H01L2224/48

Bonded three-dimensional memory devices and methods of making the same by replacing carrier substrate with source layer

A three-dimensional memory device includes an alternating stack of insulating layers and electrically conductive layers located over a carrier substrate. Memory stack structures vertically extend through the alternating stack. Each memory stack structure includes a respective vertical semiconductor channel and a respective memory film. A pass-through via structure vertically extends through a dielectric material portion that is adjacent to the alternating stack. The memory die can be bonded to a logic die containing peripheral circuitry for supporting operations of memory cells within the memory die. A distal end of each of the vertical semiconductor channels is physically exposed by removing the carrier substrate. A source layer is formed directly on the distal end each of the vertical semiconductor channels. A backside bonding pad or bonding wire is formed to be electrically connected to the pass-through via structure.

STACKING STRUCTURE, PACKAGE STRUCTURE AND METHOD OF FABRICATING THE SAME

A package structure includes a plurality of stacked die units and an insulating encapsulant. The plurality of stacked die units is stacked on top of one another, where each of the plurality of stacked die units include a first semiconductor die, a first bonding chip. The first semiconductor die has a plurality of first bonding pads. The first bonding chip is stacked on the first semiconductor die and has a plurality of first bonding structure. The plurality of first bonding structures is bonded to the plurality of first bonding pads through hybrid bonding. The insulating encapsulant is encapsulating the plurality of stacked die units.

STACKING STRUCTURE, PACKAGE STRUCTURE AND METHOD OF FABRICATING THE SAME

A package structure includes a plurality of stacked die units and an insulating encapsulant. The plurality of stacked die units is stacked on top of one another, where each of the plurality of stacked die units include a first semiconductor die, a first bonding chip. The first semiconductor die has a plurality of first bonding pads. The first bonding chip is stacked on the first semiconductor die and has a plurality of first bonding structure. The plurality of first bonding structures is bonded to the plurality of first bonding pads through hybrid bonding. The insulating encapsulant is encapsulating the plurality of stacked die units.

PEAK POWER CONTROL IN AN INTEGRATED MEMORY ASSEMBLY

Power regulation in an integrated memory assembly having control semiconductor dies and memory semiconductor is disclosed herein. A master control die regulates power usage by the integrated memory assembly. Each control die reports information about its expected power usage to the master control die. The master control die determines a plan that meets a power criterion for the integrated memory assembly. The plan may maximize the power usage in each time period, while staying within a power budget. The plan can include selecting which of the memory dies perform a memory operation (or phase of a memory operation) during a given time period. The master control die may send a die scheduling plan to each of the other control dies. Each die scheduling plan indicates when memory operations and/or phases of memory operations are to be performed.

PEAK POWER CONTROL IN AN INTEGRATED MEMORY ASSEMBLY

Power regulation in an integrated memory assembly having control semiconductor dies and memory semiconductor is disclosed herein. A master control die regulates power usage by the integrated memory assembly. Each control die reports information about its expected power usage to the master control die. The master control die determines a plan that meets a power criterion for the integrated memory assembly. The plan may maximize the power usage in each time period, while staying within a power budget. The plan can include selecting which of the memory dies perform a memory operation (or phase of a memory operation) during a given time period. The master control die may send a die scheduling plan to each of the other control dies. Each die scheduling plan indicates when memory operations and/or phases of memory operations are to be performed.

Bonded three-dimensional memory devices and methods of making the same by replacing carrier substrate with source layer

A three-dimensional memory device may include an alternating stack of insulating layers and spacer material layers formed over a carrier substrate. The spacer material layers are formed as, or are subsequently replaced with, electrically conductive layers. Memory stack structures are formed through the alternating stack. Each memory stack structure includes a respective vertical semiconductor channel and a respective memory film. Drain regions and bit lines can be formed over the memory stack structures to provide a memory die. The memory die can be bonded to a logic die containing peripheral circuitry for supporting operations of memory cells within the memory die. A distal end of each of the vertical semiconductor channels is physically exposed by removing the carrier substrate. A source layer is formed directly on the distal end each of the vertical semiconductor channels. A bonding pad can be formed on the source layer.

Bonded three-dimensional memory devices and methods of making the same by replacing carrier substrate with source layer

A three-dimensional memory device may include an alternating stack of insulating layers and spacer material layers formed over a carrier substrate. The spacer material layers are formed as, or are subsequently replaced with, electrically conductive layers. Memory stack structures are formed through the alternating stack. Each memory stack structure includes a respective vertical semiconductor channel and a respective memory film. Drain regions and bit lines can be formed over the memory stack structures to provide a memory die. The memory die can be bonded to a logic die containing peripheral circuitry for supporting operations of memory cells within the memory die. A distal end of each of the vertical semiconductor channels is physically exposed by removing the carrier substrate. A source layer is formed directly on the distal end each of the vertical semiconductor channels. A bonding pad can be formed on the source layer.

Bonded three-dimensional memory devices and methods of making the same by replacing carrier substrate with source layer

A three-dimensional memory device includes an alternating stack of insulating layers and electrically conductive layers located over a carrier substrate. Memory stack structures vertically extend through the alternating stack. Each memory stack structure includes a respective vertical semiconductor channel and a respective memory film. A pass-through via structure vertically extends through a dielectric material portion that is adjacent to the alternating stack. The memory die can be bonded to a logic die containing peripheral circuitry for supporting operations of memory cells within the memory die. A distal end of each of the vertical semiconductor channels is physically exposed by removing the carrier substrate. A source layer is formed directly on the distal end each of the vertical semiconductor channels. A backside bonding pad or bonding wire is formed to be electrically connected to the pass-through via structure.

Bonded three-dimensional memory devices and methods of making the same by replacing carrier substrate with source layer

A three-dimensional memory device includes an alternating stack of insulating layers and electrically conductive layers located over a carrier substrate. Memory stack structures vertically extend through the alternating stack. Each memory stack structure includes a respective vertical semiconductor channel and a respective memory film. A pass-through via structure vertically extends through a dielectric material portion that is adjacent to the alternating stack. The memory die can be bonded to a logic die containing peripheral circuitry for supporting operations of memory cells within the memory die. A distal end of each of the vertical semiconductor channels is physically exposed by removing the carrier substrate. A source layer is formed directly on the distal end each of the vertical semiconductor channels. A backside bonding pad or bonding wire is formed to be electrically connected to the pass-through via structure.

STACKED DIE ASSEMBLY INCLUDING DOUBLE-SIDED INTER-DIE BONDING CONNECTIONS AND METHODS OF FORMING THE SAME

Multiple bonded units are provided, each of which includes a respective front-side die and a backside die. The two dies in each bonded unit may be a memory die and a logic die configured to control operation of memory elements in the memory die. Alternatively, the two dies may be memory dies. The multiple bonded units can be attached such that front-side external bonding pads have physically exposed surfaces that face upward and backside external bonding pads of each bonded unit have physically exposed surfaces that face downward. A first set of bonding wires can connect a respective pair of front-side external bonding pads, and a second set of bonding wires can connect a respective pair of backside external bonding pads.