A Schottky diode comprises: a first electrode; a second electrode; and a body of semiconductive material connected to the first electrode at a first interface and connected to the second electrode at a second interface, wherein the first interface comprises a first planar region lying in a first plane and the first electrode has a first projection onto the first plane in a first direction normal to the first plane, the second interface comprises a second planar region lying in a second plane and the second electrode has a second projection onto the first plane in said first direction, at least a portion of the second projection lies outside the first projection, said second planar region is offset from the first planar region in said first direction, and one of the first interface and the second interface provides a Schottky contact.

A semiconductor device includes “n” pairs of pn-junction structures, wherein the i-th pair includes two pn-junction structures of the i-th type, wherein the two pn-junction structures of the i-th type are anti-serially connected, wherein the pn-junction structure of the i-th type has an i-th junction grading coefficient m.sub.i. A first pair of the n pairs of pn-junction structures has a first junction grading coefficient m.sub.1 and a second pair of the n pairs of pn-junction structures has a second junction grading coefficient m.sub.2. The junction grading coefficients m.sub.1, m.sub.2 are adjusted to result in generation of a spurious third harmonic signal of the semiconductor device with a signal power level, which is at least 10 dB lower than a reference signal power level of the spurious third harmonic signal obtained for a reference case in which the first and second junction grading coefficients m.sub.1, m.sub.2 are 0.25.

Devices, systems and methods for uniquely identifying integrated circuits are provided. For at least one embodiment, an identifiable integrated circuit in a lot of integrated circuits includes a plurality of identifier devices. Each of the identifier devices, when tested, returns a series of first test results that form an analog identifier for the integrated circuit. For one embodiment, the identifier devices is a Zener diode. The test results may be based on reverse breakdown voltage measurements determined prior to packaging of the integrated circuit. Later testing of the integrated circuit returns a second series of reverse breakdown voltage measurements that monotonically vary over time and temperature, as compared to the first series of test results. Such monotonical variation facilitates correlation of the first series of test results with the second series of test results and, thereby, identification of the integrated circuit.

A semiconductor device includes a substrate, a first isolation structure, a second isolation structure and a dummy pattern. The substrate includes a first part surrounding a second part at a top view. The first isolation structure is disposed between the first part and the second part, to isolate the first part from the second part. The second isolation structure is disposed at at least one corner of the first part. The dummy pattern is disposed on the second isolation structure. The present invention also provides a method of forming said semiconductor device.

An apparatus comprises a conductive structure, another conductive structure, and a laminate spacer structure interposed between the conductive structure and the another conductive structure in a first direction. The laminate spacer structure comprises a dielectric spacer structure, another dielectric spacer structure, and an additional dielectric spacer structure interposed between the dielectric spacer structure and the another dielectric spacer structure. The additional dielectric spacer structure comprises at least one dielectric material, and gas pockets dispersed within the at least one dielectric material. Additional apparatuses, memory devices, electronic systems, and a method of forming an apparatus are also described.

A number of monolithic diode limiter semiconductor structures are described. The diode limiters can include a hybrid arrangement of diodes with different intrinsic regions, all formed over the same semiconductor substrate. In one example, a method of manufacture of a monolithic diode limiter includes providing an N-type semiconductor substrate, providing an intrinsic layer on the N-type semiconductor substrate, implanting a first P-type region to a first depth into the intrinsic layer, implanting a second P-type region to a second depth into the intrinsic layer, and forming at least one passive circuit element over the intrinsic layer. The method can also include forming an insulating layer on the intrinsic layer, forming a first opening in the insulating layer, and forming a second opening in the insulating layer. The method can also include implanting the first P-type region through the first opening and implanting the second P-type region through the second opening.

An apparatus comprises a conductive structure, another conductive structure, and a laminate spacer structure interposed between the conductive structure and the another conductive structure in a first direction. The laminate spacer structure comprises a dielectric spacer structure, another dielectric spacer structure, and an additional dielectric spacer structure interposed between the dielectric spacer structure and the another dielectric spacer structure. The additional dielectric spacer structure comprises at least one dielectric material, and gas pockets dispersed within the at least one dielectric material. Additional apparatuses, memory devices, electronic systems, and a method of forming an apparatus are also described.

A device includes a substrate having a top surface and a bottom surface. A first doping well having a first part and a second part is located in the substrate. An undoped moat is in the substrate between the first doping well and a second doping well. A diode includes an anode with an increased first doping concentration region in the first doping well and a cathode with an increased second doping concentration region in the second doping well. An isolation region is in the first doping well having a first portion proximate the top surface and a second portion distal to the top surface. A gap made of an undoped region is in the first doping well between the first part and the second part. The gap is located between the distal portion of the isolation region and the bottom surface of the substrate.

A TVS circuit having a first diode with a cathode coupled to a first terminal and an anode coupled to a first node. A second diode has an anode coupled to a second node and a cathode coupled to a third node. A third diode is coupled between the first node and second node. A fourth diode is coupled between the first node and third node. A fifth diode is coupled between the second node and a second terminal. A sixth diode is coupled between the second terminal and the third node. A seventh diode can be coupled between the second terminal and an intermediate node between the fifth diode and sixth diode. The first diode is disposed on a first semiconductor die, while the second diode is disposed on a second semiconductor die. Alternatively, the first diode and second diode are disposed on a single semiconductor die.

Gated MIS tunnel diode devices having a controllable negative transconductance behavior are provided. In some embodiments, a device includes a substrate, a tunnel diode dielectric layer on a surface of the substrate, and a gate dielectric layer on the surface of the substrate and adjacent to the tunnel diode dielectric layer. A tunnel diode electrode is disposed on the tunnel diode dielectric layer, and a gate electrode is disposed on the gate dielectric layer. A substrate electrode is disposed on the surface of the substrate, and the tunnel diode electrode is positioned between the gate electrode and the substrate electrode.