A transparent electrode is formed on a region for forming a reflective electrode later on the p-type layer. Subsequently, a part of the surface of the p-type layer is dry etched to expose the n-type layer. On the p-type layer and the n-type layer exposed in the previous step, a resist layer with an opening is formed through photolithography. The opening has a pattern in which the center of the transparent electrode is exposed and the ends of the opening are covered with the resist layer. Next, the transparent electrode is wet etched. A reflective film is formed on the p-type layer and the resist layer, to remove the resist layer. Thus, only the reflective film on the p-type layer is left to form a reflective electrode. Then, a cover metal layer is continuously formed over the reflective electrode and the transparent electrode.

An optoelectronic device (50) comprising a semiconductor body (10a, 10b, 10c) having an optically active region (12), a carrier (60), and a pair of connection layers (30a, 30b, 30c) having a first connection layer (32) and a second connection layer (34), wherein: the semiconductor body is disposed on the carrier, the first connection layer is disposed between the semiconductor body and the carrier and is connected to the semiconductor body, the second connection layer is disposed between the first connection layer and the carrier, at least one layer selected from the first connection layer and the second connection layer contains a radiation-permeable and electrically conductive oxide, and the first connection layer and the second connection layer are directly connected to each other at least in regions in one or more bonding regions, so that the pair of connection layers is involved in the mechanical connection of the semiconductor body to the carrier. A production process is also specified.

A micro-LED transfer method, manufacturing method and display device are disclosed. The method comprises: coating conductive photoresist on a receiving substrate, wherein the conductive photoresist is positive-tone photoresist; bonding a carrier substrate with the receiving substrate via the conductive photoresist, wherein metal electrodes of micro-LEDs on the carrier substrate are aligned with electrodes on the receiving substrate and are bonded with the electrodes on the receiving substrate via the conductive photoresist, and the carrier substrate is a transparent substrate; selectively lifting-off micro-LEDs from the carrier substrate through laser lifting-off using a first laser; and separating the carrier substrate from the receiving substrate.

A vertical type light emitting element is disclosed. The vertical type light emitting element includes: a color conversion electrode part including a first electrode pad and a color conversion layer; a reflective electrode part including a second electrode pad and a reflective layer; and a light emitting semiconductor part interposed between the color conversion electrode part and the reflective electrode part. The color conversion electrode part further includes an electrically conductive light transmissive plate. The first electrode pad and the color conversion layer are interposed between the light transmissive plate and the upper surface of the light emitting semiconductor part. Roughnesses are formed on the upper surface of the light emitting semiconductor part bordering the color conversion electrode part to increase the amount of light entering the color conversion electrode part through the light emitting semiconductor part.

Solid state lighting (SSL) devices and methods of manufacturing SSL devices are disclosed herein. In one embodiment, an SSL device comprises a support having a surface and a solid state emitter (SSE) at the surface of the support. The SSE can emit a first light propagating along a plurality of first vectors. The SSL device can further include a converter material over at least a portion of the SSE. The converter material can emit a second light propagating along a plurality of second vectors. Additionally, the SSL device can include a lens over the SSE and the converter material. The lens can include a plurality of diffusion features that change the direction of the first light and the second light such that the first and second lights blend together as they exit the lens. The SSL device can emit a substantially uniform color of light.

A light emitting diode can include a metal support layer: a GaN-based semiconductor structure having a less than 5 microns thickness on the metal support layer, the GaN-based semiconductor structure including a p-type GaN-based semiconductor layer, an active layer on the p-type GaN-based semiconductor layer, and an n-type GaN-based semiconductor layer on the active layer; a p-type electrode on the metal support layer and including a plurality of metal layers; an n-type electrode on a flat portion of an upper surface of the GaN-based semiconductor structure, and the n-type electrode contacts the flat portion; a metal pad layer on the n-type electrode; and an insulating layer including a first part disposed on the upper surface of the GaN-based semiconductor structure, and a second part disposed on an entire side surface of the GaN-based semiconductor structure, in which the metal pad layer includes a first portion having a flat bottom surface on the n-type electrode, and a second portion having stepped surfaces.

A device comprising a semiconductor layer including a plurality of compositional inhomogeneous regions is provided. The difference between an average band gap for the plurality of compositional inhomogeneous regions and an average band gap for a remaining portion of the semiconductor layer can be at least thermal energy. Additionally, a characteristic size of the plurality of compositional inhomogeneous regions can be smaller than an inverse of a dislocation density for the semiconductor layer.

Embodiments relates to an ultraviolet light emitting diode, a method of manufacturing an ultraviolet light emitting diode, a light emitting diode package, and a LIGHTING DEVICE. An ultraviolet light emitting diode according to an embodiment includes: a substrate; a first undoped GaN layer including a planar upper surface and a V-pit on the substrate; a first nitride layer on the V-pit of the first undoped GaN layer; a first undoped AlGaN-based semiconductor layer on the first undoped GaN layer and the first nitride layer; and a second undoped GaN layer on the first undoped AlGaN-based semiconductor layer, wherein the first undoped AlGaN-based semiconductor layer includes a first region on the planar upper surface of the first undoped GaN layer and a second region located on the V-pit of of the first undoped GaN layer, and wherein an Al concentration of the first region may be greater than that of the second region.

Fluid-suspended microcomponent management systems and methods are provided. The method provides a first reservoir containing a first solution and a magnetic collection head. A plurality of magnetically polarized microcomponents is suspended in the first solution, where each microcomponent has a maximum cross-section of 150 micrometers (m) and a maximum mass of 1 microgram. A magnetic field is induced in the collection head and the microcomponents are exposed to the magnetic field. A plurality of microcomponents becomes fixed in position on a collection surface in response to the magnetic field. In one aspect, the step of exposing the microcomponents to the magnetic field includes immersing the collection head in the first reservoir. As a result, the plurality of microcomponents is collected on a surface of the collection head. Alternatively, the step of fixing the plurality of microcomponents in position includes fixing the microcomponents in position on the collection surface sidewall.

A method for producing optoelectronic devices and a surface-mountable optoelectronic device are disclosed. In an embodiment the method includes applying semiconductor chips laterally adjacent one another on a carrier, wherein contact sides of the chips face the carrier, and wherein each semiconductor chip comprises contact elements for external electrical contacting which are arranged on the contact side of the semiconductor chip and applying an electrically conductive layer on at least sub-regions of the sides of the semiconductor chips not covered by the carrier, wherein the electrically conductive layer is formed contiguously, and wherein protective elements prevent direct contact of the contact elements with the electrically conductive layer. The method further includes electrophoretically depositing a converter layer on the electrically conductive layer and removing the electrically conductive layer from regions between the converter layer and the semiconductor chips.