To stably convey a substrate (workpiece) while suppressing the workpiece from bending. A treatment device is provided. This treatment device includes: a conveying part that conveys a workpiece in a state where a flat surface of the workpiece is inclined around a conveying directional axis relative to a horizontal plane; and a treatment part in which at least one of polishing and cleaning is performed on the flat surface of the workpiece, wherein the conveying part has a drive part configured to be brought into physical contact with an end part of the workpiece and apply force in a conveying direction to the workpiece, a first Bernoulli chuck arranged to face the flat surface of the workpiece, and a second Bernoulli chuck arranged to face an end face of an opposite end part to the end part of the workpiece.

Techniques herein pertain to apparatus embodiments and methods for treating the surface of a microelectronic substrate, and in particular for removing objects from the microelectronic substrate using fluid treatment sprays such as cryogenic fluid sprays. The apparatus embodiments and methods described herein further include techniques for monitoring and/or controlling treatment processes for removing particles from surfaces of a microelectronic substrate. The techniques allow using image analysis techniques to monitor characteristics of spray nozzle(s) (e.g., frost formation on the nozzle surface) and using the resultant image information of the nozzle to take corrective action if frost or another nozzle condition is detected.

A system for connecting photovoltaic cells is disclosed. The system comprises a flexible component feeder source for feeding the photovoltaic cells to a process that couples them together; a vacuum conveyor for receiving at a first location the coupled photovoltaic cells and including openings through which a vacuum is applied to hold the coupled photovoltaic cells in place; a moving belt above the vacuum conveyor at a second location, where the vacuum conveyor and the moving belt are driven in a predetermined relation to one another for conveying the coupled photovoltaic cells from the first location to the second location; a vacuum source for applying a vacuum through the openings to cause the moving belt to apply a pressure to an upper surface of the coupled photovoltaic cells to compress the coupled photovoltaic cells; and a curing source at the second location for curing the compressed coupled photovoltaic cells.

A bonding system for bonding a semiconductor element to a substrate is provided. The bonding system includes a substrate oxide reduction chamber configured to receive a substrate. The substrate includes a plurality of first electrically conductive structures. The substrate oxide reduction chamber is configured to receive a reducing gas to contact each of the plurality of first electrically conductive structures. The bonding system also includes a substrate oxide prevention chamber for receiving the substrate after the reducing gas contacts the plurality of first electrically conductive structures. The substrate oxide prevention chamber has an inert environment when receiving the substrate. The bonding system also includes a reducing gas delivery system for providing a reducing gas environment during bonding of a semiconductor element to the substrate.

A poling apparatus for poling a polymer thin film formed on a workpiece carried by a workpiece carrier. The workpiece has grounding electrodes and grounding pads located at edges, and a thin film covering the grounding electrodes but exposing the grounding pads. The workpiece carrier has carrier electrodes located around the workpiece and inside grounding ports at the bottom. The poling apparatus includes, in a poling chamber, a poling source generating a plasma, a Z-elevator to raise the workpiece carrier toward the poling source using the grounding ports, and grounding mechanisms including downwardly biased electrical contacts which, when the workpiece carrier is raised by the Z-elevator, connect the grounding pads of the workpiece with the carrier electrodes, to ground the workpiece. The poling apparatus additionally includes preparation platform and transfer platform with conveyer systems with rollers and Z-elevators to move the workpiece carrier in and out of the poling chamber.

A magnetic levitation system for transporting a carrier is described. The magnetic levitation system includes a base defining a transportation track, a carrier movable relative to the base along the transportation track, and a plurality of active magnetic bearings provided at the base and configured to face a guided structure of the carrier. The guided structure includes a first guided zone and a second guided zone configured to interact with the plurality of active magnetic bearings and a recessed zone. The recessed zone is arranged between the first guided zone and the second guided zone in a transport direction of the carrier and is recessed with respect to the first guided zone and the second guided zone.

A wet etching apparatus is provided. The wet etching apparatus induces an etching chamber, at least one shutter, and at least one spraying pipe. The etching chamber is used for accommodating and etching a substrate, and has an inlet at its front end as well as an outlet at its rear end. The shutter is mounted at the inlet or the outlet by a shaft. The spraying pipe disposed on the shaft overturns with the shutter at the same time. It can effectively remove a large number of crystals of the etching liquid generated at the inlet of the etching chamber and the outlet of the etching chamber by spraying over the inlet of the etching chamber and the outlet of the etching chamber through the spraying pipe, thereby improving an utilization of the apparatus, cleanliness, and a product quality.

An apparatus and method for manufacturing an organic light emitting diode (OLED) for lighting are disclosed. The manufacturing apparatus includes a plurality of rolling members configured to move, in a transverse direction, a band-shaped base having holes formed at predetermined intervals at both width-direction ends thereof, and arranged at predetermined intervals along a movement direction of the base, and a deposition unit configured to discharge a vaporization material from a deposition source and sequentially depositing the discharged vaporization material on one surface of the base, along with the movement of the base. A plurality of protrusion members are formed on one surface of each of the rolling members, to move the base by being inserted in and released from the holes at both ends of the base along with rotation of the tolling members.

An apparatus includes a vacuum chamber, a wafer transfer mechanism, a first gas source, a second gas source and a reuse gas pipe. The vacuum chamber is divided into at least three reaction regions including a first reaction region, a second reaction region and a third reaction region. The wafer transfer mechanism is structured to transfer a wafer from the first reaction region to the third reaction region via the second reaction region. The first gas source supplies a first gas to the first reaction region via a first gas pipe, and a second gas source supplies a second gas to the second reaction region via a second gas pipe. The reuse gas pipe is connected between the first reaction region and the third reaction region for supplying an unused first gas collected in the first reaction region to the third reaction region.

An apparatus configured to join electronic components to an electronic substrate includes a chamber housing including a tunnel extending through multiple processing zones, a conveyor configured to transport electronic substrates in the tunnel through the multiple processing zones, and a heat detection system including at least one temperature sensor coupled to the chamber housing. The at least one temperature sensor is configured to detect temperatures of the electronic substrates passing proximate to the at least one temperature sensor. The apparatus further includes a controller coupled to the multiple processing zones, the conveyor and the heat detection system. The controller is configured to receive temperature data from the heat detection system.