A capacitive element of an integrated circuit includes first and second electrodes. The first electrode is formed by a first electrically conductive layer located above a semiconductor well doped with a first conductivity type. The second electrode is formed by a second electrically conductive layer located above the first electrically conductive layer of the semiconductor well. The second electrode is further formed by a doped surface region within the semiconductor well that is heavily doped with a second conductivity type opposite the first conductivity type, wherein the doped surface region is located under the first electrically conductive layer. An inter-electrode dielectric area electrically separates the first electrode and the second electrode.

Provided is a capacitor device, a unit synapse using the capacitor device, a synapse array using the unit synapses. The capacitor device comprises a semiconductor layer which include first and second doping regions formed to be spaced apart from each other and a body region formed between the first and second doping regions; a gate electrode provided above the body region; and a gate insulator stack to have a memory function and disposed between the gate electrode and the semiconductor layer. The capacitance between the gate electrode and the first doping region is determined according to information stored in the gate insulator stack, and the state of the capacitor device is determined according to the capacitance to be one of two preset states. The unit synapse comprises a pair of capacitor devices to perform an XNOR operation.

Disclosed are semiconductor packages and semiconductor devices. In one embodiment, a semiconductor package includes a package, a first integrated passive device, and a second integrated passive device. The first integrated passive device is disposed below the package. The second integrated passive device is disposed between the package and the first integrated passive device. The first integrated passive device is electrically connected to the package through the second integrated passive device.

Semiconductor structures and methods of forming the same are provided. A method according to an embodiment includes forming a conductive feature and a first conductive plate over a substrate, conformally depositing a dielectric layer over the conductive feature and the first conductive plate, conformally depositing a conductive layer over the conductive feature and the first conductive plate, and patterning the conductive layer to form a second conductive plate over the first conductive plate and a resistor, the resistor includes a conductive line extending along a sidewall of the conductive feature. By employing the method, a high-resistance resistor may be formed along with a capacitor regardless of the resolution limit of, for example, lithography.

Some embodiments include a capacitive unit having two or more capacitive tiers. Each of the capacitive tiers has first electrode material arranged in a configuration having laterally-extending first segments and longitudinally-extending second segments. The first and second segments join at intersection-regions. The first electrode material of the first and second segments is configured as tubes. The capacitive tiers are together configured as a stack having a first side. The first electrode material caps the tubes along the first side. Capacitor dielectric material lines the tubes. Second electrode material extends into the lined tubes. Columns of the second electrode material extend vertically through the capacitive tiers and are joined with the second electrode material within the lined tubes. A conductive plate extends vertically along the first side of the stack and is directly against the first electrode material. Some embodiments include methods of forming integrated assemblies.

A method for manufacturing a high-profile capacitor with high capacity includes providing a substrate, forming a first mold layer, a first supporter layer, a second mold layer, and a second supporter layer on the substrate, where at least one of the first mold layer and the second mold layer are made of a dielectric material having a low or super low dielectric constant, defining at least one contact hole, where the now-surrounding first and second supporter layers reinforce the at least one contact hole and form first and second supporter patterns respectively, forming a lower electrode on an inner surface of the at least one contact hole, and removing the first mold layer and/or the second mold layer being made of the dielectric material by ashing.

High-density metal-oxide semiconductor (MOS) capacitor (MOSCAP) cell circuits and MOS device array circuits are disclosed. A gate comprising a selected aspect ratio disposed in a MOSCAP cell circuit comprising a cell region is configured to increase a capacitive density by increasing an extent to which metal routing layers contribute to a total MOSCAP cell circuit capacitance. An area of a MOSCAP array circuit is also reduced. Also, bulk tie cells are disposed within a MOS device array circuit in array diffusion regions to increased MOS device array circuit density. The array diffusion regions include a first device region including MOS devices and a bulk tie region including the bulk tie cells. The bulk tie region is isolated from the first device region by a diffusion cut. A diffusion cut is between a first gate on the device region and a second gate on the bulk tie region.

Embodiments provide an anti-fuse storage layout and a circuit thereof, and an anti-fuse memory and a design method thereof. The anti-fuse storage layout includes: active regions extending along a first direction and being discretely arranged along a second direction, each of the active regions including at least two memory cell regions arranged along the first direction, each of the at least two memory cell regions including an anti-fuse region and a control region arranged along the first direction, and the control regions of the adjacent memory cell regions being adjacent to each other along the first direction; a word line region extending along the second direction and intersecting with the control region; an electrical connection region extending along the second direction and intersecting with the anti-fuse region; and a programming control region extending along a third direction and being positioned at one side of the corresponding active region.

Cross-point memory cells, non-volatile memory arrays, methods of reading a memory cell, methods of programming a memory cell, and methods of writing to and reading from a memory cell are described. In one embodiment, a cross-point memory cell includes a word line extending in a first direction, a bit line extending in a second direction different from the first direction, the bit line and the word line crossing without physically contacting each other, and a capacitor formed between the word line and the bit line where such cross. The capacitor comprises a dielectric material configured to prevent DC current from flowing from the word line to the bit line and from the bit line to the word line.

Embodiments of the present invention describe a method for fabricating a memory device comprising an enlarged space between neighboring bottom electrodes comprising depositing a poly-silicon layer on a substrate depositing a carbon layer above the poly-silicon layer, patterning a photo-resist layer on the carbon layer, depositing a first spacer layer on the photo-resist layer and performing a modified photolithography process on the photo resist layer after etching back the spacer layer creating sidewalls.