A packaging structure includes a first substrate including a first metal terminal and a second metal terminal whose height is lower than the height of the first metal terminal; and a second substrate including a third metal terminal and a fourth metal terminal whose height is lower than the height of the third metal terminal, the second substrate being provided on the first substrate, the first metal terminal and the third metal terminal being directly bonded with each other, and the second metal terminal and the fourth metal terminal being bonded via a connection portion.

A packaging structure includes a first substrate including a first metal terminal and a second metal terminal whose height is lower than the height of the first metal terminal; and a second substrate including a third metal terminal and a fourth metal terminal whose height is lower than the height of the third metal terminal, the second substrate being provided on the first substrate, the first metal terminal and the third metal terminal being directly bonded with each other, and the second metal terminal and the fourth metal terminal being bonded via a connection portion.

A semiconductor device includes a first substrate, an aluminum pad, a first nickel electrode, a second substrate, a second nickel electrode, and a connection layer. The first substrate includes a wiring therein. The aluminum pad is provided adjacent to a surface layer of the first substrate and is connected to the wiring. A portion of the first nickel electrode extends inwardly of the first substrate and is connected to the aluminum pad. A top surface of the first nickel electrode projects from a surface of the first substrate. A portion of the second nickel electrode extends inwardly of the second substrate. A top surface of the second nickel electrode projects from a surface of the second substrate facing the first substrate. The connection layer comprises an alloy including tin and connects the first nickel electrode and the second nickel electrode.

A semiconductor device includes a first substrate, an aluminum pad, a first nickel electrode, a second substrate, a second nickel electrode, and a connection layer. The first substrate includes a wiring therein. The aluminum pad is provided adjacent to a surface layer of the first substrate and is connected to the wiring. A portion of the first nickel electrode extends inwardly of the first substrate and is connected to the aluminum pad. A top surface of the first nickel electrode projects from a surface of the first substrate. A portion of the second nickel electrode extends inwardly of the second substrate. A top surface of the second nickel electrode projects from a surface of the second substrate facing the first substrate. The connection layer comprises an alloy including tin and connects the first nickel electrode and the second nickel electrode.

3D joining of microelectronic components and a conductively self-adjusting anisotropic matrix are provided. In an implementation, an adhesive matrix automatically makes electrical connections between two surfaces that have electrical contacts, and bonds the two surfaces together. Conductive members in the adhesive matrix are aligned to automatically establish electrical connections between at least partially aligned contacts on each of the two surfaces while providing nonconductive adhesion between parts of the two surfaces lacking aligned contacts. An example method includes forming an adhesive matrix between two surfaces to be joined, including conductive members anisotropically aligned in an adhesive medium, then pressing the two surfaces together to automatically connect corresponding electrical contacts that are at least partially aligned on the two surfaces. The adhesive medium in the matrix secures the two surfaces together.

3D joining of microelectronic components and a conductively self-adjusting anisotropic matrix are provided. In an implementation, an adhesive matrix automatically makes electrical connections between two surfaces that have electrical contacts, and bonds the two surfaces together. Conductive members in the adhesive matrix are aligned to automatically establish electrical connections between at least partially aligned contacts on each of the two surfaces while providing nonconductive adhesion between parts of the two surfaces lacking aligned contacts. An example method includes forming an adhesive matrix between two surfaces to be joined, including conductive members anisotropically aligned in an adhesive medium, then pressing the two surfaces together to automatically connect corresponding electrical contacts that are at least partially aligned on the two surfaces. The adhesive medium in the matrix secures the two surfaces together.

A method for forming a micro bump includes the following operations. A chip at least including a silicon substrate and a Through Silicon Via (TSV) penetrating through the silicon substrate is provided. A conductive layer having a first preset size in a first direction is formed in the TSV, the first direction being a thickness direction of the silicon substrate. A connecting layer having a second preset size in the first direction is formed on a surface of the conductive layer in the TSV, where a sum of the first preset size and the second preset size is equal to an initial size of the TSV in the first direction. The silicon substrate is processed to expose the connecting layer, for forming a micro bump corresponding to the TSV.

A semiconductor structure includes a wafer having a wafer outer surface; a semiconductor chip; and a plurality of copper pillars on the semiconductor chip. The pillars have curved end portions and pillar outside surfaces. Also included are a plurality of copper pads on the wafer. The pads have end portions aligned with the curved end portions of the plurality of copper pillars on the semiconductor chip, and the curved end portions of the plurality of copper pillars and the end portions of the plurality of copper pads define a plurality of bonding material receiving regions. The pads have pad outside surfaces. A copper bonding layer is on the pillar outside surfaces, the pad outside surfaces, the bonding material receiving regions, and portions of the outer surface of the wafer. The portions have an annular shape about the copper pads when viewed in plan.

A lead frame adapted to be applied to a quad flat no-lead (QFN) package structure is provided. The QFN package structure includes a die. Bumps are disposed on an active surface of the die. The lead frame includes a central region and a peripheral region surrounding the central region. The lead frame includes a plurality of leads. The leads are at the peripheral region. A solder pad is disposed on an upper surface of one of two ends of each of the leads. The solder pad of each of the leads is configured to be directly soldered to a corresponding one of the bumps on the active surface of the die. For each of the leads, the end having the solder pad is nearer to the central region of the lead frame with respect to the other end. A manufacturing method of semiconductor device is also provided.

A packaging structure includes a first substrate including a first metal terminal and a first protruding resin portion formed at a first surface; a second substrate including a second metal terminal and a second protruding resin portion formed at a second surface, the second metal terminal being made of the same kind of metal as the first metal terminal; and a sealing portion filled between the first surface of the first substrate and the second surface of the second substrate, the first metal terminal and the second metal terminal being directly bonded with each other, the first protruding resin portion and the second protruding resin portion being directly bonded with each other, each of the first protruding resin portion and the second protruding resin portion being made of a resin material that does not include fillers, and the sealing portion being made of a resin material including fillers.