Methods for removing a passivation film from a copper surface can include exposing the passivation film to a vapor phase organic reactant, for example at a temperature of 100 C. to 400 C. In some embodiments, the passivation film may have been formed by exposure of the copper surface to benzotriazole, such as can occur during a chemical mechanical planarization process. The methods can be performed as part of a process for integrated circuit fabrication. A second material can be selectively deposited on the cleaned copper surface relative to another surface of the substrate.

A memory circuit includes a memory cell, a first program driver, a second program driver, and a sensing amplifier. A method for operating the memory circuit includes, during a program operation of the memory cell, providing a program voltage to the memory cell, enabling the first program driver to drive the first local bit line to be at a low voltage, enabling the second program driver, disabling the first program driver, and enabling the sensing amplifier to verify whether the first memory cell has been programmed or not. The second program driver has a weaker driving ability than the first program driver.

A memory device and a manufacturing method thereof are provided. The memory device includes a first gate structure, a second gate structure, an oxide layer and a nitride layer. The first gate structure and the second gate structure are disposed on a substrate. The oxide layer covers the first gate structure. The nitride layer is disposed on the substrate and covers the oxide and the second gate structure. The refraction index of a portion of the nitride layer adjacent to an interface between the nitride layer and each of the first gate structure and the second gate structure is about 5% to 10% less than the refraction index of the remaining portion of the nitride layer.

A sensing amplification circuit includes a sensing amplifier and a trigger control circuit. The sensing amplifier receives a data voltage and a reference voltage, and outputs a first data signal and a second data signal by comparing the data voltage and the reference voltage. The trigger control circuit includes a logic circuit and a set-reset latch. The logic circuit receives the first data signal and the second data signal, and changes a first control signal from a first voltage level to a second voltage level when one of the first data signal and the second data signal changes its state. The first set-reset latch receives the first control signal and a second control signal, and generates a trigger signal to enable the sensing amplifier when the second control signal changes state and disable the sensing amplifier when the first control signal changes state.

A method of rounding corners of a fin includes providing a substrate with a fin protruding from the substrate, wherein a pad oxide and a pad nitride entirely cover a top surface of the fin. Later, part of the pad oxide is removed laterally to expose part of the top surface of the fin. A silicon oxide layer is formed to contact two sidewalls of the fin and the exposed top surface, wherein two sidewalls and the top surface define two corners of the fin. After forming the silicon oxide layer, an annealing process is performed to round two corners of the fin. Finally, after the annealing process, an STI filling material is formed to cover the pad nitride, the pad oxide and the fin.

A process for fabricating an integrated circuit is provided. The process includes providing a substrate, forming a hard mask upon the substrate by one of atomic-layer deposition and molecular-layer deposition, and exposing the hard mask to a charged particle from one or more charged particle beams to pattern a gap in the hard mask. In the alternative, the process includes exposing the hard mask to a charged particle from one or more charged-particle beams to pattern a structure on the hard mask.

An electrical isolation device including a support with thickness E including two faces facing one another, referred to, respectively, as the two faces having a length L, a width l; on each face of the support, a plurality of voltage dividers is positioned extending over the length, each voltage divider including electrical components that are connected in series and arranged according to a first and a second stage, each first stage including a row of even components and a row of odd components, the rows being parallel, and adjacent, and the second stage corresponding to a linear arrangement of components.

A semiconductor structure includes a plurality of semiconductor fins on an upper surface of a semiconductor substrate. The semiconductor fins spaced apart from one another by a respective trench to define a fin pitch. A multi-layer electrical isolation region is contained in each trench. The multi-layer electrical isolation region includes an oxide layer and a protective layer. The oxide layer includes a first material on an upper surface of the semiconductor substrate. The protective layer includes a second material on an upper surface of the oxide layer. The second material is different than the first material. The first material has a first etch resistance and the second material has a second etch resistance that is greater than the first etch resistance.

A method of rounding corners of a fin includes providing a substrate with a fin protruding from the substrate, wherein a pad oxide and a pad nitride entirely cover a top surface of the fin. Later, part of the pad oxide is removed laterally to expose part of the top surface of the fin. A silicon oxide layer is formed to contact two sidewalls of the fin and the exposed top surface, wherein two sidewalls and the top surface define two corners of the fin. After forming the silicon oxide layer, an annealing process is performed to round two corners of the fin. Finally, after the annealing process, an STI filling material is formed to cover the pad nitride, the pad oxide and the fin.

A semiconductor structure includes a plurality of semiconductor fins on an upper surface of a semiconductor substrate. The semiconductor fins spaced apart from one another by a respective trench to define a fin pitch. A multi-layer electrical isolation region is contained in each trench. The multi-layer electrical isolation region includes an oxide layer and a protective layer. The oxide layer includes a first material on an upper surface of the semiconductor substrate. The protective layer includes a second material on an upper surface of the oxide layer. The second material is different than the first material. The first material has a first etch resistance and the second material has a second etch resistance that is greater than the first etch resistance.