Provided are a flip connection structure, a room-temperature flip connection structure, and a connection method therefor, in which there is no risk of deterioration of a substrate or a semiconductor chip due to heat. Provided is a flip-chip connection structure in which semiconductors are connected using a flip chip structure of chip on chip. Each of terminals that connects the semiconductors is formed by aluminum (Al), and the terminals constitute a joined body integrally joined to each other by ultrasonic vibration involving pressurization.

A method of manufacturing a multi-layer wafer is provided. The method comprises applying at least one stress compensating polymer layer to at least one of two heterogeneous wafers and low temperature bonding the two heterogeneous wafers to bond the stress compensating polymer layer to the other of the two heterogeneous wafers to form a multi-layer wafer pair. The multi-layer wafer comprises two heterogeneous wafers, at least one of the heterogeneous wafers having a stress compensating polymer layer. The two heterogeneous wafers are low temperature bonded together to bond the stress compensating polymer layer to the other of the two heterogeneous wafers.

A semiconductor device includes a wiring substrate, a semiconductor element mounted on the wiring substrate, a heat dissipating plate arranged above the semiconductor element, and an encapsulation resin that encapsulates the semiconductor element and fills a space between the wiring substrate and the heat dissipating plate and a space between the semiconductor element and the heat dissipating plate. The heat dissipating plate includes a main body arranged overlapping the semiconductor element in plan view, and a lead projecting outward from the main body. The lead is thinner than the main body. The lead includes an upper surface covered by the encapsulation resin, and an outer side surface located at an outer edge of the semiconductor device and exposed from an outer side surface of the encapsulation resin. The main body includes an upper surface exposed from an outer surface of the encapsulation resin.

A method of bonding a die comprising solder bumps to a substrate comprising bond pads, the method comprising the steps of heating the die from a first temperature to a second temperature, wherein the first temperature is below the melting point of the solder bumps, and the second temperature is above the melting point of the solder bumps; moving the die relative to the substrate to a first height, whereat the solder bumps contact the bond pads; moving the die further away from the substrate to a second height, while maintaining contact between the solder bumps and bond pads; and thereafter cooling the die from the second temperature to a third temperature to allow the solder bumps to solidify so as to bond the die to the substrate.

A method of bonding a die comprising solder bumps to a substrate comprising bond pads, the method comprising the steps of heating the die from a first temperature to a second temperature, wherein the first temperature is below the melting point of the solder bumps, and the second temperature is above the melting point of the solder bumps; moving the die relative to the substrate to a first height, whereat the solder bumps contact the bond pads; moving the die further away from the substrate to a second height, while maintaining contact between the solder bumps and bond pads; and thereafter cooling the die from the second temperature to a third temperature to allow the solder bumps to solidify so as to bond the die to the substrate.

A solder reflow apparatus includes a vapor generating chamber configured to accommodate a heat transfer fluid and to accommodate saturated vapor generated by heating the heat transfer fluid; a heater configured to heat the heat transfer fluid accommodated in the vapor generating chamber; a substrate stage configured to be movable upward and downward within the vapor generating chamber, the substrate stage including a seating surface; vapor passages penetrating the substrate stage and configured to allow the vapor to move therethrough; and suction passages penetrating the substrate stage to be open to the seating surface and in which at least a partial vacuum is generated.

A multi-layer wafer and method of manufacturing such wafer are provided. The method comprises applying at least one stress compensating polymer layer to at least one of two heterogeneous wafers and low temperature bonding the two heterogeneous wafers to bond the stress compensating polymer layer to the other of the two heterogeneous wafers to form a multi-layer wafer pair. The multi-layer wafer comprises two heterogeneous wafers, at least one of the heterogeneous wafers having a stress compensating polymer layer. The two heterogeneous wafers are low temperature bonded together to bond the stress compensating polymer layer to the other of the two heterogeneous wafers.

A method of manufacturing an electronic device includes: providing a vapor generating chamber that accommodates a heat transfer fluid; providing a substrate stage within the vapor generating chamber, the substrate stage including a seating surface and suction passages penetrating the substrate stage to be open to the seating surface; loading a substrate on the substrate stage, wherein electronic components are disposed on the substrate via bumps; generating at least a partial vacuum in the suction holes to suction-support the substrate on the seating surface; heating the heat transfer fluid to generate saturated vapor within the vapor generating chamber; and soldering the bumps using the saturated vapor.

The present disclosure provides methods to integrate piezoelectric micromachined ultrasonic transducer (pMUT) arrays with an application-specific integrated circuit (ASIC) using thermocompression or eutectic/solder bonding. In an aspect, the present disclosure provides a device comprising a first substrate and a second substrate, the first substrate comprising a pMUT array and the second substrate comprising an electrical circuit, wherein the first substrate and the second substrate are bonded together using thermocompression, wherein any set of individual PMUTs of PMUT array is addressable. In another aspect, the present disclosure provides a device comprising a first substrate and a second substrate, the first substrate comprising a pMUT array and the second substrate comprising an electrical circuit, wherein the first substrate and the second substrate are bonded together using eutectic or solder bonding, wherein any set of individual PMUTs of the PMUT array is addressable.

Methods, systems, and devices for top die back-side marking for memory systems are described. One or more alignment marks may be added to the back-side of a top memory die in a multi-layer memory device and used to align a position of the top memory die relative to a position of a memory die below the top memory die. The alignment marks may be formed on the top memory die during the manufacturing process of the multi-layer memory device. Operations for forming the alignment marks are described using various semiconductor fabrication techniques. Operations are also disclosed for using the alignment marks to modify placement of the top memory die to reduce the alignment offset in the manufacturing process of subsequent memory dies.