25a) of the inner polepieces (15, 25), respectively, from the sample placement surface (2).

A combined scanning and focusing magnet for an ion implantation system is provided. The combined scanning and focusing magnet has a yoke having a high magnetic permeability. The yoke defines a hole configured to pass an ion beam therethrough. One or more scanner coils operably are coupled to the yoke and configured to generate a time-varying predominantly dipole magnetic field when electrically coupled to a power supply. One or more focusing coils are operably coupled to the yoke and configured to generate a predominantly multipole magnetic field, wherein the predominantly multipole magnetic field is one of static or time-varying.