An electronic package and a method for manufacturing is provided, having first and opposing second surfaces, and a circuit thereon, each of the first and second surfaces has a terminal connected to the circuit; a conductive element spaced apart from the die with top and a bottom surfaces; a body of molding compound encapsulating the die and the element, the body having a top side facing the first surface and a bottom side facing the second surface; a first package terminal at the top side connected to the terminal at the first surface, and a second package terminal at the top side connected to the top surface of the conductive element, the conductive element is formed from the first package terminal and the second package terminal; and a conductive layer connecting the bottom surface of the conductive element to the terminal arranged on the second surface of the die.

In an embodiment, a method includes forming a conductive feature adjacent to a substrate; treating the conductive feature with a protective material, the protective material comprising an inorganic core with an organic coating around the inorganic core, the treating the conductive feature comprising forming a protective layer over the conductive feature; and forming an encapsulant around the conductive feature and the protective layer. In another embodiment, the method further includes, before forming the encapsulant, rinsing the protective layer with water. In another embodiment, the protective layer is selectively formed over the conductive feature.

Forming a 3DIC includes providing a lower device structure comprising a first substrate with a circuit layer, providing an interconnect network layer having an interconnect structure with a first coupled to a second plurality of electrodes by connection structures on a semiconductor substrate, the first plurality of electrodes being exposed on a first surface of the interconnect layer, implanting ions through the interconnect structure to form a cleave plane in the semiconductor substrate, bonding the interconnect structure to the lower device structure so that electrodes of the first plurality of electrodes are coupled to corresponding electrodes on the lower device structure, cleaving the substrate of the bonded interconnect layer at the cleave plane, removing material from the semiconductor substrate until the second plurality of electrodes is exposed, and bonding an upper device layer to the interconnect structure.

Embodiments include semiconductor packages and methods to form the semiconductor packages. A semiconductor package includes a bridge over a glass patch. The bridge is coupled to the glass patch with an adhesive layer. The semiconductor package also includes a high-density packaging (HDP) substrate over the bridge and the glass patch. The HDP substrate is conductively coupled to the glass patch with a plurality of through mold vias (TMVs). The semiconductor package further includes a plurality of dies over the HDP substrate, and a first encapsulation layer over the TMVs, the bridge, the adhesive layer, and the glass patch. The HDP substrate includes a plurality of conductive interconnects that conductively couple the dies to the bridge and glass patch. The bridge may be an embedded multi-die interconnect bridge (EMIB), where the EMIB is communicatively coupled to the dies, and the glass patch includes a plurality of through glass vias (TGVs).

A semiconductor package is provided. The semiconductor package may include a first semiconductor die, a second semiconductor die stacked on the first semiconductor die, the second semiconductor die having a width smaller than a width of the first semiconductor die, a third semiconductor die stacked on the second semiconductor die, the third semiconductor die having a width smaller than the width of the first semiconductor die, and a mold layer covering side surfaces of the second and third semiconductor dies and a top surface of the first semiconductor die. The second semiconductor die may include a second through via, and the third semiconductor die may include a third conductive pad in contact with the second through via.

An IC chip includes I/O bumps on a back side, a first die, a second die, a first circuit, and a second circuit. The first die has driver circuits for LED devices, the LED devices being located on a front-facing surface of the first die. The first circuit extends from the front side toward the back side and across a thickness of the first die. The first circuit provides electrical connections between the LED devices and at least some of the I/O bumps. The first die and the second die can be stacked vertically or arranged laterally adjacent. The second circuit extends between the first die and the second die to electrically connect the first die and the second die. A circuit board can be electrically connected to the IC chip through the I/O bumps to, among other things, provide power to the various components of the IC chip.

Disclosed are semiconductor packages and their fabricating methods. The method includes preparing a semiconductor chip with a pillar pattern on a bottom surface thereof, placing the semiconductor chip side by side with a connection substrate with a conductive pad on a bottom surface thereof, forming a molding layer on the bottom surfaces of the connection substrate and the semiconductor chip to cover the pillar pattern and the conductive pad, forming a first redistribution substrate on top surfaces of the connection substrate, the semiconductor chip, and the molding layer and directly in physical contact with the top surface of the semiconductor chip, and performing a grinding process on a bottom surface of the molding layer to expose the pillar pattern and the conductive pad. An outer sidewall of the connection substrate is vertically aligned with that of the first redistribution substrate.

Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic assembly may include a package substrate including a first conductive pathway electrically coupled to a power source; a mold material on the package substrate including a first microelectronic component embedded in the mold material, a second microelectronic component embedded in the mold material, and a TMV, between the first and second microelectronic components, the TMV electrically coupled to the first conductive pathway; a redistribution layer (RDL) on the mold material including a second conductive pathway electrically coupled to the TMV; and a third microelectronic component on the RDL and electrically coupled to the second conductive pathway, wherein the second conductive pathway electrically couples the TMV, the first microelectronic component, and the third microelectronic component.

A semiconductor package including a semiconductor chip, a redistribution layer structure disposed under the semiconductor chip, a bump pad disposed under the redistribution layer structure and having an upper structure of a first width and a lower structure of a second width less than the first width, a metal seed layer disposed along a lower surface of the upper structure and a side surface of the lower structure, an insulating layer surrounding the redistribution layer structure and the bump pad, and a bump structure disposed under the bump pad. A first undercut is disposed at one end of the metal seed layer that contacts the upper structure, and a second undercut is disposed at an other end of the metal seed layer that contacts the lower structure.

A microelectronic assembly is provided, comprising: a first integrated circuit (IC) die at a first level, a second IC die at a second level, and a third IC die at a third level, the second level being in between the first level and the third level. A first interface between the first level and the second level is electrically coupled with high-density interconnects of a first pitch and a second interface between the second level and the third level is electrically coupled with interconnects of a second pitch. In some embodiments, at least one of the first IC die, second IC die, and third IC die comprises another microelectronic assembly. In other embodiments, at least one of the first IC die, second IC die, and third IC die comprises a semiconductor die.