A semiconductor package structure includes a chip, a conductive pillar, a dielectric layer, a first patterned conductive layer and a second patterned conductive layer. The chip has a first side with at least a first metal electrode pad and a second side with at least a second metal electrode pad. The conductive pillar, which has a first end and a second end, is disposed adjacent to the chip. The axis direction of the conductive pillar is parallel to the height direction of the chip. The dielectric layer covers the chip and the conductive pillar and exposes the first and second metal electrode pads of the chip and the first and second ends of the conductive pillar. The first patterned conductive layer is disposed on a second surface of the dielectric layer and electrically connected between the second metal electrode pad and the second end of the conductive pillar. The second patterned conductive layer is disposed on a first surface of the dielectric layer and electrically connected between the first metal electrode pad and the first end of the conductive pillar.

A light-emitting element includes a core comprising a first semiconductor layer, a second semiconductor layer disposed on the first semiconductor layer, and an emissive layer disposed between the first semiconductor layer and the second semiconductor layer, an interlayer dielectric film surrounding a side surface of the core, a first element insulating film surrounding an outer surface of the interlayer dielectric film, and a second element insulating film surrounding an outer surface of the first element insulating film. The interlayer dielectric film includes an oxide insulating material having a dielectric constant of about 10 or more, and the interlayer dielectric film has a thickness of less than or equal to about 5 nm.

The present disclosure relates to an embedded packaging module comprising a first semiconductor device, a first packaging layer and a first wiring layer, the first semiconductor device having a first and a second face, at least two positioning bulges and at least one bonding pad being provided on the first face of the first semiconductor device; the first packaging layer being formed on both the first face and a surface adjacent to the first face, the positioning bulges being positioned in the first packaging layer, at least one first via hole being provided in the first packaging layer, the bottom of the first via hole being positioned in the bonding pad and contacting with the bonding pad; the first wiring layer being positioned on the side of the first packaging layer away from the first semiconductor device and being electrically connected with the bonding pad through the first via hole.

A substrate that includes a core layer comprising a first surface and a second surface, a plurality of core interconnects located in the core layer, a high-density interconnect portion located in the core layer, a first dielectric layer coupled to the first surface of the core layer, a first plurality of interconnects located in the first dielectric layer, a second dielectric layer coupled to the second surface of the core layer, and a second plurality of interconnects located in the second dielectric layer. The high-density interconnect portion includes a first redistribution dielectric layer and a first plurality of high-density interconnects located in the first redistribution dielectric layer. The high-density interconnect portion may provide high-density interconnects.

A pixel includes an emission area and a non-emission area; first to fourth alignment electrodes spaced apart from each other in the emission area and an area of the non-emission area; an insulating layer disposed on the first to fourth alignment electrodes; first to fourth bridge patterns disposed on the insulating layer in the non-emission area; a bank disposed on the first to fourth bridge patterns in the non-emission area, and including a first opening and a second opening; first and second pixel electrodes disposed in the emission area; and light emitting elements disposed in the emission area, and electrically connected with the first and second pixel electrodes. The first alignment electrode, the first bridge pattern, and the first pixel electrode are electrically connected to each other. The third alignment electrode, the third bridge pattern, and the second pixel electrode are electrically connected to each other.

The display device comprises a first electrode and a second electrode disposed on a first surface of a substrate, the first electrode and the second electrode spaced apart from each other, least one light-emitting element disposed between the first electrode and the second electrode, a functional layer disposed on a second surface of the substrate, and a reflective layer disposed between the functional layer and the second surface of the substrate, the reflective layer overlapping the light-emitting element in a plan view.

Semiconductor packaging substrates and processing sequences are described. In an embodiment, a packaging substrate includes a build-up structure, and a patterned metal contact layer partially embedded within the build-up structure and protruding from the build-up structure. The patterned metal contact layer may include an array of surface mount (SMT) metal bumps in a chip mount area, a metal dam structure or combination thereof.

Described herein are transistors with front-side and back-side routing, and IC devices including such transistors. The transistor includes a channel material having a longitudinal structure and formed in a dielectric material. A source region encloses a first portion of the channel material, a gate electrode encloses a second portion of the channel material, and a drain region encloses a third portion of the channel material. Each of the source region, gate electrode, and drain region have a first face and a second face opposite the first face, the first and second faces co-planar with the faces of the dielectric material. A first contact is coupled to the first face of the source region, and a second contact is coupled to the second face of the source region.

Embodiments disclosed herein include semiconductor dies with hybrid bonding layers and multi-die modules that are coupled together by hybrid bonding layers. In an embodiment, a semiconductor die comprises a die substrate, a pad layer over the die substrate, where the pad layer comprises first pads with a first dimension and a first pitch and second pads with a second dimension and a second pitch. In an embodiment, the semiconductor die further comprises a hybrid bonding layer over the pad layer. In an embodiment, the hybrid bonding layer comprises a dielectric layer, and an array of hybrid bonding pads in the dielectric layer, wherein the hybrid bonding pads comprise a third dimension and a third pitch.

A semiconductor sub-assembly and a semiconductor power module capable of having the reduced thickness of a chip and reduced thermal resistance are provided. The semiconductor sub-assembly includes a single or a plurality of semiconductor chips having a first electrode that is formed on the lower surface thereof, a second electrode that is formed on the upper surface thereof, and a plurality of chip-side signal electrode pads that are formed at one end of the upper surface thereof. The semiconductor chip is embedded in the embedded structure and a plurality of extension signal electrode pads are connected to each of the chip-side signal electrode pads. The extension signal electrode pad is formed on the embedded substrate in a size greater than the chip-side signal electrode pad when viewed on the plane.