A substrate processing condition setting method includes acquiring, causing, and setting. In the acquiring, a plurality of estimation processing results are acquired by inputting a plurality of processing conditions to a trained model that is subjected to machine training based on a training processing condition and a processing result obtained by processing a substrate under the training processing condition. In the causing, a display section is caused to display an image based on the estimation processing results. In the setting, one processing condition corresponding to one estimation processing result of the estimation processing results is set, as an actual processing condition in substrate processing, based on the image displayed on the display section.

Disclosed is a substrate treating apparatus for performing a predetermined treatment on a substrate. The apparatus includes: a recipe memory unit configured to store a recipe; an imaging unit provided at a predetermined location and configured to image the component as a real image at work; a normal image memory unit configured to simulate a condition in advance where the component normally operates in response to the recipe and store in advance a normal image at this time in a view from the location in accordance with three-dimensional design information of the substrate treating apparatus; an operation controller configured to cause the predetermined treatment to be performed; and an abnormality detecting unit configured to detect an abnormality in accordance with a difference between the normal image synchronized with operation of the recipe and the real image.

Methods and apparatus to minimize electromagnetic interference between adjacent process chambers of a cluster tool are described. The start time of the subject recipe is controlled based on the electromagnetic process window of the subject process chamber, the electromagnetic window of the first adjacent process chamber and of an optional second adjacent process chamber. The start time of the subject process chamber is controlled to prevent temporal overlap of the electromagnetic window of the subject chamber with the electromagnetic window of an adjacent chamber.

A substrate processing system includes a carry-in/out unit in which a cassette accommodating therein multiple substrates is carried in and out; a batch processing unit configured to process a lot including the multiple substrates at once; a single-wafer processing unit configured to process the substrates one by one; a first interface unit configured to distribute the substrates to the single-wafer processing unit or the batch processing unit; and a second interface unit configured to transfer the substrates between the batch processing unit and the single-wafer processing unit. The first interface unit includes a first placement unit configured to place therein the substrates before and after being processed by the single-wafer processing unit; a second placement unit configured to place therein the substrates before being processed by the batch processing unit; and a transfer device configured to transfer the substrates to the first placement unit and the second placement unit.

A transfer device includes a controller configured or programmed to perform at least one of a first control to make a maximum acceleration when moving a FOUP to a front end side smaller than a maximum acceleration when moving to a back end side, a second control to make a maximum deceleration when moving the FOUP to the front end side greater than a maximum deceleration when moving to the back end side, a third control to make the absolute value of the maximum deceleration when moving the FOUP to the front end side greater than the absolute value of the maximum acceleration, and a fourth control to make the absolute value of the maximum acceleration when moving the FOUP to the back end side greater than the absolute value of the maximum deceleration.

A traveling vehicle system includes a determiner to determine, upon receiving from a traveling vehicle an entry permission request for an area under control, whether or not a remaining number of vehicles to a maximum number of vehicles allowed to enter the area is equal to or less than a threshold value, and an entry permitter to temporarily hold the entry permission request from the traveling vehicle if the determiner determines the threshold value has not been exceeded and upon arrival of the traveling vehicle at an entry region for the area, grant the traveling vehicle permission to enter the area if a sum of a number of traveling vehicles within the area and a number of traveling vehicles already permitted to enter the area is less than a maximum number of vehicles, but does not grant entry permission if the sum has reached the maximum number of vehicles.

A processing apparatus includes: a selection section that selects two or more components from a plurality of components including a holding table, a processing unit, a robot, a temporary placing unit, a carrying-in mechanism, a cleaning unit, and a carrying-out mechanism; and a control unit that handles a workpiece at part of routes that correspond to the components selected by the selection section, of the routes for passage of the workpiece at the time of processing the workpiece full-automatically by use of the plurality of components.

Embodiments disclosed herein include a diagnostic substrate, comprising a baseplate, and a first plurality of image sensors on the baseplate, where the first plurality of image sensors are oriented horizontal to the baseplate. In an embodiment, the diagnostic substrate further comprises a second plurality of image sensors on the baseplate, where the second plurality of image sensors are oriented at a non-orthogonal angle to the baseplate. In an embodiment, the diagnostic substrate further comprises a printed circuit board (PCB) on the baseplate, and a controller on the baseplate, where the controller is communicatively coupled to the first plurality of image sensors and the second plurality of image sensors by the PCB. In an embodiment, the diagnostic substrate further comprises a diffuser lid over the baseplate, the PCB, and the controller.

Embodiments disclosed herein include a processing tool for semiconductor processing. In an embodiment, the processing tool comprises a chamber, and a plurality of witness sensors integrated with the chamber. In an embodiment, the processing tool further comprises a drift detection module. In an embodiment, data from the plurality of witness sensors is provided to the drift detection module as input data. In an embodiment, the processing tool further comprises a dashboard for displaying output data from the drift detection module.

A substrate processing system for performing processing on a plurality of substrates. The substrate processing system comprises: a processing unit comprising a plurality of processing modules each configured to perform a predetermined process; a transfer unit having a transfer device configured to transfer a substrate to each of the plurality of processing modules; a loading/unloading unit configured to hold a plurality of substrates and load/unload a substrate to/from the processing unit; and a controller configured to control the processing unit, the loading/unloading unit, and the transfer unit. The controller controls the transfer unit to transfer to the plurality of processing modules in a serial manner a plurality of substrates that are sequentially loaded from the loading/unloading unit to the processing unit, the controller further comprises a standby mode setting unit configured to set a standby period of the substrate at an appropriate timing depending on a content of the process.