Patent classifications
H01L2224/48
Semiconductor packages with pass-through clock traces and associated systems and methods
Semiconductor packages with pass-through clock traces and associated devices, systems, and methods are disclosed herein. In one embodiment, a semiconductor device includes a package substrate including a first surface having a plurality of substrate contacts, a first semiconductor die having a lower surface attached to the first surface of the package substrate, and a second semiconductor die stacked on top of the first semiconductor die. The first semiconductor die includes an upper surface including a first conductive contact, and the second semiconductor die includes a second conductive contact. A first electrical connector electrically couples a first one of the plurality of substrate contacts to the first and second conductive contacts, and a second electrical connector electrically couples a second one of the plurality of substrate contacts to the first and second conductive contacts.
Protective elements for bonded structures including an obstructive element
A bonded structure is disclosed. The bonded structure can include a semiconductor element comprising active circuitry and a first bonding layer. The bonded structure can include a protective element directly bonded to the semiconductor element without an adhesive along a bonding interface. The protective element can include an obstructive material disposed over the active circuitry and a second bonding layer on the obstructive material. The second bonding layer can be directly bonded to the first bonding layer without an adhesive. The obstructive material can be configured to obstruct external access to the active circuitry.
Protective elements for bonded structures including an obstructive element
A bonded structure is disclosed. The bonded structure can include a semiconductor element comprising active circuitry and a first bonding layer. The bonded structure can include a protective element directly bonded to the semiconductor element without an adhesive along a bonding interface. The protective element can include an obstructive material disposed over the active circuitry and a second bonding layer on the obstructive material. The second bonding layer can be directly bonded to the first bonding layer without an adhesive. The obstructive material can be configured to obstruct external access to the active circuitry.
SEMICONDUCTOR DEVICE INCLUDING SUPPORT STRUCTURE, METHOD FOR MANUFACTURING THE SAME AND ELECTRONIC SYSTEM INCLUDING THE SAME
A semiconductor device of the disclosure includes a peripheral circuit structure including a peripheral transistor, a semiconductor layer on the peripheral circuit structure, a source structure on the semiconductor layer, a gate stack structure disposed on the source structure and including insulating patterns and conductive patterns alternately stacked, a memory channel structure electrically connected to the source structure and penetrating the gate stack structure, a support structure penetrating the gate stack structure and the source structure, and an insulating layer covering the gate stack structure, the memory channel structure and the support structure. The support structure includes an outer support layer contacting side walls of the insulating patterns and side walls of the conductive patterns, and a support pattern and an inner support layer contacting an inner side wall of the outer support layer.
SEMICONDUCTOR DEVICE INCLUDING SUPPORT STRUCTURE, METHOD FOR MANUFACTURING THE SAME AND ELECTRONIC SYSTEM INCLUDING THE SAME
A semiconductor device of the disclosure includes a peripheral circuit structure including a peripheral transistor, a semiconductor layer on the peripheral circuit structure, a source structure on the semiconductor layer, a gate stack structure disposed on the source structure and including insulating patterns and conductive patterns alternately stacked, a memory channel structure electrically connected to the source structure and penetrating the gate stack structure, a support structure penetrating the gate stack structure and the source structure, and an insulating layer covering the gate stack structure, the memory channel structure and the support structure. The support structure includes an outer support layer contacting side walls of the insulating patterns and side walls of the conductive patterns, and a support pattern and an inner support layer contacting an inner side wall of the outer support layer.
SEMICONDUCTOR SYSTEM AND WIRING DEFECT DETECTING METHOD
A semiconductor system includes a first semiconductor chip, a second semiconductor chip stacked above the first semiconductor chip, a controller configured to control the first and second semiconductor chips, a first wiring connected between the controller and each of the first and second semiconductor chips and by which a first signal is to be transmitted from the controller to each of the first and second semiconductor chips, a second wiring connected between the controller and the first semiconductor chip and by which a current of the first signal flowing through the first wiring to the first semiconductor chip is to be returned to the controller, and a third wiring connected between the controller and the second semiconductor chip and by which a current of the first signal flowing through the first wiring to the second semiconductor chip is to be returned to the controller.
SEMICONDUCTOR PACKAGE AND METHOD OF FABRICATING THE SAME
Disclosed are semiconductor packages and/or methods of fabricating the same. The semiconductor package comprises a substrate, a semiconductor chip on the substrate, and a molding layer. The semiconductor chip includes a circuit region and an edge region around the circuit region. The molding layer covers a sidewall of the semiconductor chip. The semiconductor chip includes a reforming layer on the edge region. A top surface of the reforming layer is coplanar with a top surface of the molding layer.
SEMICONDUCTOR PACKAGE AND METHOD OF FABRICATING THE SAME
Disclosed are semiconductor packages and/or methods of fabricating the same. The semiconductor package comprises a substrate, a semiconductor chip on the substrate, and a molding layer. The semiconductor chip includes a circuit region and an edge region around the circuit region. The molding layer covers a sidewall of the semiconductor chip. The semiconductor chip includes a reforming layer on the edge region. A top surface of the reforming layer is coplanar with a top surface of the molding layer.
SEMICONDUCTOR PACKAGES
A semiconductor package is configured to include a package substrate, a semiconductor chip disposed on the package substrate, and bonding wires. The package substrate includes a first column of bond fingers disposed in a first layer and a second column of bond fingers disposed in a second layer. The semiconductor chip includes a first column of chip pads arrayed in a first column and a second column of chip pads arrayed in a second column adjacent to the first column. The first column of chip pads are connected to the first column of bond fingers, respectively, through first bonding wires, and the second column of chip pads are connected to the second column of bond fingers, respectively, through second bonding wires.
Dynamic sense node voltage to compensate for variances when sensing threshold voltages of memory cells
Technology for sensing non-volatile memory cells in which one or more sense nodes are charged to a sense voltage having a magnitude that improves sensing accuracy. One sense node may be charged to different sense voltages when sensing different memory cells at different times. Multiple sense nodes may be charged to a corresponding multiple different sense voltages when sensing different memory cells at the same time. The one or more sense nodes are allowed to discharge based on respective currents of memory cells for a pre-determined time while applying a reference voltage to the memory cells. The Vts of the selected memory cells are assessed based on respective voltages on the one or more of sense nodes after the pre-determined time. Different sensing voltages may be used based on bit line voltage, bit line resistance, distance of memory cells from the sense node, or other factors.