An integrated fan out package is utilized in which the dielectric materials of different redistribution layers are utilized to integrate the integrated fan out package process flows with other package applications. In some embodiments an Ajinomoto or prepreg material is utilized as the dielectric in at least some of the overlying redistribution layers.

To prevent deterioration of light incident/emission environment in a semiconductor device in which a transmissive material is laminated on an optical element forming surface via an adhesive. The semiconductor device includes a semiconductor element manufactured by chip size packaging, a transmissive material which is bonded with an adhesive to cover an optical element forming surface of the semiconductor element, and a side surface protective resin which covers an entire side surface where a layer structure of the semiconductor element and the transmissive material is exposed.

A semiconductor device and method is disclosed. Devices shown include a die coupled to an integrated routing layer, wherein the integrated routing layer includes a first width that is wider than the die. Devices shown further included a molded routing layer coupled to the integrated routing layer.

The present disclosure relates to a radio frequency (RF) device that includes a mold device die and a multilayer redistribution structure underneath the mold device die. The mold device die includes a device region with a back-end-of-line (BEOL) portion and a front-end-of-line (FEOL) portion over the BEOL portion, a thermally conductive film, and a first mold compound. The FEOL portion includes isolation sections and an active layer surrounded by the isolation sections. The thermally conductive film, which has a thermal conductivity greater than 10 W/m.Math.K and an electrical resistivity greater than 1E5 Ohm-cm, resides between the active layer and the first mold compound. Herein, silicon crystal does not exist between the first mold compound and the active layer. The multilayer redistribution structure includes a number of bump structures, which are at a bottom of the multilayer redistribution structure and electrically coupled to the FEOL portion of the mold device die.

In examples, a method of manufacturing a transformer device comprises providing a first magnetic member and providing a laminate member containing primary and secondary transformer windings wound around an orifice extending through the laminate member. The method further comprises positioning a build up film abutting the laminate member. The method also comprises positioning at least a portion of a second magnetic member in the orifice. The method further comprises heat pressing at least one of the first and second magnetic members such that a distance between the first and second magnetic members decreases and such that the build-up film melts, thereby producing a transformer device.

The present application relates to a package substrate and a package structure. The package substrate includes: a first conductive layer, located on the top of a base and comprising power lines configured to supply power to chips and signal lines configured to provide signals to the chips; and, a second conductive layer, located on the bottom of the base and comprising first pads and local interconnection lines, the first pads being electrically connected to the signal lines, the plurality of associated first pads being electrically connected by the local interconnection lines.

A semiconductor device includes first, second, and third metal layers on a surface of the insulating substrate. A first terminal is connected to the first metal layer at a first region. A second terminal is connected to the second metal layer at a second region. An output terminal is connected to the third metal layer. First chips are aligned along a first direction on the first metal layer. Second chips are aligned along the first direction on the third metal layer. A first wire connects a first upper electrode of a first chip to the third metal layer. A second wire connects a second upper electrode of a second chip to the second metal layer. The second chips are between the first chips and the third metal layer in a second direction perpendicular to the first direction. Available conductive routes between the first and second terminals are made more uniform.

A redistribution layer for an integrated circuit package is provided. The redistribution layer includes a first conductive layer and a second layer disposed directly on the first conductive layer. The first conductive layer has a resistivity of less than 3.6*10.sup.−8 Ω.Math.m and has a thickness of greater than or equal to 1 μm. The second layer includes tungsten. An integrated circuit package is also provided that includes the redistribution layer electrically connecting a first integrated circuit of the first integrated circuit package to a first input/output of a frame of the integrated circuit package. The frame is connected to the first integrated circuit. A method for manufacturing a redistribution layer is also provided.

A semiconductor device includes a heatsink, an insulating resin layer on the heatsink, and a metallic plate including a first surface in contact with a first region of the insulating resin layer and a second surface to which a semiconductor chip is adhered. The device further includes a lead terminal connected to the metallic plate; a first mold resin covering a part of the metallic plate and a part of the lead terminal; and a second mold resin covering another part of the metallic plate, the semiconductor chip, and another part of the lead terminal. The first mold resin has a third surface in the same plane as that of the first surface, the third surface extending from an outer peripheral edge of the metallic plate to that of the insulating resin layer or outside thereof in plan view in contact with the second region of the insulating resin layer.

Embodiments described herein may be related to apparatuses, processes, and techniques for a dam structure on a substrate that is proximate to a die coupled with the substrate, where the dam decreases the risk of die shift during encapsulation material flow over the die during the manufacturing process. The dam structure may fully encircle the die. During encapsulation material flow, the dam structure creates a cavity that moderates the different flow rates of material that otherwise would exert different pressures the sides of the die and cause to die to shift its position on the substrate. Other embodiments may be described and/or claimed.