The present invention involves a LED flip chip, its fabrication method and a display panel containing the LED flip chip. The LED flip chip comprises a first semiconductor layer, a second semiconductor layer, an active layer configured between the first and second semiconductor layers, a first electrode and a second electrode. At least one of the first and second electrodes includes at least two sub-electrodes.

A semiconductor light-emitting element includes a p-side pad opening provided on a p-side contact electrode and an n-side pad opening provided on an n-side contact electrode, covers side surfaces of an n-type semiconductor layer, an active layer, and a p-type semiconductor layer, covers the p-side contact electrode in a portion different from the p-side pad opening, and covers the n-side contact electrode in a portion different from the n-side pad opening. The protective layer includes a first dielectric layer made of SiO.sub.2, a second dielectric layer made of an oxide material different from a material of the first dielectric layer and covering the first dielectric layer, and a third dielectric layer made of SiO.sub.2 and covering the second dielectric layer. A carbon concentration of the first dielectric layer is smaller than a carbon concentration of the third dielectric layer.

Described are arrays of light emitting diode (LED) devices and methods for their manufacture. An LED array comprises a first mesa comprising a top surface, at least a first LED including a first p-type layer, a first n-type layer and a first color active region and a tunnel junction on the first LED, the top surface comprising a second n-type layer on the tunnel junction. The LED array further comprises an adjacent mesa comprising a top surface, the first LED, a second LED including the second n-type layer, a second p-type layer and a second color active region. There is a first trench separating the first mesa and the adjacent mesa, n-type metallization in the first trench and in electrical contact with the first color active region and the second color active region of the adjacent mesa, and p-type metallization contacts on the n-type layer of the first mesa and on the p-type layer of the adjacent mesa.

A particle layer is positioned over a light output surface of a light emitting diode. A transparent protection layer positioned between and in contact with the light output surface and the particle layer. The particle layer comprises a multitude of optically scattering or luminescent particles and a thin coating layer of transparent material coating particles of the multitude. The particles are characterized by a D50 greater than about 1.0 μm and less than about 30. μm; the coating layer has a thickness less than about 0.20 μm. The protection layer is less than about 0.05 μm thick and includes one or more materials different from material of the coating layer. The protection and coating layers can each include one or more metal or semiconductor oxides. Oxide precursor reactivities, with respect to the corresponding light output surface, are less for protection layer material than for coating layer material.

A method for forming a light emitting diode (LED) uses aluminum-based material layers and oxidation during the LED formation. In some embodiments, the method may include forming an n-type layer of the LED on a substrate, forming at least one sidewall restriction layer of the LED on the substrate with the sidewall restriction layer comprising an aluminum-based material, forming a quantum well layer of the LED on the substrate, forming a p-type layer of the LED on the substrate, exposing the substrate to water vapor, and heating the substrate to oxidize at least an outer portion of the electron blocking layer. The aluminum-based material may include aluminum indium nitride or aluminum gallium arsenide.

Provided are a semiconductor structure and a method of manufacturing the same. The semiconductor structure includes a substrate, a membrane bridge that defines, with the substrate, a plurality of cavities, and a nitride semiconductor layer arranged on the membrane bridge. The membrane bridge and the substrate have the same crystal structure. The membrane bridge has an upper surface with a constant height with respect to a surface of the substrate.

A quantum device includes a substrate including a first material and including an upper surface thereof, a first layer comprising a compound of the first material disposed on the upper surface of the substrate, a second layer, comprising a metal oxide, disposed on the first layer, a third layer, comprising a noble metal, disposed on the second layer, a fourth layer, comprising a metal oxide, disposed on the third layer, a fifth layer, comprising a piezoelectric material, disposed on the fourth layer, a sixth layer, comprising a noble metal, disposed on the fifth layer, a seventh layer, comprising a material capable of quantum emission, disposed on the sixth layer, and an eighth layer, comprising a noble metal, disposed on the seventh layer, and at least one of the eighth layer and the seventh layer are sized to enable quantum emission from the seventh layer.

To suppress current leakage between the semiconductor layer below the mask and the buried layer above the mask. To reduce the drive voltage and improve the emission efficiency by improving the efficiency of carrier injection into the active layer. The semiconductor light-emitting device includes a substrate, a mask, a columnar semiconductor, a buried layer, a cathode electrode, and an anode electrode. The substrate has a conductive substrate, an n-type semiconductor layer disposed on the conductive substrate, and a p-type semiconductor layer disposed on the n-type semiconductor layer. The p-type semiconductor layer has a high resistance, thereby enhancing insulation between the n-type semiconductor layer and the buried layer.

A micro-light emitting diode (micro-LED) includes a mesa structure that includes an n-type semiconductor layer, a p-type semiconductor layer, and an active region between the n-type semiconductor layer and the p-type semiconductor layer. The active region includes at least one quantum well layer. The at least one quantum well layer has a first effective bandgap and a first stress in a center region of the at least one quantum well layer, and a second effective bandgap and a second stress in a mesa sidewall region of the at least one quantum well layer. The second stress is lower than the first stress or is opposite to the first stress. The second effective bandgap is greater than the first effective bandgap to form a lateral carrier barrier in the at least one quantum well layer.

An epitaxial structure, a light emitting device, and a method for epitaxial structure manufacture are provided. The epitaxial structure includes a buffer layer and a stress releasing layer that are sequentially formed on a substrate. The stress releasing layer includes a first stress releasing layer. The first stress releasing layer is made of aluminum gallium nitride (AlGaN) in which Al component accounts for 50%-90%.