Techniques for providing a unified underfill and encapsulation for integrated circuit die assemblies. These techniques include a molding technique that includes dipping a die assembly including a substrate and one or more dies into a chamber having molding material, sealing the chamber, and lowering pressure in the chamber to coax the molding material into space between the die(s) and substrate. The use of this molding technique, as contrasted with a capillary underfill technique in which underfill material is laid down adjacent dies and fills space under the die via capillary action, provides several benefits. One benefit is that the molding material can include a higher silica particle filler content (% by weight) than the material for the capillary underfill technique, which improves CTE. Another benefit is that various design constraints related to, for example, warpage and partial underfill are eliminated or improved.

An electronic device is formed by dispensing an underfill material around a perimeter of an integrated circuit (IC) chip bonded to a supporting substrate. A void in present in the underfill material that is present between the IC chip and the supporting substrate. An opening is present through at least one of the IC chip and the supporting substrate into communication with the void. A vacuum may be applied to the void through the opening that is present through the IC chip to reduce a size of the void to a first volume. The opening that is present through the IC chip is sealed with a sealing plate. The underfill material is cured after the sealing of the opening to reduce of the void to at least a second volume that is less than the first volume.

A door for closing a chamber opening (4) in a chamber wall of a vacuum chamber (3) in relation to a surrounding space, in which the vacuum chamber is located, includes a door housing arranged in a surrounding space, a closing member (5) arranged in the surrounding space, and a rod (10), to which the closing member (5) is connected, wherein a first movement of the rod (10), through which the closing member (5) is displaced from an open position into an intermediate position, occurring in the form of a displacement of the rod (10) in the direction of the longitudinal axis thereof, wherein a second movement of the rod (10) subsequent thereto occurs in the form of a displacement of the rod (10) in a direction at an angle to the longitudinal axis thereof and/or in the form of a pivoting of the rod (10) about a pivot axis which is perpendicular to the longitudinal axis thereof, wherein the closing member is displaced from the intermediate position into a closed position via said second movement of the rod. The rod (10) is mounted in a moveable manner via the bearing elements, via the first movement thereof and via the second movement thereof in relation to the door housing, wherein the bearing elements are arranged in an inner space (30) of the door housing, which inner space is sealed with respect to the surrounding space or is connected to the surrounding space via a passage (41) extending through a housing wall (40) of the door housing, in which passage a particle filter is arranged. The rod (10) is guided out of the inner space (30) of the door housing into the surrounding space in a sealed manner.

A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit. The seal unit may include a first seal positioned outward of and surrounding the plurality of support elements. A position of a substrate contact region of an upper surface of the first seal may be arranged at a distance from the plurality of support elements sufficient enough such that during the loading/unloading of the substrate, a force applied to the first seal by the substrate is greater than a force applied to the plurality of support elements by the substrate. A profile of the contact region, in a cross section through the seal, may have a shape which is configured such that during the loading/unloading of the substrate, the substrate contacts the seal via at least two different points of the profile.

Porous plugs for gas delivery in substrate supports and substrate supports and substrate processing chambers incorporating same are provided herein. In some embodiments, a porous plug for use in a substrate support includes: a porous central passageway; and a solid outer shell bonded to and surrounding the porous central passageway such that there is no continuous gap between the porous central passageway and the solid outer shell along an entire length of the porous plug, wherein the solid outer shell includes sealing surfaces disposed on ends of the solid outer shell to facilitate forming a seal along the sealing surface and surrounding the porous central passageway. In some embodiments, one or more o-ring retaining grooves can be formed about the outer surface of the solid outer shell.

Implementations described herein relate to a platform apparatus for post exposure processing. In one implementation, a platform apparatus includes a plumbing module and a process module. The process module further includes a central region having a robot disposed therein, and a plurality of process stations disposed about the central region and sharing the plumbing module. Each process station includes a process chamber and a post process chamber in a stacked arrangement. The process chamber includes a chamber body defining a process volume, a door coupled to the chamber body, a first electrode coupled to the door, and a power source communicatively coupled to the first electrode.

A diffuser includes a diffuser element made of silicon carbide having conductivity, conductive holding members for holding the diffuser element, conductive gaskets that seal between the diffuser element and the holding members. Static electricity on the diffuser element is eliminated through the gaskets, and the holding members.

A substrate processing system is disclosed which includes a processing chamber comprising a susceptor having a first surface and a second surface opposite to the first surface, a groove formed in the first surface adjacent to a perimeter thereof, and a substrate support structure including a plurality of carrier lift pins, each of the plurality of carrier lift pins movably disposed in an opening formed from the second surface to the first surface, wherein the opening is recessed from the groove.

A method and device for coating projecting surfaces of discrete projections of a product substrate that has functional units arranged at least partially in recesses. The method includes the steps of: bringing the projecting surfaces into contact with a coating material that is applied on a carrier substrate, and separating the carrier substrate from the projecting surfaces in such a way that the coating material remains partially on the product substrate. In addition, this invention relates to a corresponding device.

A semiconductor device manufacturing method comprising the steps of providing a matrix substrate having a main surface with plural device areas formed thereon, fixing plural semiconductor chips to the plural device areas respectively, then sealing the plural semiconductor chips all together with resin to form a block sealing member, dividing the block sealing member and the matrix substrate for each of the device areas by dicing, thereafter rubbing a surface of each of the diced sealing member portions with a brush, then storing semiconductor devices formed by the dicing once into pockets respectively of a tray, and conveying the semiconductor devices each individually from the tray. Since the substrate dividing work after block molding is performed by dicing while vacuum-chucking the surface of the block sealing member, the substrate division can be done without imposing any stress on an external terminal mounting surface of the matrix substrate.