Acoustic wave filter devices are disclosed. In an embodiment, the device includes an acoustic wave resonator and a reflecting layer located below the acoustic wave resonator. The wave resonator includes an input electrode including a first electrode and a counter electrode, a piezoelectric layer sandwiched between the first electrode and the counter electrode, and an output electrode. The piezoelectric layer has a first region covered by the first or the output electrode, and a second region not covered by any of the first and the output electrode. The first region has a second order acoustic thickness-shear resonance (TS2) mode dispersion curve with a first minimum frequency, and the second region has a TS2 mode dispersion curve with a second minimum frequency. The reflecting layer's thickness is such that a difference between the first minimum frequency and the second minimum frequency is less than 2% of a filter center frequency.

A method for forming an acoustic wave device, including steps of: forming an acoustic wave sensing part and an acoustic wave reflecting part, wherein the step of forming the acoustic wave sensing part includes: providing a first substrate, forming a sensing layer on the first substrate, forming a bottom electrode on a side of the sensing layer, and forming a filling layer on the sensing layer and the bottom electrode; and wherein the step of forming the acoustic wave reflecting part includes: providing a second substrate, forming a reflecting element on the second substrate, and forming a cover layer on the reflecting element; joining the acoustic wave sensing part and the acoustic wave reflecting part; removing the first substrate; and forming a top electrode on another side of the sensing layer, wherein the bottom electrode, the top electrode and the reflecting element are arranged correspondingly to each other.

An acoustic wave filter device includes a plurality of acoustic wave resonators. Each of the acoustic wave resonators includes a piezoelectric layer and an IDT electrode provided on the piezoelectric layer. On a surface opposite to a surface of the piezoelectric layer on which the IDT electrode is provided, a low-acoustic-velocity film and a substrate made of a semiconductor are stacked. A routing line electrically connected to an antenna terminal is provided on an insulating film provided on the piezoelectric layer.

A manufacturing process for a bulk acoustic resonator, comprising: making an acoustic mirror on a substrate; making a bottom electrode layer for covering the acoustic mirror on the substrate; performing chemical treatment on a peripheral part of the bottom electrode layer to form a modified layer, which surrounds the bottom electrode layer; making a piezoelectric layer on the bottom electrode layer; and making a top electrode layer on the piezoelectric layer. A bulk acoustic resonator, comprising: a substrate, an acoustic mirror formed on the substrate, and a bottom electrode layer, a piezoelectric layer and a top electrode layer that are sequentially formed on the substrate with the acoustic mirror, chemical treatment is performed on a part of the bottom electrode layer close to an edge of the acoustic mirror to form a modified layer. Parasitic oscillation of the resonator is inhibited, and wiring of a top electrode is greatly simplified.

An acoustic resonator forms a component of an FBAR filter that includes a trap-rich layer to avoid parasitic conduction by degrading carrier lifetimes of a free charge carriers. The acoustic resonator has a first electrode, a second electrode disposed parallel to the first planar portion and a piezoelectric layer disposed between and contacting both the first and second planar electrodes. A silicon-based a support layer is bonded to the second electrode and includes a trap region. The acoustic resonator may be manufactured by (a) depositing the trap region on the support layer; (b) oxidizing a surface of the trap region; (c) depositing a bonding layer on the oxidized surface of the trap region; (d) bonding a first electrode to the bonding layer; (e) contacting a first side of a piezoelectric layer to the electrode; and (f) contacting a second side of the piezoelectric layer a second electrode.

Aspects of this disclosure relate to methods of manufacturing bulk acoustic wave components. Such methods include plasma dicing to singulate individual bulk acoustic wave components. A buffer layer can be formed over a substrate of bulk acoustic wave components such that streets are exposed. The bulk acoustic wave components can be plasma diced along the exposed streets to thereby singulate the bulk acoustic wave components.

Acoustic resonator devices and filters are disclosed. An acoustic resonator includes a substrate and a piezoelectric plate having parallel front and back surfaces. The substrate includes a silicon base having a trap-rich region adjacent to a surface and a dielectric layer on the surface. The back surface of the piezoelectric plate faces the dielectric layer. The piezoelectric plate comprises a diaphragm that spans a cavity in the substrate. An interdigital transducer (IDT) is provided on the front surface of the piezoelectric plate such that interleaved fingers of the IDT are on the diaphragm.

Embodiments of this disclosure relate to bulk acoustic wave resonators on a substrate. The bulk acoustic wave resonators include a first bulk acoustic wave resonator, a second bulk acoustic wave resonator, a conductor electrically connecting the first bulk acoustic wave resonator to the second bulk acoustic wave resonator, and an air gap positioned between the conductor and a surface of the substrate.

A film bulk acoustic resonator (FBAR) structure includes a bottom cap wafer, a piezoelectric layer disposed on the bottom cap wafer, the piezoelectric layer including a single crystalline piezoelectric material, a bottom electrode disposed below the piezoelectric layer; a top electrode disposed above the piezoelectric layer; and a cavity disposed below the bottom electrode.

In a crystal resonator plate (2), a support part (24) extends from only one corner part positioned in the +X direction and in the −Z′ direction of a vibrating part (22) to an external frame part (23) in the −Z′ direction. The vibrating part (22) and at least part of the support part (24) form an etching region (Eg) having a thickness thinner than a thickness of the external frame part (23). A stepped part is formed at a boundary of the etching region (Eg), and a first lead-out wiring (223) is formed over the support part (24) to the external frame part (23) so as to overlap with the stepped part. At least part of the stepped part that is superimposed on the first lead-out wiring (223) is formed so as not to be parallel to the X axis in plan view.