A semiconductor device includes a die stack and an encapsulant covering the die stack. The die stack includes a first die and a second die stacked upon one another, a bonding dielectric layer, and a through die via providing a vertical connection in the die stack. The first die includes a first substrate and a first conductive pad on the first substrate, and the second die includes a second substrate and a second conductive pad on the second substrate. The bonding dielectric layer interposed between the first substrate and the second substrate is in physical contact with at least one selected from the group of the first conductive pad and the second conductive pad. The through die via extends through the first conductive pad and the bonding dielectric layer and lands on the second pad.

A semiconductor device includes a die stack and an encapsulant covering the die stack. The die stack includes a first die and a second die stacked upon one another, a bonding dielectric layer, and a through die via providing a vertical connection in the die stack. The first die includes a first substrate and a first conductive pad on the first substrate, and the second die includes a second substrate and a second conductive pad on the second substrate. The bonding dielectric layer interposed between the first substrate and the second substrate is in physical contact with at least one selected from the group of the first conductive pad and the second conductive pad. The through die via extends through the first conductive pad and the bonding dielectric layer and lands on the second pad.

A method of bonding includes using a bonding layer having a fluorinated oxide. Fluorine may be introduced into the bonding layer by exposure to a fluorine-containing solution, vapor or gas or by implantation. The bonding layer may also be formed using a method where fluorine is introduced into the layer during its formation. The surface of the bonding layer is terminated with a desired species, preferably an NH.sub.2 species. This may be accomplished by exposing the bonding layer to an NH.sub.4OH solution. High bonding strength is obtained at room temperature. The method may also include bonding two bonding layers together and creating a fluorine distribution having a peak in the vicinity of the interface between the bonding layers. One of the bonding layers may include two oxide layers formed on each other. The fluorine concentration may also have a second peak at the interface between the two oxide layers.

A method of bonding includes using a bonding layer having a fluorinated oxide. Fluorine may be introduced into the bonding layer by exposure to a fluorine-containing solution, vapor or gas or by implantation. The bonding layer may also be formed using a method where fluorine is introduced into the layer during its formation. The surface of the bonding layer is terminated with a desired species, preferably an NH.sub.2 species. This may be accomplished by exposing the bonding layer to an NH.sub.4OH solution. High bonding strength is obtained at room temperature. The method may also include bonding two bonding layers together and creating a fluorine distribution having a peak in the vicinity of the interface between the bonding layers. One of the bonding layers may include two oxide layers formed on each other. The fluorine concentration may also have a second peak at the interface between the two oxide layers.

Representative techniques and devices including process steps may be employed to form a common interconnection of a multi-die or multi-wafer stack. Each device of the stack includes a conductive pad disposed at a predetermined relative position on a surface of the device. The devices are stacked to vertically align the conductive pads. A through-silicon via is formed that electrically couples the conductive pads of each device of the stack.

Representative techniques and devices including process steps may be employed to form a common interconnection of a multi-die or multi-wafer stack. Each device of the stack includes a conductive pad disposed at a predetermined relative position on a surface of the device. The devices are stacked to vertically align the conductive pads. A through-silicon via is formed that electrically couples the conductive pads of each device of the stack.

Semiconductor die stacks, and associated methods and systems are disclosed. The semiconductor die stack may include a first die with a memory array and a second die with CMOS circuitry configured to access the memory array. The first die may not have circuitry for accessing the memory array. Further, the first and second dies may be bonded to function as a single memory device, and front surfaces of the first and second dies are conjoined to form electrical connections therebetween. The second die may include a portion uncovered by the first die, where bond pads of the semiconductor die stack are located. The first die may provide a space for bond wires to connect to the bond pads without interfering with another die attached above the semiconductor die stack. Multiple semiconductor die stacks may be stacked on top of and in line with each other.

Semiconductor die stacks, and associated methods and systems are disclosed. The semiconductor die stack may include a first die with a memory array and a second die with CMOS circuitry configured to access the memory array. The first die may not have circuitry for accessing the memory array. Further, the first and second dies may be bonded to function as a single memory device, and front surfaces of the first and second dies are conjoined to form electrical connections therebetween. The second die may include a portion uncovered by the first die, where bond pads of the semiconductor die stack are located. The first die may provide a space for bond wires to connect to the bond pads without interfering with another die attached above the semiconductor die stack. Multiple semiconductor die stacks may be stacked on top of and in line with each other.

An electronic device includes a first electronic chip, a second electronic chip, and an interconnection circuit. A first region of a first surface of the first electronic chip is assembled by hybrid bonding to a third region of a third surface of the interconnection circuit. A second region of a second surface of the second electronic chip is assembled by hybrid to a fourth region of the third surface of the interconnection circuit. In this configuration, the first electronic chip is electrically coupled to the second electronic chip through the interconnection circuit. The first surface of the first electronic chip further includes a fifth region which is not in contact with the interconnection circuit. This fifth region includes a connection pad electrically connected by a connection element to a connection substrate to which the interconnection circuit is mounted.

An electronic device includes a first electronic chip, a second electronic chip, and an interconnection circuit. A first region of a first surface of the first electronic chip is assembled by hybrid bonding to a third region of a third surface of the interconnection circuit. A second region of a second surface of the second electronic chip is assembled by hybrid to a fourth region of the third surface of the interconnection circuit. In this configuration, the first electronic chip is electrically coupled to the second electronic chip through the interconnection circuit. The first surface of the first electronic chip further includes a fifth region which is not in contact with the interconnection circuit. This fifth region includes a connection pad electrically connected by a connection element to a connection substrate to which the interconnection circuit is mounted.