The method includes the steps of: detecting a part, of a surface of a target, that is located on an inner circumferential side of a predetermined circle centered on a rotation axis and passing the target, by an object detection sensor, at plural rotation positions when at least one of a rotation position of the target about the rotation axis on a substrate placement portion and a rotation position of a detection area about a robot reference axis is changed; calculating a quantity correlated with an index length representing a distance from the robot reference axis to the target when the target is detected by the object detection sensor, for each rotation position; and calculating the positional relationship between the robot reference axis and the rotation axis on the basis of, among the rotation positions, the one at which the quantity correlated with the index length is maximized or minimized.

An apparatus includes a substrate; circuit components disposed on the substrate; and a location identifier layer over the circuit, wherein the location identifier layer includes one or more section labels for representing physical locations of the circuit components within the apparatus.

According to one embodiment, a substrate processing device includes a stage configured to mount a substrate, a mold having a first surface facing an upper surface of an outer peripheral edge of the substrate and a second surface facing a side surface of an outer peripheral continuous with the upper surface of the outer peripheral edge, a mold moving mechanism configured to move the mold to bring the first surface close to the upper surface of the outer peripheral edge of the substrate and the second surface close to the side surface of the outer peripheral of the substrate, and a nozzle arranged in the mold, wherein the nozzle ejects resist.

Provided are an alignment jig, a side track buffer system including the same, and an alignment method using the same. The alignment jig includes a horizontal jig fixed to a bottom plate of a side track buffer to extend in a horizontal direction to a lower portion of the transfer rail, and a vertical jig fixed to the transfer rail to extend downward in a vertical direction so as to be adjacent to a top surface in the horizontal direction. A separation distance between an intersection point of the vertical jig and the horizontal jig and a central portion of the bottom plate is detected as a buffer separation distance, and a buffer frame is horizontally moved automatically or manually to allow the buffer separation distance to match a reference separation distance, so that the side track buffer is installed in an accurate position.

Implementations described herein relate to pressure control for vacuum chuck substrate supports. In one implementation, a process chamber defines a process volume and a vacuum chuck support is disposed within the process volume. A pressure controller is disposed on a fluid flow path upstream from the vacuum chuck and a flow restrictor is disposed on the fluid flow path downstream from the vacuum chuck. Each of the pressure controller and flow restrictor are in fluid communication with a control volume of the vacuum chuck.

Systems and methods are described for integrated decomposition and scanning of a semiconducting wafer, where a single chamber is utilized for decomposition and scanning of the wafer of interest.

A method, a non-transitory computer readable medium and a device. The method may include (a) introducing a voltage difference between an absolute value of a negative pole of the electrostatic chuck and an absolute value of a positive pole of the electrostatic chuck, the introducing occurs while the wafer is supported by the electrostatic chuck and is contacted by one or more conductive contact pins of the electrostatic chuck; (b) monitoring, by an electrostatic sensor that comprises a sensing element, a charge at a point of measurement located at a front side of the wafer, at different points of time that follow a start of the introducing of the voltage difference, to provide monitoring results; and (c) determining an electrical parameter of the contact between the wafer and the electrostatic chuck, based on the monitoring results.

There is provided a system for processing a substrate under a depressurized environment. The system comprises: a processing chamber configured to perform desired processing on a substrate; a transfer chamber having a transfer mechanism configured to import or export the substrate into or from the processing chamber; and a controller configured to control a processing process in the processing chamber. The transfer mechanism comprises: a fork configured to hold the substrate on an upper surface; and a sensor provided in the fork and configured to measure an internal state of the processing chamber. The controller is configured to control the processing process in the processing chamber on the basis of the internal state of the processing chamber measured by the sensor.

Provided is a substrate transferring method which is capable of accurately mounting a substrate at a desired rotation angle. In order to eliminate a misalignment of a wafer W in a rotational direction in a vacuum process chamber, which is caused by a variation in a transfer distance of the wafer W, the wafer W is mounted on a stage while being offset from the center of the stage in a load lock chamber and an angle of rotation of the wafer W with respect to a fork when a transfer arm receives the wafer W is changed.

A device for transferring components from a first carrier to a second carrier. A first receptacle receives the first carrier so that components carried by the first carrier are oriented towards a second receptacle. A separating device separates the components from the first carrier for transfer to the second carrier. A first conveyor moves the first receptacle transverse to the conveying direction of the second carrier. A second conveyor moves the separating device transverse to the conveying direction of the second carrier. A first inspection device detects one of the components in its position relative to a storage position on the second receptacle guiding the second carrier. A second inspection device is arranged upstream of the storage position and detects one of the subassemblies on the second carrier relative to the second receptacle and signals the position of the subassembly to a controller.