Patent classifications
H01L21/67259
METHODS AND SYSTEMS OF IMAGE BASED ROBOT ALIGNMENT
A system for monitoring alignment of a second component relative to a first component includes a camera, and a controller including a processor and a nontransitory memory. The controller is configured to receive a first captured image from the camera when the second component is in a predetermined position relative to the first component, receive a selection of a region of interest (ROI) in the first captured image, identify a visible feature of the second component within the ROI of the first captured image, receive captured images from the camera during a subsequent operation, identify a second captured image when the second component is expected to be in the predetermined position relative to the first component, and determine if the second component is in the predetermined position relative to the first component based on the second captured image and the identified visible feature of the first captured image.
Laser light radiation device and laser light radiation method
A laser light irradiation device includes: a laser light source; a spatial light modulator including a display unit configured to display a phase pattern; an objective lens configured to condense a laser light emitted from the spatial light modulator at the object; an image-transfer optical system configured to transfer an image of the laser light on the display unit to an entrance pupil plane of the objective lens; a reflected light detector configured to detect reflected light of the laser light which is incident in the object and reflected by an opposite surface opposite to a laser light entrance surface; and a controller configured to control the phase pattern. When the reflected light detector detects the reflected light, the controller displays a reflected light aberration correction pattern which is the phase pattern correcting aberration generated in the event of the laser light being transmitted through the object having twice the predetermined thickness.
Method and device for alignment of substrates
A method for aligning and contacting a first substrate with a second substrate using a plurality of detection units and a corresponding device for alignment and contact.
PORTABLE ROBOTIC SEMICONDUCTOR POD LOADER
A portable robotic semiconductor pod loader may detect, with at least one sensor, receipt of a semiconductor pod on a load port of the portable robotic semiconductor pod loader. The at least one sensor is supported by the load port. The portable robotic semiconductor pod loader may cause a robot, of the portable robotic semiconductor pod loader, to align with the semiconductor pod provided on the load port. The portable robotic semiconductor pod loader may cause the robot to attach to the semiconductor pod, and may cause the robot to provide the semiconductor pod from the load port to a staging area of a semiconductor processing tool.
SYSTEM AND METHOD FOR MITIGATING OVERLAY DISTORTION PATTERNS CAUSED BY A WAFER BONDING TOOL
A system includes a wafer shape metrology sub-system configured to perform one or more shape measurements on post-bonding pairs of wafers. The system includes a controller communicatively coupled to the wafer shape metrology sub-system. The controller receives a set of measured distortion patterns. The controller applies a bonder control model to the measured distortion patterns to determine a set of overlay distortion signatures. The bonder control model is made up of a set of orthogonal wafer signatures that represent the achievable adjustments. The controller determines whether the set of overlay distortion signatures associated with the measured distortion patterns are outside tolerance limits provides one or more feedback adjustments to the bonder tool.
Bonding apparatus, bonding system, bonding method, and recording medium
A bonding apparatus configured to bond substrates comprises a first holder configured to vacuum-exhaust a first substrate to attract and hold the first substrate on a bottom surface thereof; a second holder disposed under the first holder, and configured to vacuum-exhaust a second substrate to attract and hold the second substrate on a top surface thereof; a mover configured to move the first holder and the second holder relatively in a horizontal direction; a laser interferometer system configured to measure a position of the first holder or the second holder which is moved by the mover; a linear scale configured to measure a position of the mover; and a controller configured to control the mover based on a measurement result of the laser interferometer system and a measurement result of the liner scale.
WAFER ALIGNMENT DEVICE, WAFER ALIGNMENT METHOD AND WAFER ALIGNMENT SYSTEM
The present application provides a wafer alignment device, a wafer alignment method and a wafer alignment system. The wafer alignment device includes a detector and an adjustor; the detector is configured to detect an offset of a wafer from a standard position; and the adjustor is configured to adjust a position of the wafer according to the offset of the wafer detected by the detector, so that an error between the position of the wafer and the standard position meets a requirement. The present application can achieve the automatic adjustment of an offset of a wafer, thus achieving the effect of increasing the accuracy of a manipulator subsequently grabbing the wafer.
Processing system and method using transporting device facilitating replacement of consumable part
A method includes estimating a replacement time of a consumable part of a processing device, specifying a timing after substrate processing of the processing device is completed in a period before the replacement time as a replaceable timing of the consumable part, estimating a movement time period required for the part transporting device to move to a position of the processing device requiring the replacement, and estimating a preparation time period required for preparation until the part transporting device moved to the position of the processing device requiring the replacement becomes a state in which the consumable part is replaceable. The method further includes transmitting a replacement instruction to the part transporting device at a timing before a timing that is earlier than the replaceable timing by a total time of the movement time period and the preparation time period, and instructing the replacement of the consumable part.
TILTABLE AND ROTATABLE SUBSTRATE CARRIER AND MULTI-LAYER VACUUM DEPOSITION SYSTEM COMPRISING SAME
A module for operating a carrier of one or more substrates to be treated in a vacuum deposition method includes a frame provided with a plate receiving, on a first side, an electronic assembly comprising radio transmitter/receiver electronics, a processor card, motor controller electronics and a battery for supplying power to the module. The processor card has a program memory with a program for controlling the motor controller electronics according to data received from a remote apparatus provided with a radio transmitting/receiving device for communicating with the module's radio transmitter/receiver electronics and, on a second side, a device for operating the carrier, which device is provided with a first motor for rotating the carrier about a first axis parallel to the plate and with a second motor for rotating the carrier about a second axis perpendicular to the plate.
SUBSTRATE MAPPING DEVICE, METHOD OF MAPPING BY THE DEVICE, AND METHOD OF TEACHING THE MAPPING
A substrate mapping device 4 maps a plurality of substrates 10 inside a container where the substrates 10 are accommodated so as to be arrayed in a given arrayed direction. The substrate mapping device 4 includes a sensor 16 configured to detect a state of the substrate 10, a manipulator 14 configured to move the sensor 16, and a control device 18 configured to control the manipulator 14 to move the sensor 16 along a mapping course. The control device 18 sets a first mapping position and a second mapping position different in the position in the arrayed direction of the substrates 10 from the first mapping position, and sets the mapping course based on the first mapping position and the second mapping position.