An acoustic wave device includes a support substrate, a piezoelectric film, and an IDT electrode. When a wavelength defined by an electrode finger pitch of the IDT electrode is λ, a thickness of the piezoelectric film is about 1λ or less. The piezoelectric film has crystal axes. The support substrate includes first and second silicon layers. A plane orientation of the first and second silicon layers is (100), (110), or (111). When angles α1 and β2 are defined between the plane orientations of the first and second silicon layers and the crystal axes, each of the angles α1 and α2 is one of three types of angles of an angle α.sub.100, an angle α.sub.110, and an angle α.sub.111. A type of the angle α1 is different from a type of the angle α2 and/or a value of the angle α1 is different from a value of the angle α2.

A surface acoustic wave device according to the present disclosure includes a support substrate; an intermediate layer laminated on the support substrate; a piezoelectric layer laminated on the intermediate layer; and an IDT electrode formed on the piezoelectric layer, an Euler angle of the support substrate is (−45°±10°, −54°±10°, 180°±30°) and an Euler angle of the piezoelectric layer is (0°±5°, 112.5°±22.5°, 0°±5°) or (0°±5°, −67.5°±22.5°, 0°±5°).

A bonded body has a supporting substrate composed of silicon, piezoelectric material substrate, and a bonding layer provided on a bonding surface of the supporting substrate and composed of a metal oxide. An amount of aluminum atoms on the bonding surface of the supporting substrate is 1.0×10.sup.11 to 1.0×10.sup.15 atoms/cm.sup.2.

The invention relates to a SAW resonator (100) comprising at least: a substrate (102); a layer (108) of piezoelectric material arranged on the substrate; a first attenuation layer (112) arranged between the substrate and the layer of piezoelectric material, and/or, when the substrate comprises at least two different layers (104, 106), a second attenuation layer (114) arranged between the two layers of the substrate; and in which the at least one attenuation layer is/are heterogeneous.

An elastic wave device includes a piezoelectric substrate made of LiNbO.sub.3, interdigital transducer electrodes on the piezoelectric substrate, and a first dielectric film provided on the piezoelectric substrate and the first dielectric film to cover the IDT electrodes and made of a silicon oxide. The IDT electrodes include a first metal film made of one metal selected from Pt, Cu, Mo, Au, W, and Ta. The Euler angles (ϕ, θ, ψ) of the piezoelectric substrate are (0±5°, −90°≤θ≤−70°, 0°±5°). The metal for the first metal film and the thickness hm/λ (%) match any of the combinations as follows: TABLE-US-00001 Metal for the first metal film Thickness hm/λ (%) of the first metal film Pt 6.5 ≤ hm/λ ≤ 25 Cu  13 ≤ hm/λ ≤ 25 Mo 15.5 ≤ hm/λ ≤ 25  Au 6.5 ≤ hm/λ ≤ 25 W 7.5 ≤ hm/λ ≤ 25 Ta .sup.  7 ≤ hm/λ ≤ 25.

An elastic wave device includes a piezoelectric substrate, an IDT electrode on the piezoelectric substrate, and a silicon oxide film arranged on the piezoelectric substrate to cover the IDT electrode. The IDT electrode includes first and second electrode layers laminated on each other, the first electrode layer is made of metal or an alloy with a density higher than a density of metal of the second electrode layer and a density of silicon oxide of the silicon oxide film, the piezoelectric substrate is made of LiNbO.sub.3 and θ is in a range of equal to or greater than about 8° and equal to or less than about 32° with Euler Angles (0°±5°, θ, 0°±10°) of the piezoelectric substrate, and the silicon oxide film contains hydrogen atoms, hydroxyl groups, or silanol groups.

An acoustic wave resonator includes: a support substrate; a piezoelectric substrate located on the support substrate; a first amorphous layer that is in contact with the support substrate and is mainly composed of one or more constituent elements of the support substrate; a second amorphous layer that is in contact with the piezoelectric substrate and the first amorphous layer, is mainly composed of one or more constituent elements of the piezoelectric substrate, and is thinner than the first amorphous layer; and a pair of comb-shaped electrodes that is located on an opposite surface of the piezoelectric substrate from the support substrate, each of the pair of comb-shaped electrodes including electrode fingers.

An acoustic wave device includes a support substrate including silicon, a piezoelectric layer provided directly or indirectly on the support substrate, and an interdigital transducer (IDT) electrode provided on the piezoelectric layer. When a wavelength defined by an electrode finger pitch of the IDT electrode is λ, a thickness of the piezoelectric layer is about 1λ or less. V.sub.L, which is an acoustic velocity of a longitudinal wave component of a bulk wave propagating through the piezoelectric layer, satisfies Unequal Equation (2) below in relation to an acoustic velocity V.sub.Si-1 determined by Equation (1) below:
V.sub.Si-1=(V.sub.2).sup.1/2 (m/sec)  Equation (1),
V.sub.Si-1≤V.sub.L  Unequal Equation (2), V.sub.2 in Equation (1) is a solution of Equation (3), and
Ax.sup.3+Bx.sup.2+Cx+D=0  Equation (3).

An acoustic wave device includes a piezoelectric layer, an IDT electrode, a high-acoustic-velocity support substrate, and a low-acoustic-velocity film. The high-acoustic-velocity support substrate is located on an opposite side of the piezoelectric layer from the IDT electrode in the thickness direction of the piezoelectric layer. The low-acoustic-velocity film is disposed between the high-acoustic-velocity support substrate and the piezoelectric layer in the thickness direction. The high-acoustic-velocity support substrate includes a base region and a surface region disposed nearer to the low-acoustic-velocity film than the base region in the thickness direction and whose crystal quality is worse than that of the base region. The surface region includes first and second layers disposed nearer to the base region than the first layer in the thickness direction and whose crystal quality is better than that of the first layer.

An acoustic wave device includes a support substrate, a piezoelectric layer, and an IDT electrode. The piezoelectric layer is over the support substrate. The IDT electrode is on the piezoelectric layer, and includes a plurality of electrode fingers. An intersecting width of the plurality of electrode fingers is equal to or smaller than about 5λ.