A piezoelectric thin film comprises aluminum nitride containing a monad and at least one type among a tetrad and a pentad. The piezoelectric thin film having a large electromechanical coupling factor and a small stiffness.

A BAW device includes a substrate, a first reflector, and at least two BAW transducers. The first reflector resides over the substrate and has a plurality of reflector layers. A first BAW transducer resides over a first section of the first reflector, has a first series resonance frequency, and has a first piezoelectric layer of a first thickness between a first top electrode and a first bottom electrode. The second BAW transducer resides over a second section of the first reflector, has a second series resonance frequency that is different than the first series resonance frequency, and has a second piezoelectric layer of a second thickness, which is different than the first thickness, between a second top electrode and a second bottom electrode.

A method of fabricating an RF filter comprising an array of resonators, the method comprising the steps of: (a) Obtaining a removable carrier with release layer; (b) Growing a piezoelectric film on a removable carrier; (c) Applying a first electrode to the piezoelectric film; (d) Obtaining a backing membrane on a cover, with or without prefabricated cavities between the backing film and cover; (e) Attaching the backing membrane to the first electrode; (f) Detaching the removable carrier; (g) Measuring and trimming the piezoelectric film as necessary; (h) Selectively etching away the piezoelectric layer to fabricate discrete resonator islands; (i) Etching down through coatings backing membrane, silicon dioxide and into silicon handle to form trenches; (j) Applying passivation layer into the trenches and around the piezoelectric islands; (k) Depositing a second electrode layer over the dielectric and piezoelectric film islands; (l) Applying connections for subsequent electrical coupling to an interposer; (m) Selectively remove second electrode material leaving coupled resonator arrays; (n) Create gasket around perimeter of the resonator array; (o) Thinning down cover of handle to desired thickness; (p) Optionally fabricating cavities between the silicon membrane and handle; (q) Dicing the wafer into flip chip single unit filter arrays; (r) Obtaining an interposer; (s) Optionally applying a dam to the interposer surface to halt overfill flow; (t) Coupling the flip chip single unit filter array to pads of the interposer by reflow of the solder cap; (u) Encapsulating with polymer overfill; and (v) Singulating into separate filter modules.

A method of fabricating an RF filter comprising an array of resonators comprising the steps of: Obtaining a removable carrier with release layer; Growing a piezoelectric film on a removable carrier; Applying a first electrode to the piezoelectric film; Obtaining a backing membrane on a cover, with or without prefabricated cavities between the backing film and cover; Attaching the backing membrane to the first electrode; Detaching the removable carrier; Measuring and trimming the piezoelectric film as necessary; Selectively etching away the piezoelectric layer to fabricate discrete resonator islands; Etching down through coatings and backing membrane to a silicon dioxide layer between the backing membrane and the cover to form trenches; Applying a passivation layer into the trenches and around the piezoelectric islands; Depositing a second electrode layer over the piezoelectric film islands and surrounding passivation layer; Applying connections for subsequent electrical coupling to an interposer; Selectively removing second electrode material leaving coupled resonator arrays; Creating a gasket around perimeter of the resonator array; Thinning down cover to desired thickness; Optionally fabricating upper cavities between the backing membrane and cover by drilling holes through the cover and then selectively etching away the silicon dioxide; Dicing the wafer into flip chip single unit filter arrays; Obtaining an interposer; Optionally applying a dam to the interposer surface to halt overfill flow; Coupling the flip chip single unit filter array to pads of the interposer by reflow of the solder cap; Encapsulating with polymer underfill/overfill; and Singulating into separate filter modules.

An FBAR filter device comprising an array of resonators, each resonator comprising a single crystal piezoelectric layer sandwiched between a first and a second metal electrode,

wherein the first electrode is supported by a support membrane over an air cavity, the air cavity being embedded in a silicon dioxide layer over a silicon handle, with through-silicon via holes through the silicon handle and into the air cavity, the side walls of said air cavity in the silicon dioxide layer being defined by barriers of a material that is resistant to silicon oxide etchants, and wherein the interface between the support membrane and the first electrode is smooth and flat.

An acoustic wave filter device includes a second filter section connected to a first filter section. The second filter section includes acoustic wave resonators in a ladder circuit configuration. Of the acoustic wave resonators in the first and second filter sections, the acoustic wave resonator having the smallest fractional bandwidth is included in the second filter section. In the second filter section, inductors are respectively connected between parallel arm resonators and a reference potential. Attenuation near a pass band in the second filter section is larger than attenuation near a pass band in the first filter section.

A method of plugging a hydrocarbon well includes deploying a downhole tool to remove at least a portion of a casing at a section of well to be plugged. Deploying a blocking device downhole to block a bottom of the section of well to be plugged. Deploying a plugging material downhole onto the blocking device to fill an area to be plugged. Deploying an exothermic fluid downhole, wherein activation of the exothermic material liquefies the plugging material. Allowing the plugging material and the exothermic fluid to solidify form a cast-in-place plug that fills the section of well to be plugged.

The present invention relates to a filter chip (1), comprising an interconnection of at least one first and one second resonator (2, 3) operating with bulk acoustic waves, wherein the first resonator (2) operating with bulk acoustic waves comprises a first piezoelectric layer (4) that is structured in such a way that the first resonator (2) has a lower resonant frequency than the second resonator (3).

A bulk acoustic wave (BAW) resonator comprises: a first electrode; a second electrode comprising a plurality of sides, wherein at least one of the sides is a connection side; a piezoelectric layer disposed between the first and second electrodes, and an acoustic reflective element disposed beneath the first electrode, the second electrode and the piezoelectric layer, wherein an overlap of the reflective element, the first electrode, the second electrode, and the piezoelectric layer defines an active area of the acoustic resonator; a bridge adjacent to a termination of the active area of the BAW resonator; and a discontinuity disposed in the bridge.

A method of fabricating an RF filter comprising an array of resonators, the method comprising the steps of: (a) Obtaining a removable carrier with release layer; (b) Growing a piezoelectric film on a removable carrier; (c) Applying a first electrode to the piezoelectric film; (d) Obtaining a backing membrane on a cover, with or without prefabricated cavities between the backing film and cover; (e) Attaching the backing membrane to the first electrode; (f) Detaching the removable carrier; (g) Measuring and trimming the piezoelectric film as necessary; (h) Selectively etching away the piezoelectric layer to fabricate discrete resonator islands; (i) Etching down through coatings backing membrane, silicon dioxide and into silicon handle to form trenches; (j) Applying passivation layer into the trenches and around the piezoelectric islands; (k) Depositing a second electrode layer over the dielectric and piezoelectric film islands; (l) Applying connections for subsequent electrical coupling to an interposer; (m) Selectively remove second electrode material leaving coupled resonator arrays; (n) Create gasket around perimeter of the resonator array; (o) Thinning down cover of handle to desired thickness; (p) Optionally fabricating cavities between the silicon membrane and handle; (q) Dicing the wafer into flip chip single unit filter arrays; (r) Obtaining an interposer; (s) Optionally applying a dam to the interposer surface to halt overfill flow; (t) Coupling the flip chip single unit filter array to pads of the interposer by reflow of the solder cap; (u) Encapsulating with polymer overfill; and (v) Singulating into separate filter modules.