Patent classifications
H01L31/0693
MULTIJUNCTION SOLAR CELLS
A multijunction solar cell including an upper first solar subcell having a first band gap and positioned for receiving an incoming light beam; a second solar subcell disposed below and adjacent to and lattice matched with said upper first solar subcell, and having a second band gap smaller than said first band gap; wherein at least one of the solar subcells has a graded band gap throughout the thickness of at least a portion of the active layer.
MULTIJUNCTION METAMORPHIC SOLAR CELL
A multijunction solar cell comprising a first solar subcell having a first band gap; a second solar subcell disposed adjacent to said first solar subcell and including an emitter layer, and a base layer having a second band gap less than the first band gap, and being lattice mismatched with the upper first solar subcell, and an intermediate layer directly adjacent to and disposed between first and the second solar subcells and compositionally graded to lattice match the first solar subcell on one side and the second solar subcell on the other side, and arranged so that light can enter and pass through the first solar subcell and at least a portion of which can be reflected back into the first solar subcell by the intermediate layer, and is composed of a plurality of layers of materials with discontinuities in their respective indices of refraction.
MULTIJUNCTION METAMORPHIC SOLAR CELL
A multijunction solar cell comprising a first solar subcell having a first band gap; a second solar subcell disposed adjacent to said first solar subcell and including an emitter layer, and a base layer having a second band gap less than the first band gap, and being lattice mismatched with the upper first solar subcell, and an intermediate layer directly adjacent to and disposed between first and the second solar subcells and compositionally graded to lattice match the first solar subcell on one side and the second solar subcell on the other side, and arranged so that light can enter and pass through the first solar subcell and at least a portion of which can be reflected back into the first solar subcell by the intermediate layer, and is composed of a plurality of layers of materials with discontinuities in their respective indices of refraction.
Nitride-based multi-junction solar cell modules and methods for making the same
A backside illuminated multi-junction solar cell module includes a substrate, multiple multi-junction solar cells, and a cell interconnection that provides a series connection between at least two of the multi-junction solar cells. The substrate may include a material that is substantially transparent to solar radiation. Each multi-junction solar cell includes a first active cell, grown over the substrate, for absorbing a first portion of the solar radiation for conversion into electrical energy and a second active cell, grown over the first active cell, for absorbing a second portion of the solar radiation for conversion into electrical energy. At least one of the first and second active cells includes a nitride.
Nitride-based multi-junction solar cell modules and methods for making the same
A backside illuminated multi-junction solar cell module includes a substrate, multiple multi-junction solar cells, and a cell interconnection that provides a series connection between at least two of the multi-junction solar cells. The substrate may include a material that is substantially transparent to solar radiation. Each multi-junction solar cell includes a first active cell, grown over the substrate, for absorbing a first portion of the solar radiation for conversion into electrical energy and a second active cell, grown over the first active cell, for absorbing a second portion of the solar radiation for conversion into electrical energy. At least one of the first and second active cells includes a nitride.
MULTIJUNCTION METAMORPHIC SOLAR CELLS
A multijunction solar cell in accordance with an example implementation includes a growth substrate; a first solar subcell disposed over or in the growth substrate; a tunnel diode disposed over the first solar subcell; and a grading interlayer directly disposed over the tunnel diode; a sequence of layers of semiconductor material forming a solar cell disposed over the grading interlayer comprising a plurality of solar subcells. The multijunction solar cell also includes a first wafer bowing inhibition layer disposed directly over an uppermost sublayer of the grading interlayer, such bowing inhibition layer having an in-plane lattice constant greater than the in-plane lattice constant of the uppermost sublayer of the grading interlayer. A second wafer bowing inhibition layer is disposed directly over the first wafer bowing inhibition layer.
Solar cell stack
A solar cell stack includes a first semiconductor solar cell having a p-n junction made of a first material with a first lattice constant, a second semiconductor solar cell having a p-n junction made of a second material with a second lattice constant, and the first lattice constant being at least 0.008 Å smaller than the second lattice constant, and a metamorphic buffer. The metamorphic buffer is formed between the first semiconductor solar cell and the second semiconductor solar cell. The metamorphic buffer includes a series of at least five layers. The lattice constant increases in the series in the direction of the semiconductor solar cell. The lattice constants of the layers of the metamorphic buffer are larger than the first lattice constant. Two layers of the buffer having a doping and the difference in the dopant concentration between the two layers being greater than 4E.sup.17 cm.sup.−3.
Solar cell stack
A solar cell stack includes a first semiconductor solar cell having a p-n junction made of a first material with a first lattice constant, a second semiconductor solar cell having a p-n junction made of a second material with a second lattice constant, and the first lattice constant being at least 0.008 Å smaller than the second lattice constant, and a metamorphic buffer. The metamorphic buffer is formed between the first semiconductor solar cell and the second semiconductor solar cell. The metamorphic buffer includes a series of at least five layers. The lattice constant increases in the series in the direction of the semiconductor solar cell. The lattice constants of the layers of the metamorphic buffer are larger than the first lattice constant. Two layers of the buffer having a doping and the difference in the dopant concentration between the two layers being greater than 4E.sup.17 cm.sup.−3.
DEVICE AND METHOD OF MONOLITHIC INTEGRATION OF MICROINVERTERS ON SOLAR CELLS
A method of fabricating a photovoltaic cell having a microinverter is provided. The method may include fabricating a monolithic microinverter layer through epitaxy and operably connecting the at least one microinverter layer to at least one photovoltaic cell formed on a photovoltaic layer. A photovoltaic device is also provided. The device may have a photovoltaic layer comprising at least one photovoltaic cell and a microinverter layer comprising at least one microinverter, wherein the microinverter layer was fabricated through epitaxy, the at least one microinverter is configured to be operably connected to at least one photovoltaic cell.
AlGaAs/GaAs solar cell with back-surface alternating contacts (GaAs BAC solar cell)
The disclosure provides a solar cell design featuring p-or-n type GaAs with alternating p-n junction regions on the back-surface of the cell, opposite incident solar irradiance. Various layers of p-or-n type GaAs are interfaced together to collect charge carriers, and a thin layer of AlGaAs is applied to the front and back surfaces to prevent recombination of charge carriers. In some embodiments, the layered an doped structure generally provides an AlGaAs window layer of about 20 nm doped to about 4×(10.sup.18) cm.sup.−3, a GaAs absorption layer of about 2000 nm doped to about 4×(10.sup.17) cm.sup.−3, a GaAs emitter layer of about 150 nm and doped to 1×(10.sup.18) cm.sup.−3, an AlGaAs heterojunction layer of about 40 nm doped to about 3×(10.sup.18) cm.sup.−3, and a GaAs emitter-contact layer of about 20 nm doped to about 1×(10.sup.19) cm.sup.−3. Additionally, AlGaAs BSF layer and GaAs BSF-contact layers each have a depth of about 20 nm and are doped to about 4×(10.sup.18) cm.sup.−3 and 1×(10.sup.19) cm.sup.−3 respectively. The emitter layer, heterojunction layer, and emitter-contact layer are doped to a conductivity type opposite the absorption layer.