A self-assembly apparatus and method of the present invention for semiconductor light-emitting devices can separate semiconductor light-emitting devices attached to each other by vibrating a fluid during self-assembly to thereby prevent mis-assembly and, for smooth assembly of the semiconductor light emitting devices, generate a flow of the fluid along the movement direction of a magnet. The self-assembly apparatus comprises: a chamber in which a plurality of semiconductor light-emitting devices comprising a magnetic substance and a fluid are accommodated; a transfer unit for transferring, to an assembly location, a substrate on which the semiconductor light-emitting devices are to be assembled; a magnet spaced apart from the chamber to apply a magnetic force to the semiconductor light-emitting devices; a location control unit for controlling a location of the magnet; and a vibration generation unit for generating vibration in the fluid to thereby separate the semiconductor light-emitting devices from each other.

A growth mask layer is formed over a semiconductor material layer on a substrate. Optionally, a patterned hard mask layer can be formed over the growth mask layer. A nano-imprint lithography (NIL) resist layer is applied, and is imprinted with a pattern of recesses by stamping. The pattern in the NIL resist layer through the growth mask layer to provide a patterned growth mask layer with clusters of openings therein. If a patterned hard mask layer is employed, the patterned hard mask can prevent transfer of the pattern in the area covered by the patterned hard mask layer. Semiconductor material portions, such as nanowires can be formed in a cluster configuration through the clusters of openings in the patterned growth mask layer. Alignment marks can be formed concurrently with formation of semiconductor material portions by employing nano-imprint lithography.

A method for fabrication of an InGaN semiconductor template, comprising growing an InGaN pyramid having inclined facets on a semiconductor substrate; processing the pyramid by removing semiconductor material to form a truncated pyramid having a first upper surface; growing InGaN, over the first upper surface, to form an InGaN template layer having a c-plane crystal facet forming a top surface. The InGaN semiconductor template is suitable for further fabrication of semiconductor devices, such as microLEDs configured to emit red, green or blue light.

According to an embodiment of the present invention, a removal module using an electric field and a magnetic field so as to self-assemble, on cells arranged in a matrix form of an assembly substrate, semiconductor light-emitting elements introduced in a fluid accommodated in a chamber, and then remove a semiconductor light-emitting element mis-assembled with the assembly substrate comprises: a fluid supply unit for supplying the fluid; and a housing of which one side is connected to the fluid supply unit, an upper plate is adjacent to the assembly substrate, and a lower plate is adjacent to the chamber, wherein the upper plate has: a nozzle hole allowing communication between the inner space of the housing and the inner space of the chamber so that the fluid supplied from the fluid supply unit is injected at a site in which the semiconductor light-emitting element is mis-assembled on the assembly substrate; and one pair of partition parts facing each other with the nozzle hole as the center thereof.

An image display device manufacturing method includes: providing a first substrate that includes: a circuit including a circuit element formed on a light-transmitting substrate, and a first insulating film covering the circuit; forming, on the first insulating film, a layer including graphene; forming, on the layer v graphene, a semiconductor layer including a light-emitting layer; etching the semiconductor layer to form a light-emitting element; forming a second insulating film covering the layer including graphene, the light-emitting element, and the first insulating film; forming a via passing through the first insulating film and the second insulating film; and electrically connecting the light-emitting element and the circuit element through the via at a light-emitting surface facing a surface of the light-emitting element on a first insulating film side.

A method for producing at least one nitride layer includes providing a stack having a plurality of pillars extending from a substrate of the stack. Each pillar includes at least a crystalline section and a summit having a summit surface area The method also includes growing by epitaxy a crystallite from the summit of some the plurality of pillars and continuing the epitaxial growth of the crystallites until the crystallites supported by the pillars coalesce. The plurality of pillars includes at least one retention pillar and separation pillars. The pillars are configured so that once the nitride layer is formed, the at least one retention pillar retains the nitride layer and some of the separation pillars can fracture.

An image display device manufacturing method includes: providing a first substrate that includes: a circuit including a circuit element formed on a light-transmitting substrate, and a first insulating film covering the circuit; forming, on the first insulating film, a conductive layer including a portion made of a single crystal metal; forming, on the portion made of the single crystal metal, a semiconductor layer including a light-emitting layer; etching the semiconductor layer to form a light-emitting element; forming a second insulating film covering the conductive layer, the light-emitting element, and the first insulating film; forming a via passing through the first insulating film and the second insulating film; and electrically connecting the light-emitting element and the circuit element through the via at a light-emitting surface facing a surface of the light-emitting element on a first insulating film side.

A light emitting diode (LED) including an epitaxial stacked layer, first and second reflective layers which are disposed at two sides of the epitaxial stacked layer, a current conducting layer and first and second electrodes and a manufacturing thereof are provided. The epitaxial stacked layer includes a first-type and a second-type semiconductor layers and an active layer. A main light emitting surface with a light transmittance >0% and ≤10% is formed on one of the two reflective layers. The current conducting layer contacts the second-type semiconductor layer. The first electrode is electrically connected to the first-type semiconductor layer. The second electrode is electrically connected to the second-type semiconductor layer via the current conducting layer. A contact scope of the current conducting layer and the second-type semiconductor layer is served as a light-emitting scope overlapping the two layers, but not overlapping the two electrodes.

A light emitting element comprises: a semiconductor layered body including a first semiconductor layer of a first conductivity type, a second semiconductor layer of a second conductivity type, and a light emitting layer provided between the first semiconductor layer and the second semiconductor layer; and a dielectric member being in contact with the first semiconductor layer. The first semiconductor layer refractive index with respect to a wavelength of light differs from the light emitting layer refractive index with respect to the wavelength of light. The dielectric member comprises a first dielectric portion and a second dielectric portion. In a second direction that is perpendicular to a first direction that extends from the second semiconductor layer to the first semiconductor layer, a first portion of the first semiconductor layer is positioned between the first dielectric portion and the second dielectric portion. The first dielectric portion comprises the first surface and the second surface. In the first direction, the first surface is positioned between the second surface and the first semiconductor layer. The first surface is inclined relative to the first direction.

The present disclosure provides a semiconductor structure and substrate thereof, and manufacturing methods for semiconductor structure and substrate thereof. In the method for manufacturing the substrate, at least one of groove is provided in each subunit region on a surface of a premanufactured substrate, and the premanufactured substrate includes at least one unit region, each of the at least one unit region includes at least two subunit regions, the at least one of groove is filled with heat conduction materials to form a substrate; in one of the at least one unit region, the at least two subunit regions respectively have different heat conduction coefficients.