Patent classifications
H05H1/466
Plasma device including two gas inlets
Provided herein is a plasma generating device for medical treatment and sanitizing purposes which comprises a control unit and a plasma generator connecting to the control unit. The plasma generator comprises a plasma tube having a first end and a second end; a first dielectric layer disposed on the inner surface of the plasma tube; a first electrode disposed on the first dielectric layer; a second dielectric layer disposed on the first electrode; a second electrode disposed on the second dielectric layer; and a plasma nozzle disposed on the bottom cover on the second end of the plasma tube.
Plasma Directed Electron Beam Wound Care System Apparatus and Method
A plasma generating device utilizes a cold plasma to contain and direct a stream of electrons with a hand held nozzle to enhance healing of wounds and skin surface abnormalities, and to kill pathogens on skin surfaces in humans and animals wounds, abnormalities and pathogens.
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
A matchless plasma source is described. The matchless plasma source includes a controller that is coupled to a direct current (DC) voltage source of an agile DC rail to control a shape of an amplified square waveform that is generated at an output of a half-bridge transistor circuit. The matchless plasma source further includes the half-bridge transistor circuit used to generate the amplified square waveform to power an electrode, such as an antenna, of a plasma chamber. The matchless plasma source also includes a reactive circuit between the half-bridge transistor circuit and the electrode. The reactive circuit has a high-quality factor to negate a reactance of the electrode. There is no radio frequency (RF) match and an RF cable that couples the matchless plasma source to the electrode.
Plasma generation device and plasma irradiation method
Atmospheric-pressure plasma generation device of the present invention includes heat sinks. Flow paths are formed in the heat sinks, and cooling gas flows in the flow paths, thereby cooling lower housing in which a reaction chamber is formed. Here, the gas used for cooling is warmed by the heat of the lower housing. The warmed gas is supplied into heated gas supply device and heated by heater. The heated gas flows in lower cover and is emitted together with plasma gas from lower cover toward a processing object. Consequently, it is possible to perform cooling of the lower housing heated by electric discharge and perform heating of the processing object, and it is possible to reduce energy required for heating gas.
Vehicle suspension with common hub and/or knuckle assembly
A vehicle suspension can include an adapter mounting face, a spindle rigidly mounted relative to the adapter mounting face, a wheel mounting hub including a hub body rotatably mounted on the spindle by bearings, and an adapter that spaces a brake component away from the adapter mounting face. Another vehicle suspension can include a spindle, bearings, and a wheel mounting hub rotatably mounted on the spindle by the bearings, the wheel mounting hub can include a hub body and a wheel mounting flange, the hub body and the wheel mounting flange being separate components of the wheel mounting hub. A system for adapting a vehicle suspension to different suspension capacities can include multiple wheel mounting hubs including a same hub body internal configuration configured to be rotatably mounted on the spindle by the bearings, but the wheel mounting hubs including respective different wheel mounting flanges.
Electrode component for generating large area atmospheric pressure plasma
An electrode component for generating large area atmosphere pressure plasma is provided. The electrode component comprises a first transparent insulation substrate, a first transparent electrode pattern, a second transparent electrode pattern, and a second transparent insulation substrate. The first transparent insulation substrate has a first thickness. The first transparent electrode pattern and the second transparent electrode pattern are formed on the upper surface of the first transparent insulation substrate and has a gap therebetween. The second transparent insulation substrate has a second thickness and covers the first transparent electrode pattern and the second transparent electrode pattern. The first thickness is greater than the second thickness in order to form atmospheric pressure plasma above the second transparent insulation substrate.
CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER
In some general aspects, a surface of a structure within a chamber of an extreme ultraviolet (EUV) light source is cleaned using a method. The method includes generating a plasma state of a material that is present at a location adjacent to a non-electrically conductive body that is within the chamber. The generation of the plasma state of the material includes electromagnetically inducing an electric current at the location adjacent the non-electrically conductive body to thereby transform the material that is adjacent the non-electrically conductive body from a first state into the plasma state. The plasma state of the material includes plasma particles, at least some of which are free radicals of the material. The method also includes enabling the plasma particles to pass over the structure surface to remove debris from the structure surface without removing the structure from the chamber of the EUV light source.
Atmospheric-pressure plasma processing apparatus and method
A plasma processing apparatus including powered electrodes having elongated planar surfaces; grounded electrodes having elongated planar surfaces parallel to and coextensive with the elongated surfaces of the powered electrodes, and spaced-apart a chosen distance therefrom, forming plasma regions, is described. RF power is provided to the at least one powered electrode, both powered and grounded electrodes may be cooled, and a plasma gas is flowed through the plasma regions at atmospheric pressure; whereby a plasma is formed in the plasma regions. The material to be processed may be moved into close proximity to the exit of the plasma gas from the plasma regions perpendicular to the gas flow, and perpendicular to the elongated electrode dimensions, whereby excited species generated in the plasma exit the plasma regions and impinge unimpeded onto the material.
SYSTEMS AND METHODS FOR INCISING TISSUE
An elongate electrode is configured to flex and generate plasma to incise tissue. An electrical energy source operatively coupled to the electrode is configured to provide electrical energy to the electrode to generate the plasma. A tensioning element is operatively coupled to the elongate electrode. The tensioning element can be configured to provide tension to the elongate electrode to allow the elongate electrode to flex in response to the elongate electrode engaging the tissue and generating the plasma. The tensioning element operatively coupled to the flexible elongate electrode may allow for the use of a small diameter electrode, such as a 5 μm to 20 μm diameter electrode, which can allow narrow incisions to be formed with decreased tissue damage. In some embodiments, the tensioning of the electrode allows the electrode to more accurately incise tissue by decreasing variations in the position of the electrode along the incision path.
System and Method for Plasma-Electron Sterilization
Provided are a system and method for sterilizing one or more medium via plasma exposure. The sterilization may be accomplished by exposing a respective medium to a given electrical field generated by electrodes disposed to target such medium, and through, optionally, further application of a magnetic field having a portion thereof disposed orthogonally to the generated electrical field.