A substrate processing apparatus and method for effectively removing an organic material such as a photoresist without using sulfuric acid are provided. The substrate processing apparatus includes a support module, in which a substrate is inverted and seated, and an ultraviolet light source is installed, wherein the substrate is arranged so that one surface of the substrate faces the support module, and the ultraviolet light source irradiates ultraviolet rays to one surface of the substrate; a nozzle installed in the support module; and a fluid supply module for supplying a fluid to one surface of the substrate through the nozzle.

A vacuum orientation module for a substrate processing system is described. The module includes at least a first vacuum orientation chamber, comprising: a vacuum chamber; a transportation track within the vacuum chamber, the transportation track having a support structure and a driving structure and defining a transportation direction; and an orientation actuator to change the substrate orientation between a non-vertical orientation and a non-horizontal orientation, the vacuum chamber has two slit openings, particularly two essentially vertically slit openings, at opposing side walls of the vacuum chamber in the transportation direction.

A cleaning device for a display panel is configured with a sensor corresponding to a water jet nozzle, and a control switch which suspends an operation of the device when the water jet nozzle is detected as working abnormally, thereby preventing abnormal products from being produced due to the failure of finding an abnormal condition of the water jet nozzle in time, ensuring the normal process of the product, and preventing the nonessential economic loss.

A vacuum orientation module for a substrate processing system is described. The module includes at least a first vacuum orientation chamber, comprising: a vacuum chamber; a first transportation track within the vacuum chamber, the first transportation track having a first support structure and a first driving structure and defining a transportation direction; an orientation actuator to change the substrate orientation between a non-vertical orientation and a non-horizontal orientation, the vacuum chamber has a first pair of two slit openings, particularly essentially vertical slit openings, at opposing side walls of the vacuum chamber in the transportation direction; and a second transportation track within the vacuum chamber, the second transportation track having a second support structure and a second driving structure extending along the transportation direction, the vacuum chamber has a second pair of two slit openings at the opposing side walls of the vacuum chamber.

A substrate transportation hand for transporting a substrate includes: at least one first holding part provided on an upper surface side of the substrate transportation hand and capable of sucking and holding the substrate; at least one second holding part provided on a lower surface side of the substrate transportation hand and capable of sucking and holding the substrate; and a drive unit for independently turning on/off sucking using the first holding part and the second holding part, in order to provide a substrate transportation hand which can efficiently transport while preventing dust in accordance with a form of a substrate.

A substrate cleaning and drying system includes a cleaning station, a drying station positioned adjacent the cleaning station, a cleaner robot to transfer a substrate from the cleaning station to the drying station, an aligner stage adjacent to the drying station, a robot arm rotatable between a substantially vertical first position for receiving the substrate from the drying station and a substantially horizontal second position for releasing the substrate onto the aligner stage, and a factory interface robot to transfer a substrate from the aligner stage into a factory interface module while in a horizontal orientation. The aligner stage includes a rotatable support to hold the substrate in a substantially horizontal orientation and to rotate the substrate to a desired orientation.

A substrate cleaning and drying system includes a cleaning station, a drying station positioned adjacent the cleaning station, a cleaner robot to transfer a substrate from the cleaning station to the drying station, an aligner stage adjacent to the drying station, a robot arm rotatable between a substantially vertical first position for receiving the substrate from the drying station and a substantially horizontal second position for releasing the substrate onto the aligner stage, and a factory interface robot to transfer a substrate from the aligner stage into a factory interface module while in a horizontal orientation. The aligner stage includes a rotatable support to hold the substrate in a substantially horizontal orientation and to rotate the substrate to a desired orientation.

An apparatus for transporting a substrate includes a transport chamber including a wall having an opening through which carry-in/out of the substrate to/from the substrate processing chamber is performed and a movement surface having a first magnet, a transport module accommodated in the transport chamber to hold the substrate, including a second magnet to which a magnetic force is applied, and configured to be movable along the movement surface in a floating state from the movement surface, an angle adjusting mechanism provided in the transport chamber to switch an angle of the movement surface between a first angle and a second angle which is closer to a vertical state than the first angle, and a transport passage forming a portion of the transport chamber, and including the movement surface at the second angle to which the movement surface switched to the second angle can be connected.

A vacuum processing apparatus including: a plurality of transport chambers arranged in order along a first direction; a plurality of process chambers connected to the transport chambers along a second direction that is perpendicular to the first direction; and a position conversion chamber connected to a first transport chamber among the transport chambers. The transport chambers include a rotational movement stage that rotates about a rotation axis that is perpendicular to the first direction and the second direction, and moves along a plane formed by the first direction and the second direction.

In a substrate transporter, a carry-in-and-out mechanism transports a substrate placed in a horizontal posture. A notch aligner rotates a substrate in a circumferential direction to change a circumferential position of a notch. The carry-in-and-out mechanism includes four supporters that oppose a lower surface of the peripheral portion of the substrate. In the substrate transporter, a controller controls the notch aligner on the basis of warpage-and-notch-position information and input information that is input about the warped state of the substrate, to determine the circumferential position of the notch of the substrate. Thus, the lower surface of the substrate placed on the transport mechanism comes into contact with the four supporters of the transport mechanism. As a result, it is possible to prevent or suppress the occurrence of rattling or misalignment of the substrate during transport by the transport mechanism, and enables stable transport of the substrate.