A transmission line RF applicator apparatus and method for coupling RF power to a plasma in a plasma chamber. The apparatus comprises two conductors, one of which has a plurality of apertures. In one aspect, apertures in different portions of the conductor have different sizes, spacing or orientations. In another aspect, adjacent apertures at successive longitudinal positions are offset along the transverse dimension. In another aspect, the apparatus comprises an inner conductor and one or two outer conductors. The main portion of each of the one or two outer conductors includes a plurality of apertures that extend between an inner surface and an outer surface of the outer conductor.

This microwave plasma processing apparatus has, as a gas introduction mechanism for introducing a working gas inside a chamber (10), electrical discharge prevention members (96(1) to 96(8)), each of which is provided to a plurality of dielectric window gas passages (94(1) to (94(8)) through which a dielectric window (54) passes. Each electrical discharge prevention member (96(n)), a portion (114) of which protrudes only a height h, which is greater than or equal to a predetermined distance H, upward from the rear surface of a dielectric window (52) on the inlet side, passes through an opening (54a) of a slot plate (54), and inserts into a branched gas supply path (92(n)) of a gas branch part (90). The gas branch part (90), spring coils (116) and the slot plate (54), which surround the protruding portion (114) of each electrical discharge prevention member (96(n)), constitute an enclosing conductor (118).

Embodiments disclosed herein include a cleaning module for the exhaust line of a chamber. In an embodiment, a mobile cleaning module comprises a chamber where the chamber comprises a first opening and a second opening. In an embodiment, the cleaning module further comprises a lid to seal the first opening. In an embodiment, the lid comprises a dielectric plate, a dielectric resonator coupled to the dielectric plate, a monopole antenna positioned in a hole into the dielectric resonator, and a conductive layer surrounding the dielectric resonator.

In some general aspects, a surface of a structure within a chamber of an extreme ultraviolet (EUV) light source is cleaned using a method. The method includes generating a plasma state of a material that is present at a location adjacent to a non-electrically conductive body that is within the chamber. The generation of the plasma state of the material includes electromagnetically inducing an electric current at the location adjacent the non-electrically conductive body to thereby transform the material that is adjacent the non-electrically conductive body from a first state into the plasma state. The plasma state of the material includes plasma particles, at least some of which are free radicals of the material. The method also includes enabling the plasma particles to pass over the structure surface to remove debris from the structure surface without removing the structure from the chamber of the EUV light source.

A plasma reactor includes a chamber body having an interior space that provides a plasma chamber, a gas distribution port to deliver a processing gas to the plasma chamber, a workpiece support to hold a workpiece, an antenna array comprising a plurality of monopole antennas extending partially into the plasma chamber, and an AC power source to supply a first AC power to the plurality of monopole antennas.

An example system and corresponding method can include a combustion chamber of jet engine, a radio-frequency power source, and a resonator. The combustion chamber can include a liner defining a combustion zone, and include a fuel inlet configured to introduce fuel into the combustion zone. The resonator can have a resonant wavelength and include: a first conductor, a second conductor, a dielectric, and an electrode coupled to the first conductor. The resonator can be configured such that, when the resonator is excited by the radio-frequency power source with a signal having a wavelength proximate to an odd-integer multiple of one-quarter (¼) of the resonant wavelength, the resonator provides a plasma corona in the combustion zone. The controller can be configured to cause the radio-frequency power source to excite the resonator with the signal so as to provide the plasma corona.

Described is an apparatus for guiding an electromagnetic microwave, having: antenna surrounding walls, which define an interior space so as to surround therein at least an end region of an antenna of a microwave source, in particular laterally annularly as well as frontally; waveguide boundary walls, at least two of which are arranged in parallel to each other, wherein the waveguide boundary walls form a, in particular cuboid-shaped, waveguide having a substantially rectangular cross-section, wherein a cross-sectional plane is defined by a first direction that extends along a longitudinal direction of the antenna and a second direction that extends perpendicularly to the first direction, wherein it holds: 25>a/b>3, wherein a: is a width of the waveguide along the second direction, b: is a height of the waveguide along the first direction, wherein the apparatus is designed to let proceed a microwave from the interior space of the antenna surrounding walls into the waveguide.

A plasma reactor includes a chamber body having an interior space that provides a plasma chamber, a gas distribution port to deliver a processing gas to the plasma chamber, a workpiece support to hold a workpiece, an antenna array comprising a plurality of monopole antennas extending partially into the plasma chamber, and an AC power source to supply a first AC power to the plurality of monopole antennas. The plurality of monopole antennas can extend through a first gas distribution plate. A grid filter can be positioned between the workpiece support and the plurality of monopole antennas.

A radical generation device includes: a cylindrical tube; an antenna; an outer conductor part; and a connection part which has a double cylindrical tube structure including an inner cylindrical body and an outer cylindrical body, end portions of the inner cylindrical body and the outer cylindrical body on the same side are divided in a circumferential direction notches extending in an axial direction to form divided pieces, and tapered portions swelling outward toward a tip end are formed on an outer side of the divided pieces or tapered portions swelling inward toward a tip end are formed on an inner side of the divided pieces.

The present disclosure provides systems and methods for nitric oxide (NO) generation and/or delivery. In some aspects, a nitric oxide generation system comprises a plasma chamber configured to ionize a reactant gas including nitrogen and oxygen to form a product gas that includes NO, a scrubber downstream from the plasma chamber and having a volume at least partially containing NO.sub.2 scrubbing material, and a flow controller downstream of the scrubber configured to control the flow of product gas from the scrubber to a delivery device. A pump is configured to convey product gas from the plasma chamber into the scrubber and is configured to pressurize the product gas in the scrubber when the flow controller is positioned to restrict the flow of product gas from the scrubber. The pressurized product gas accumulates within the scrubber and is at least partially scrubbed of NO.sub.2 prior to passage through the flow controller.