Various embodiments include a method for producing a least one conductive track comprising: forming a surface with a thermoplastic; and depositing conductive track material on the surface by thermal spraying.

A light-emitting apparatus includes a substrate, pads disposed on the substrate, a sacrificial pattern layer and a light-emitting diode element disposed on the sacrificial pattern layer. The light-emitting diode element includes a first type semiconductor layer, a second type semiconductor layer, an active layer, and electrodes. A connection patterns disposed on at least one of the electrodes and the pads. Materials of the connection patterns include hot fluidity conductive materials. The connection patterns cover an outermost sidewall of the sacrificial pattern layer and are electrically connected to the at least one of the electrodes and the pads. The sacrificial pattern layer is located between the connection patterns, and the sacrificial pattern layer is overlapped with the pads in a normal direction of the substrate.

A light-emitting apparatus includes a substrate, pads disposed on the substrate, a sacrificial pattern layer and a light-emitting diode element disposed on the sacrificial pattern layer. The light-emitting diode element includes a first type semiconductor layer, a second type semiconductor layer, an active layer, and electrodes. A connection patterns disposed on at least one of the electrodes and the pads. Materials of the connection patterns include hot fluidity conductive materials. The connection patterns cover an outermost sidewall of the sacrificial pattern layer and are electrically connected to the at least one of the electrodes and the pads. The sacrificial pattern layer is located between the connection patterns, and the sacrificial pattern layer is overlapped with the pads in a normal direction of the substrate.

An image pickup apparatus includes: an image pickup member having a first surface and a second surface, an external electrode being disposed on the second surface; a terminal where a core wire terminal is disposed on a first upper surface and a core wire electrode is disposed on a lower surface; a wiring layer including an insulation layer and a wiring, the wiring being in contact with the external electrode and the core wire electrode, a third surface being in contact with the second surface and the lower surface; a resin layer disposed on the third surface, an outer dimension of the resin layer being equal to an outer dimension of the wiring layer, the resin layer fixing the image pickup member and the terminal; and an electric cable including a core wire bonded to the core wire terminal.

In an embodiment, a device includes: a bottom integrated circuit die having a first front side and a first back side; a top integrated circuit die having a second front side and a second back side, the second back side being bonded to the first front side, the top integrated circuit die being free from through substrate vias (TSVs); a dielectric layer surrounding the top integrated circuit die, the dielectric layer being disposed on the first front side, the dielectric layer and the bottom integrated circuit die being laterally coterminous; and a through via extending through the dielectric layer, the through via being electrically coupled to the bottom integrated circuit die, surfaces of the through via, the dielectric layer, and the top integrated circuit die being planar.

In an embodiment, a device includes: a bottom integrated circuit die having a first front side and a first back side; a top integrated circuit die having a second front side and a second back side, the second back side being bonded to the first front side, the top integrated circuit die being free from through substrate vias (TSVs); a dielectric layer surrounding the top integrated circuit die, the dielectric layer being disposed on the first front side, the dielectric layer and the bottom integrated circuit die being laterally coterminous; and a through via extending through the dielectric layer, the through via being electrically coupled to the bottom integrated circuit die, surfaces of the through via, the dielectric layer, and the top integrated circuit die being planar.

A package structure includes a thermal dissipation structure, a first encapsulant, a die, a through integrated fan-out via (TIV), a second encapsulant, and a redistribution layer (RDL) structure. The thermal dissipation structure includes a substrate and a first conductive pad disposed over the substrate. The first encapsulant laterally encapsulates the thermal dissipation structure. The die is disposed on the thermal dissipation structure. The TIV lands on the first conductive pad of the thermal dissipation structure and is laterally aside the die. The second encapsulant laterally encapsulates the die and the TIV. The RDL structure is disposed on the die and the second encapsulant.

A package structure includes a thermal dissipation structure, a first encapsulant, a die, a through integrated fan-out via (TIV), a second encapsulant, and a redistribution layer (RDL) structure. The thermal dissipation structure includes a substrate and a first conductive pad disposed over the substrate. The first encapsulant laterally encapsulates the thermal dissipation structure. The die is disposed on the thermal dissipation structure. The TIV lands on the first conductive pad of the thermal dissipation structure and is laterally aside the die. The second encapsulant laterally encapsulates the die and the TIV. The RDL structure is disposed on the die and the second encapsulant.

At least one redistribution layer (RDL) is provided on a silicon die. A passivation layer is deposited on the RDL. First openings having a first diameter are etched in the passivation layer where copper posts are to be formed. A seed layer is deposited over the passivation layer and within the openings. A photoresist layer is coated on the seed layer and patterned to form second openings having a second diameter over the first openings larger than the first diameter. Copper is plated on the seed layer to form copper posts filling the second openings. The silicon die is die attached to a metal substrate. A lamination layer is coated over the silicon die and the copper posts. Third openings are formed through the lamination layer to the copper posts and to metal pads on the metal substrate. Metal vias are formed in the third openings.

At least one redistribution layer (RDL) is provided on a silicon die. A passivation layer is deposited on the RDL. First openings having a first diameter are etched in the passivation layer where copper posts are to be formed. A seed layer is deposited over the passivation layer and within the openings. A photoresist layer is coated on the seed layer and patterned to form second openings having a second diameter over the first openings larger than the first diameter. Copper is plated on the seed layer to form copper posts filling the second openings. The silicon die is die attached to a metal substrate. A lamination layer is coated over the silicon die and the copper posts. Third openings are formed through the lamination layer to the copper posts and to metal pads on the metal substrate. Metal vias are formed in the third openings.